Abstract: Characterization of a sample, e.g., a depth profile, may be attained using one or more of the following parameters in an electron spectroscopy method or system. The one or more parameters may include using low ion energy ions for removing material from the sample to expose progressively deeper layers of the sample, using an ion beam having a low ion angle to perform such removal of sample material, and/or using an analyzer positioned at a high analyzer angle for receiving photoelectrons escaping from the sample as a result of x-rays irradiating the sample. Further, a correction algorithm may be used to determine the concentration of components (e.g., elements and/or chemical species) versus depth within the sample, e.g., thin film formed on a substrate. Such concentration determination may include calculating the concentration of components (e.g, elements and/or chemical species) at each depth of a depth profile by removing from depth profile data collected at a particular depth (i.e.

Abstract: Characterization of a sample, e.g., a depth profile, may be attained using one or more of the following parameters in an electron spectroscopy method or system. The one or more parameters may include using low ion energy ions for removing material from the sample to expose progressively deeper layers of the sample, using an ion beam having a low ion angle to perform such removal of sample material, and/or using an analyzer positioned at a high analyzer angle for receiving photoelectrons escaping from the sample as a result of x-rays irradiating the sample. Further, a correction algorithm may be used to determine the concentration of components (e.g., elements and/or chemical species) versus depth within the sample, e.g., thin film formed on a substrate. Such concentration determination may include calculating the concentration of components (e.g, elements and/or chemical species) at each depth of a depth profile by removing from depth profile data collected at a particular depth (i.e.

Abstract: Characterization of a sample, e.g., determination of a component's concentration in a thin film, may be attained by providing calibration information representative of surface spectrum measurements for a plurality of samples correlated with depth profile information for the plurality of samples. The plurality of samples are formed under a same set of process conditions. One or more surface spectrum measurements are provided for a sample to be characterized that also was formed under the same set of process conditions. At least one characteristic of the sample to be characterized (e.g., concentration of a component) is determined based on the one or more surface spectrum measurements for the sample to be characterized and the calibration information.

Abstract: A data analysis computer system stores measurement data obtained from a multiplicity of distinct predefined processes. The system can store definitions for many data analysis charts, each of which depicts stored measurement data for a specified process. Further, chart groups can be defined. Each chart group comprises a set of data analysis charts that grouped together for convenient access. Charts are displayed by either (1) selecting a defined chart, or (2) by selecting a chart group and then selecting one or more charts from the selected group for, and then simultaneously displaying the selected data analysis charts. A data display gallery feature divides the computer system's display into a two dimensional array of cells, and assigns cell definitions to at least a subset of the cells. Each cell definition consists of either a set of measurement data which can be displayed as a unit, or a mathematical combination of a plurality of specified sets of measurement data.

Abstract: A system and method for computer control of machine processes. The system and method provide a set of predefined data management or data analysis tasks which an operator of the system can use when using the system to run a selected process.Measurement data structures for storing data measured during the running of processes, and related data, for a multiplicity of processes are defined and stored. Data is added to these data structures each time a process is run, and this data is automatically accessed when the operator requests data analysis on the data collected during previous uses of a selected process.Access to measurement data for detailed data management tasks is provided graphically through the use of trend charts and statistical quality control charts. These charts depict trends in the measurement data for selected processes. By pointing at any data point in the chart, the user can access the corresponding record of data for detailed data analysis or for use in a data management task.

Abstract: A method of selecting items from a hierarchy of items and then performing a selected task on the selected set of items. An engineering set up control program includes a procedure for denoting processes, groups of processes, and subgroups of processes which are available for use by operators of the system. The processes, groups and subgroups are visually presented in a three level menu. Subgroups and groups of processes can be selected using the three level menu, and then operated on as a group.

Abstract: A system and method for computer control of machine processes. The operator of the system selects and specifies process control parameters through the use of a three level dynamic menu. The first level of the menu is used to select a group of process parameters. The second and third menus together have the visual appearance of a set of index cards, the second menu forming tabs on the index cards, and the third menu comprising the set of process parameters listed on each index card. Each process parameter has a preassigned entry status: operator unalterable, operator alterable, forced operator entry, or single time forced entry (value must be entered only once when the process is run several times). The selected process cannot be run until values have been entered for all parameters having an entry status of forced operator entry or single time forced entry. Edit field parameters limit the operator's options to a predefined set of parameter values.

Abstract: A process control interface includes a multi-level dynamic menu for selecting processes from a set of processes that are organized into groups and subgroups. An engineering set up control program enables an engineer to denote which of these groups, subgroups and processes are available for selection by an operator using the process control interface. Only those groups, subgroups and processes which are available for selection are displayed in the dynamic menu. The set of processes defined by the engineering set up control program can be stored on individual operator-related disks so that each operator has access to a distinct set of available processes. Process subgroups and groups can be duplicated by the engineering setup control program to facilitate the setting up of new control processes.

Abstract: A method of controlling a process using a programmed digital computer with a set of process control programs. An operator control program allows the user to select and run a specified process and to collect measurement data while the selected process is run. A data analysis program enables interactive computer controlled data analysis, including displaying a trand chart depicting a sequence of data points, each data point representing at least a portion of the measurement data collected and stored while running a selected process. A selectably positionable pointer is displayed on the trend chart for pointing at an individual data point so that the user can select and perform a predefined task on the measurement data stored in the data structure corresponding to the data point being pointed at by said selectably positionable pointer.

Abstract: An automatic system for performing sheet resistivity testing on surface layers of semiconductor wafers, including a wafer handling stage having a platform for carrying a semiconductor wafer, and an arrangement for mounting the platform for rotation about a central axis and for translation of the platform orthogonal to a major surface thereof. A platform drive translates the platform between a wafer test position and a wafer load position, and a stage drive rotates the platform to accurately located angular test positions. A probe handling arrangement includes a carriage for carrying a test probe parallel to the major surface of a wafer on the platform and a carriage drive translates the carriage between a parked position in which a test prove thereon is positioned adjacent and clear of the platform and accurately located test positions along a radius of the platform. The carriage carries a resistivity test probe which includes test probe element for contacting the surface of a semiconductor wafer.

Abstract: An automatic sheet resistance mapping system for semiconductor wafers which has the capability of taking high accuracy, multiple test readings in both contour scan and diameter scan modes. A rotatable wafer stage carries a semiconductor wafer thereon with the center of the wafer positioned substantially at the axis of rotation of the wafer stage. A probe head assembly, including a linear array of at least four equally spaced probe tips projecting from one surface of the assembly is mounted facing the wafer stage on an arrangement for moving the probe tips alternately into and out of contact with the surface of a wafer carried thereon. Positioning arrangements are provided for rotating the wafer stage to accurately registered angular test positions and for producing translation between the wafer stage and the probe head assembly to position the array of probe tips at accurately registered radial test positions relative to the center of the wafer.

Abstract: A system and method for computer control of machine processes, including a dynamic menu feature used in the selection of processes and the definition and selection of operating parameters used by a process control program to direct the performance of the process by the machine.Data structures for a multiplicity of processes are defined and stored. Values stored in the data structures indicate which processes are available for use and the process control program associated with each process. Furthermore, for each parameter of each process a data structure contains an indicia of whether the parameter is a forced entry parameter (which must be given a value before the process is run), a may change parameter (with a default value that may be changed when the process is run), or a locked parameter which has a fixed value.