Patents by Inventor David Scheiner
David Scheiner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9140539Abstract: Obtaining at least one of a cross-section profile, depth, width, slope, undercut and other parameters of via-holes by a non-destructive technique using an optical system having an illumination system for producing at least one light beam and directing it on a sample in a region of the structure containing at least one via-hole, a detection system configured and operable to collect a pattern of light reflected from the illuminated region, the light pattern being indicative of one or more parameters of said via-hole, and, a control system connected to the detection system, the control system comprising a memory utility for storing a predetermined theoretical model comprising data representative of a set of parameters describing via-holes reflected pattern, and a data processing and analyzing utility configured and operable to receive and analyze image data indicative of the detected light pattern and determine one or more parameters of said via-hole.Type: GrantFiled: September 9, 2013Date of Patent: September 22, 2015Assignee: NOVA MEASURING INSTRUMENTS LTD.Inventor: David Scheiner
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Publication number: 20150144498Abstract: A reactor is provided which comprises: a plurality of reaction units located within a reaction zone, each of the reaction units being adapted to enable carrying out a chemical reaction of one or more raw gases (e.g. at least one of CO2 and H20); ingress means to allow introduction of the one or more raw gases into the reaction zone and to allow distributing the incoming gas to the plurality of reaction units; egress means to allow exit of reaction products from the reaction zone; and a heating system. The reaction units extend essentially along a longitudinal axis of the reaction zone and are arranged in a spaced-apart relationship along a lateral axis of the reaction zone. The heating system comprises a plurality of heating sources extending along the reaction zone, thereby providing at least a part of the energy to carry out the reaction process within the reaction units.Type: ApplicationFiled: June 25, 2013Publication date: May 28, 2015Applicant: YEDA RESEARCH AND DEVELOPMENT CO., LTD.Inventors: David Scheiner, Jacob Karni, Raymond A George, Gabriel Seiden
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Publication number: 20150047985Abstract: A solar-driven apparatus is provided having: a cavity having at least one optical window for collecting electromagnetic radiation associated with solar energy impinging on said at least one optical window; a reaction assembly located inside the cavity and adapted to enable carrying out electrolysis process of at least one raw fluid utilizing energy derived partially from the solar radiation and partially from an electric source; one or more ingress units operative to allow introduction of the raw fluid into the apparatus; and one or more egress units operative to allow exit of the electrolysis process' products from the solar driven apparatus.Type: ApplicationFiled: January 13, 2013Publication date: February 19, 2015Inventors: Jacob Karni, Yury Alioshin, David Banitt, David Scheiner, Roi Harpaz, Baruch Finarov
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Publication number: 20140376006Abstract: Obtaining at least one of a cross-section profile, depth, width, slope, undercut and other parameters of via-holes by a non-destructive technique using an optical system having an illumination system for producing at least one light beam and directing it on a sample in a region of the structure containing at least one via-hole, a detection system configured and operable to collect a pattern of light reflected from the illuminated region, the light pattern being indicative of one or more parameters of said via-hole, and, a control system connected to the detection system, the control system comprising a memory utility for storing a predetermined theoretical model comprising data representative of a set of parameters describing via-holes reflected pattern, and a data processing and analyzing utility configured and operable to receive and analyze image data indicative of the detected light pattern and determine one or more parameters of said via-hole.Type: ApplicationFiled: September 9, 2013Publication date: December 25, 2014Applicant: Nova Measuring Instruments Ltd.Inventor: DAVID SCHEINER
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Patent number: 8531679Abstract: The present invention provides a novel system and method for obtaining at least one of a cross-section profile, depth, width, slope, undercut and other parameters of via-holes by non-destructive technique. The optical system comprises an illumination system for producing at least one light beam and directing it on a sample in a region of the structure containing at least one via-hole; a detection system configured and operable to collect a pattern of light reflected from the illuminated region, the light pattern being indicative of one or more parameters of said via-hole; and, a control system connected to the detection system, the control system comprising a memory utility for storing a predetermined theoretical model comprising data representative of a set of parameters describing via-holes reflected pattern, and a data processing and analyzing utility configured and operable to receive and analyze image data indicative of the detected light pattern and determine one or more parameters of said via-hole.Type: GrantFiled: December 10, 2008Date of Patent: September 10, 2013Assignee: Nova Measuring Instruments Ltd.Inventor: David Scheiner
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Publication number: 20110089348Abstract: Photovoltaic thin film quality control is obtained where the thin film is supported by a support and a section of the film is illuminated by a polychromatic or monochromatic illumination source. The illumination is positioned in certain locations including locations where the layer stack includes a reduced number of thin film layers. Such locations may be discrete sampled points located within scribe lines, contact frames or dedicated measurement targets. The light collected from such discrete sampled points is transferred to a photo-sensitive sensor through an optical switch. The spectral signal of the light reflected, transmitted or scattered by the sampled points is collected by the sensor and processed by a controller in such a way that parameters of simplified stacks are used for accurate determination of desired parameters of the full cell stack. In this way the photovoltaic thin film parameters applicable to the quality control are derived e.g.Type: ApplicationFiled: December 13, 2010Publication date: April 21, 2011Inventors: Moshe Finarov, David Scheiner, Yoav Lishzinker, On Haran
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Publication number: 20100284027Abstract: The present invention provides a novel system and method for obtaining at least one of a cross-section profile, depth, width, slope, undercut and other parameters of via-holes by non-destructive technique. The optical system comprises an illumination system for producing at least one light beam and directing it on a sample in a region of the structure containing at least one via-hole; a detection system configured and operable to collect a pattern of light reflected from the illuminated region, the light pattern being indicative of one or more parameters of said via-hole; and, a control system connected to the detection system, the control system comprising a memory utility for storing a predetermined theoretical model comprising data representative of a set of parameters describing via-holes reflected pattern, and a data processing and analyzing utility configured and operable to receive and analyze image data indicative of the detected light pattern and determine one or more parameters of said via-hole.Type: ApplicationFiled: December 10, 2008Publication date: November 11, 2010Inventor: David Scheiner
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Publication number: 20100214566Abstract: Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. The optical measurements include at least two measurements with different polarization states of incident light, each measurement including illuminating the measurement site so as to illuminate one of the diffractive structures through the other. The diffraction properties of the measurement site are indicative of a lateral shift between the diffractive structures. The diffraction properties detected are analyzed for the different polarization states of the incident light to determine an existing lateral shift between the layers.Type: ApplicationFiled: May 7, 2010Publication date: August 26, 2010Applicant: Nova Measuring Instruments, Ltd.Inventors: Boaz Brill, Moshe Finarov, David Scheiner
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Publication number: 20090213377Abstract: A lens arrangement is presented. The lens arrangement comprises a first element having a concave reflective surface and defining an optical axis of the lens arrangement, and a second substantially flat and at least partially reflective element spaced-apart from the first element along the optical axis. The second element is configured to allow light passage therethrough and is oriented with respect to the optical axis and the first element such that at a predetermined angle of incidence of an input light beam onto the second element, the input light beam is reflected onto the reflective surface of the first element and reflected therefrom to pass through the second element.Type: ApplicationFiled: May 11, 2009Publication date: August 27, 2009Applicant: Nova Measuring Instruments, Ltd.Inventors: David SCHEINER, Michael Winik, Yakov Lyubchik
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Patent number: 7532414Abstract: A lens arrangement is presented. The lens arrangement comprises a first element having a concave reflective surface and defining an optical axis of the lens arrangement, and a second substantially flat and at least partially reflective element spaced-apart from the first element along the optical axis. The second element is configured to allow light passage therethrough and is oriented with respect to the optical axis and the first element such that at a predetermined angle of incidence of an input light beam onto the second element, the input light beam is reflected onto the reflective surface of the first element and reflected therefrom to pass through the second element.Type: GrantFiled: August 2, 2007Date of Patent: May 12, 2009Assignee: Nova Measuring Instruments, Ltd.Inventors: David Scheiner, Michael Winik, Yakov Lyubchik
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Publication number: 20080074665Abstract: Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. The optical measurements include at least two measurements with different polarization states of incident light, each measurement including illuminating the measurement site so as to illuminate one of the diffractive structures through the other. The diffraction properties of the measurement site are indicative of a lateral shift between the diffractive structures. The diffraction properties detected are analyzed for the different polarization states of the incident light to determine an existing lateral shift between the layers.Type: ApplicationFiled: November 26, 2007Publication date: March 27, 2008Applicant: Nova Measuring Instruments, Ltd.Inventors: Boaz BRILL, Moshe Finarov, David Scheiner
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Publication number: 20070268591Abstract: A lens arrangement is presented. The lens arrangement comprises a first element having a concave reflective surface and defining an optical axis of the lens arrangement, and a second substantially flat and at least partially reflective element spaced-apart from the first element along the optical axis. The second element is configured to allow light passage therethrough and is oriented with respect to the optical axis and the first element such that at a predetermined angle of incidence of an input light beam onto the second element, the input light beam is reflected onto the reflective surface of the first element and reflected therefrom to pass through the second element.Type: ApplicationFiled: August 2, 2007Publication date: November 22, 2007Applicant: Nova Measuring Instruments, Ltd.Inventors: David Scheiner, Michael Winik, Yakov Lyubchik
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Patent number: 7292341Abstract: An optical system for use in measurements in a sample comprising a light source (102) operable to produce an incident light beam propagating in a certain direction towards the sample (S) through an illumination channel (IC), a detector unit (104) for collecting light coming from the sample through a detection channel (DC), and generating data indicative of the collected light, a light directing assembly (106) operable to direct the incident beam onto a certain location on the sample's plane with a plurality of incident angles, and to direct light returned from the illuminated location to the detector unit (104), the light directing assembly (106) comprising a plurality of beam deflector elements (108 A-D), at least one of the deflector elements being movable and position of said at least one movable deflector element defining one of the selected incident angles.Type: GrantFiled: May 8, 2003Date of Patent: November 6, 2007Assignee: Nova Measuring Instruments Ltd.Inventors: Boaz Brill, Moshe Finarov, David Scheiner
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Patent number: 7253970Abstract: A lens arrangement is presented. The lens arrangement comprises a first element having a concave reflective surface and defining an optical axis of the lens arrangement, and a second substantially flat and at least partially reflective element spaced-apart from the first element along the optical axis. The second element is configured to allow light passage therethrough and is oriented with respect to the optical axis and the first element such that at a predetermined angle of incidence of an input light beam onto the second element, the input light beam is reflected onto the reflective surface of the first element and reflected therefrom to pass through the second element.Type: GrantFiled: December 3, 2004Date of Patent: August 7, 2007Assignee: Nova Measuring Instruments Ltd.Inventors: David Scheiner, Michael Winik, Yakov Lyubchik
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Patent number: 7187456Abstract: A method for measuring at least one desired parameter of a patterned structure having a plurality of features defined by a certain process of its manufacturing. The structure represents a grid having at least one cycle formed of at least two metal-containing regions spaced by substantially transparent regions with respect to incident light defining a waveguide. An optical model is provided, which is based on at least some of the features of the structure defined by a certain process of its manufacturing, and on the relation between a range of the wavelengths of incident radiation to be used for measurements and a space size between the two metal-containing regions in the grid cycle, and a skin depth of said metal. The model is capable of determining theoretical data representative of photometric intensities of light components of different wavelengths specularly reflected from the structure and of calculating said at least one desired parameter of the structure.Type: GrantFiled: February 8, 2005Date of Patent: March 6, 2007Assignee: Nova Measuring Instruments Ltd.Inventors: David Scheiner, Vladimir Machavariani
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Publication number: 20070034816Abstract: Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. The optical measurements comprise at least two measurements with different polarization states of incident light, each measurement including illuminating eh measurement site so as to illuminate one of the diffractive structures through the other. The diffraction properties of the measurement site are indicative of a lateral shift between eth diffractive structures. The diffraction properties detected are analyzed for the different polarization states of the incident light to determine an existing lateral shift between the layers.Type: ApplicationFiled: October 16, 2006Publication date: February 15, 2007Applicant: Nova Measuring Instruments, Ltd.Inventors: Boaz Brill, Moshe Finarov, David Scheiner
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Patent number: 7123366Abstract: An apparatus and a method are disclosed for measuring at least one desired parameter of a patterned structure having a plurality of features defined by a certain process of its manufacturing, wherein the structure represents a grid having at least one cycle formed of at least two metal-containing regions spaced by substantially transparent regions with respect to incident light defining a waveguide. The method utilizes an optical model based on at least some of the features of the structure defined by a certain process of its manufacturing, and is capable of determining theoretical data representative of photometric intensities of light components of different wavelengths specularly reflected from the structure and of calculating said at least one desired parameter of the structure.Type: GrantFiled: August 17, 2004Date of Patent: October 17, 2006Assignee: Nova Measuring Instruments Ltd.Inventors: David Scheiner, Vladimir Machavariani
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Publication number: 20060102830Abstract: Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. The optical measurements comprise at least two measurements with different polarization states of incident light, each measurement including illuminating eh measurement site so as to illuminate one of the diffractive structures through the other. The diffraction properties of the measurement site are indicative of a lateral shift between eth diffractive structures. The diffraction properties detected are analyzed for the different polarization states of the incident light to determine an existing lateral shift between the layers.Type: ApplicationFiled: November 14, 2005Publication date: May 18, 2006Applicant: Nova Measuring Instruments, Ltd.Inventors: Boaz Brill, Moshe Finarov, David Scheiner
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Publication number: 20060001883Abstract: An optical system for use in measurements in a sample comprising a light source (102) operable to produce an incident light beam propagating in a certain direction towards the sample (S) through an illumination channel (IC), a detector unit (104) for collecting light coming from the sample through a detection channel (DC), and generating data indicative of the collected light, a light directing assembly (106) operable to direct the incident beam onto a certain location on the sample's plane with a plurality of incident angles, and to direct light returned from the illuminated location to the detector unit (104), the light directing assembly (106) comprising a plurality of beam deflector elements (108 A-D), at least one of the deflector elements being movable and position of said at least one movable deflector element defining one of the selected incident angles.Type: ApplicationFiled: May 8, 2003Publication date: January 5, 2006Inventors: Boaz Brill, Moshe Finarov, David Scheiner
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Publication number: 20050280906Abstract: A lens arrangement is presented. The lens arrangement comprises a first element having a concave reflective surface and defining an optical axis of the lens arrangement, and a second substantially flat and at least partially reflective element spaced-apart from the first element along the optical axis. The second element is configured to allow light passage therethrough and is oriented with respect to the optical axis and the first element such that at a predetermined angle of incidence of an input light beam onto the second element, the input light beam is reflected onto the reflective surface of the first element and reflected therefrom to pass through the second element.Type: ApplicationFiled: December 3, 2004Publication date: December 22, 2005Applicant: Nova Measuring Instruments Ltd.Inventors: David Scheiner, Michael Winik, Yakov Lyubchik