Abstract: A projection objective (5) for microlithography for projecting a pattern arranged in an object plane (8) of the projection objective (5) has in the light path between the object plane (8) and the image plane (11) at least one beam deflecting device (19) with at least one totally reflective surface (17) that is inclined to an incidence direction of the radiation incident on the totally reflective surface (17) in such a way that substantially all the radiation coming from the object plane (8) and striking the totally reflective surface (17) is totally reflected at the totally reflective surface (17). A high reflectivity in conjunction with high angle of incidence with respect to the surface normal to the totally reflective surface (17) can be achieved with the aid of the beam deflecting device (19).

Abstract: A relatively high spectral bandwidth objective employed for use in imaging a specimen and method for imaging a specimen is provided. The objective comprises a lens group having at least one focusing lens configured to receive light energy and form an intermediate image, at least one field lens oriented to receive the intermediate image and provide intermediate light energy, and a Mangin mirror arrangement positioned to receive the intermediate light energy and apply light energy to the specimen. The objective may provide, in certain instances, a spectral bandwidth up to approximately 193 to 266 nanometers and can provide numerical apertures in excess of 0.9. Elements are less than 100 millimeters in diameter and may fit within a standard microscope. The field lens may comprise more than one lens and may be formed of a material different from at least one other lens in the objective.

Abstract: An optical projection lens system for microlithography includes in the direction of propagating radiation: a first lens group having positive refractive power, a second lens group having negative refractive power and a waist (constriction) with a minimum diameter of the propagating radiation, and a further lens arrangement with positive refractive power, which follows the second lens group. At least one lens of the projection lens system which is arranged in front of the waist includes an aspherical surface.

Abstract: A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane; wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image; pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and all concave mirrors are arranged optically remote from a pupil surface.

Abstract: A projection objective has at least five lens groups (G1 to G5) and has several lens surfaces. At least two aspheric lens surfaces are arranged so as to be mutually adjacent. These mutually adjacently arranged lens surfaces are characterized as a double asphere. This at least one double asphere (21) is mounted at a minimum distance from an image plane (0?) which is greater than the maximum lens diameter (D2) of the objective.

Abstract: A high performance objective having very small central obscuration, an external pupil for apertureing and Fourier filtering, loose manufacturing tolerances, large numerical aperture, long working distance, and a large field of view is presented. The objective is preferably telecentric. The design is ideally suited for both broad-band bright-field and laser dark field imaging and inspection at wavelengths in the UV to VUV spectral range.

Abstract: A reduced size catadioptric inspection system employing a catadioptric objective and immersion substance is disclosed. The objective may be employed with light energy having a wavelength in the range of approximately 190 nanometers through the infrared light range, and can provide numerical apertures in excess of 0.9. Elements are less than 100 millimeters in diameter and may fit within a standard microscope. The objective comprises a focusing lens group, a field lens, a Mangin mirror arrangement, and an immersion substance or liquid between the Mangin mirror arrangement and the specimen. A variable focal length optical system for use with the objective in the catadioptric inspection system is also disclosed.

Abstract: A catadioptric projection objective is used to project a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the formation of at least one real intermediate image and has an image-side numerical aperture NA>0.7. The projection objective comprises an optical axis and at least one catadioptric objective part that comprises a concave mirror and a first folding mirror. There are a first beam section running from the object plane to the concave mirror and a second beam section running from the concave mirror to the image plane. The first folding mirror is arranged with reference to the concave mirror in such a way that one of the beam sections is folded at the first folding mirror and the other beam section passes the first folding mirror without vignetting, the first beam section and the second beam section crossing one another in a cross-over region.

Abstract: A design for inspecting specimens, such as photomasks, for unwanted particles and features such as pattern defects is provided. The system provides no central obscuration, an external pupil for aperturing and Fourier filtering, and relatively relaxed manufacturing tolerances, and is suited for both broad-band bright-field and laser dark field imaging and inspection at wavelengths below 365 nm. In many instances, the lenses used may be fashioned or fabricated using a single material. Multiple embodiments of the objective lensing arrangement are disclosed, all including at least one small fold mirror and a Mangin mirror. The system is implemented off axis such that the returning second image is displaced laterally from the first image so that the lateral separation permits optical receipt and manipulation of each image separately.

Abstract: A force measuring apparatus uses a flexible cantilever beam engaging a tool at one end and a handle at the other end so that a force, normal to the beam, can be applied and delivered to the tool. Mounted in spaced apart longitudinal alignment on each side of the beam, is a tensioned wire, and a vibratory modulator in electromagnetic communication with the wire causing the wire to vibrate. A vibratory sensor is also positioned on each side of the beam in sensory communication with each respective wire.

Abstract: An ultra-broadband ultraviolet (UV) catadioptric imaging microscope system with wide-range zoom capability. The microscope system, which comprises a catadioptric lens group and a zooming tube lens group, has high optical resolution in the deep UV wavelengths, continuously adjustable magnification, and a high numerical aperture. The system integrates microscope modules such as objectives, tube lenses and zoom optics to reduce the number of components, and to simplify the system manufacturing process. The preferred embodiment offers excellent image quality across a very broad deep ultraviolet spectral range, combined with an all-refractive zooming tube lens. The zooming tube lens is modified to compensate for higher-order chromatic aberrations that would normally limit performance.

Abstract: The present invention relates to an enclosure that protects an operational data storage device (preferably a common disk data storage devices with an IDE interface) from fire, flood or other hazards. The preferred embodiment comprises an enclosure which is water resistant and heat transfer protected to preserve the disk data storage device in the event of disaster involving flood or fire. Insulation, including phase change materials, are used to maintain internal temperature during normal operation and during fire conditions, so as to meet the thermal test portion of UL 72, Class 125, one hour, and the disk data storage device temperature does not exceed 125° C. The enclosure of the preferred embodiment manages humidity to an internal RH at 80% or below.

Abstract: The invention provides a series of reagent compositions and methods for making and amplifying novel cDNA based probe sets from RNA samples to improve analysis with gene expression arrays. The methods globally produce probe sets with common universal linkers at one or both ends, called WRAP-Probes, wherein the linkers do not bind to the target sequences and they can efficiently bind added reporters to the probes. The universal linkers are also designed as primer binding sites for copying and amplifying the probes, either linearly with one linker, or exponentially with double linkers. The capacity to globally and exponentially amplify the probe set by PCR is a primary advantage. Adding reporters by terminal linkers also improves quantification since each probe gets equivalent signaling. The invention allows expression analysis of small research, clinical and forensic samples to enable improved diagnostics, drug discovery, therapeutic monitoring, and medical, agricultural and general research.

Abstract: A system for multiple mode imaging is disclosed herein. The system is a catadioptric system preferably having an NA greater than 0.9, highly corrected for low and high order monochromatic aberrations. This system uses unique illumination entrances and can collect reflected, diffracted, and scattered light over a range of angles. The system includes a catadioptric group, focusing optics group, and tube lens group. The catadioptric group includes a focusing mirror and a refractive lens/mirror element. The focusing optics group is proximate to an intermediate image, and corrects for aberrations from the catadioptric group, especially high order spherical aberration and coma. The tube lens group forms the magnified image. Different tube lens groups can be used to obtain different magnifications, such as a varifocal tube lens group to continuously change magnifications from 20 to 200×. Multiple imaging modes are possible by varying the illumination geometry and apertures at the pupil plane.

Abstract: A system for multiple mode imaging is disclosed. The catadioptric system has an NA greater than 0.65, and preferably greater than 0.9, highly corrected for low and high order monochromatic aberrations. The system employs unique illumination entrances and optics to collect reflected, diffracted, and scattered light over a range of angles. Multiple imaging modes are possible by varying the illumination geometry and apertures at the pupil plane. Illumination can enter the catadioptric optical system using an auxiliary beamsplitter or mirror, or through the catadioptric elements at any angle from 0 to 85 degrees from vertical. The system may employ a relayed pupil plane, used to select different imaging modes, provide simultaneous operation of different imaging modes, Fourier filtering, and other pupil shaping operations.

Abstract: A system for multiple mode imaging is disclosed herein. The system is a catadioptric system preferably having an NA greater than 0.9, highly corrected for low and high order monochromatic aberrations. This system uses unique illumination entrances and can collect reflected, diffracted, and scattered light over a range of angles. The system includes a catadioptric group, focusing optics group, and tube lens group. The catadioptric group includes a focusing mirror and a refractive lens/mirror element. The focusing optics group is proximate to an intermediate image, and corrects for aberrations from the catadioptric group, especially high order spherical aberration and coma. The tube lens group forms the magnified image. Different tube lens groups can be used to obtain different magnifications, such as a varifocal tube lens group to continuously change magnifications from 20 to 200×. Multiple imaging modes are possible by varying the illumination geometry and apertures at the pupil plane.

Abstract: The present invention provides methods and devices for making new and inexpensive miniarrays suitable for gene expression analysis. Also provided herein are methods of diagnosis for specific tissue or condition using specialized diagnostic miniarrays that exhibit specific visual pattern as diagnostic readout.

Abstract: A system for imaging is disclosed herein. The system has a numerical aperture (NA) preferably greater than 0.9, but greater than 0.65, and uses unique illumination entrances to collect reflected, diffracted, and scattered light over a range of angles. The system includes a catadioptric group, focusing optics group, and tube lens group. Illumination can enter the catadioptric optical system using an auxiliary beamsplitter or mirror, or through the catadioptric group at any angle from 0 to 85 degrees from vertical. The high NA catadioptric system can also have a relayed pupil plane, used to select different imaging modes, providing simultaneous operation of different imaging modes, Fourier filtering, and other pupil shaping operations.

Abstract: An optical system comprising three lens sections, a catadioptric objective lens section, a reimaging lens section and a zoom lens section, which are all aligned along the optical path of the optical system. The reimaging lens section re-images the system pupil such that the re-imaged pupil is accessible separately from any of the lens sections. The reimaging lens section includes an intermediate focus lens group, which is used to create an intermediate focus, a recollimating lens group, which is used to recollimate the light traveling from the intermediate focus lens group, refocusing group to generate the re-image of the pupil. The optical system may also include a beamsplitter, which creates a separated illumination pupil and collection pupil.

Abstract: An all-reflective optical system for a projection photolithography camera has a source of EUV radiation, a wafer and a mask to be imaged on the wafer. The optical system includes a first convex mirror, a second mirror, a third convex mirror, a fourth concave mirror, a fifth convex mirror and a sixth concave mirror. The system is configured such that five of the six mirrors receives a chief ray at an incidence angle of less than substantially 9°, and each of the six mirrors receives a chief ray at an incidence angle of less than substantially 14°. Four of the six reflecting surfaces have an aspheric departure of less than substantially 12 &mgr;m. Five of the six reflecting surfaces have an aspheric departure of less than substantially 12 &mgr;m. Each of the six reflecting surfaces has an aspheric departure of less than substantially 16 &mgr;m.