Patents by Inventor David Shawn O'Grady

David Shawn O'Grady has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus for tuning an attenuating phase shift mask
    Patent number: 6165651
    Abstract: The present invention provides a method and an apparatus for tuning the phase shifting of a phase shift mask having an attenuating phase shifting material providing at least 160.degree. of phase shift. The method comprising the utilization of a phase measurement and selective etching operations which reduces the challenge of making an exacting 180.degree. phase shifting mask. An attenuated phase shift mask structure is also disclosed in the present invention.
    Type: Grant
    Filed: September 10, 1999
    Date of Patent: December 26, 2000
    Assignee: International Business Machines Corporation
    Inventors: William John Adair, David Shawn O'Grady, Song Peng
  • Method for tuning an attenuating phase shift mask
    Patent number: 6027837
    Abstract: The present invention provides a method and an apparatus for tuning the phase shifting of a phase shift mask having an attenuating phase shifting material providing at least 160.degree. of phase shift. The method comprising the utilization of a phase measurement and selective etching operations which reduces the challenge of making an exacting 180.degree. phase shifting mask. An attenuated phase shift mask structure is also disclosed in the present invention.
    Type: Grant
    Filed: January 4, 1999
    Date of Patent: February 22, 2000
    Assignee: International Business Machines Corporation
    Inventors: William John Adair, David Shawn O'Grady, Song Peng
  • Adaptive inspection method and system
    Patent number: 5978501
    Abstract: A method and system for detecting defects in the design of a photolithographic mask or a printed wafer. It derives an adaptive inspection algorithm that allows for a tighter inspection of a mask to a data set which has repeatable differences. The inspection should allow flexibility to remove un-important differences while maintaining a tight inspection capability.
    Type: Grant
    Filed: January 3, 1997
    Date of Patent: November 2, 1999
    Assignee: International Business Machines Corporation
    Inventors: Karen Marie Dusablon Badger, Brian Joseph Grenon, David Shawn O'Grady, Jacek Grzegorz Smolinski