Abstract: A fluid flow control apparatus precisely controls a slight flow of fluid being mixed with a carrier gas. The apparatus includes a container for containing the fluid and a conduit for conducting the fluid, one portion of the conduit having a smaller diameter than the other, the smaller diameter portion of the conduit Including a needle valve for controlling the flow of the carrier gas into the conduit. A fluid transmission line connected at one end to the conduit and at the other end to the container conducts fluid from the container into the conduit to be mixed with the carrier gas before the mixture is introduced into a reacting chamber.

Abstract: Improved gas exhaust apparatus of a semiconductor plant for substantially reducing the accumulation of solid substance on the surface of a gas exhaust system is disclosed. The apparatus includes a heating section for providing a thermal chamber, thereby transforming incoming gas and oxygen into solid substance. A barrier section is secured to an inner surface of the heating section for preventing the solid substance from accumulating on the inner surface of the heating section. A scrubbing section attached to the heating section is used to expel the solid substance out of the gas exhaust apparatus.