Patents by Inventor David T Dutton

David T Dutton has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7812307
    Abstract: Aspects of the invention include sample ionizing devices and methods of use thereof. Embodiments of the sample ionizing devices include a microplasma generation source with a plasma generation region, a sample input port for delivering a sample to the plasma generation region, and a gas flow element configured to flow gas through the microplasma generation source independently of the sample input port. The devices and methods of the invention find use in a variety of different applications, including analyte detection applications.
    Type: Grant
    Filed: July 11, 2006
    Date of Patent: October 12, 2010
    Assignee: Agilent Technologies, Inc.
    Inventors: David T. Dutton, Randall S. Urdahl, Arthur Schleifer, Karen L. Seward
  • Patent number: 7554177
    Abstract: An attachment system. The attachment system includes a first structure and a second structure. The first structure has a surface and a recess in the surface. The second structure is molded into the recess and extends above the surface. The second structure adheres to the first structure at a boundary of the recess.
    Type: Grant
    Filed: October 5, 2005
    Date of Patent: June 30, 2009
    Assignee: Avago Technologies Wireless IP (Singapore) Pte. Ltd.
    Inventors: Frank S. Geefay, David T. Dutton, Qing Bai
  • Patent number: 7397560
    Abstract: A contamination detector in accordance with one embodiment of the invention includes a plasma generation system operable to direct an atmospheric plasma discharge towards a surface. The contamination detector further includes a light capture system to capture light generated by interaction of the atmospheric plasma discharge with the surface. The light capture system guides the captured light to an optical detection system configured to detect a contaminant.
    Type: Grant
    Filed: April 4, 2006
    Date of Patent: July 8, 2008
    Assignee: Agilent Technologies, Inc.
    Inventors: Karen L. Seaward, David T. Dutton
  • Publication number: 20080032238
    Abstract: Techniques for controlling the size and/or distribution of a catalyst nanoparticles on a substrate are provided. The catalyst nanoparticles comprise any species that can be used for growing a nanostructure, such as a nanotube, on the substrate surface. Polymers are used as a carrier of a catalyst payload, and such polymers self-assemble on a substrate thereby controlling the size and/or distribution of resulting catalyst nanoparticles. Amphiphilic block copolymers are known self-assembly systems, in which chemically-distinct blocks microphase-separate into a nanoscale morphology, such as cylindrical or spherical, depending on the polymer chemistry and molecular weight. Such block copolymers are used as a carrier of a catalyst payload, and their self-assembly into a nanoscale morphology controls size and/or distribution of resulting catalyst nanoparticles onto a substrate.
    Type: Application
    Filed: September 16, 2005
    Publication date: February 7, 2008
    Inventors: Jennifer Q. Lu, Nicolas J. Moll, Daniel B. Roitman, David T. Dutton
  • Patent number: 6682657
    Abstract: A method of forming three-dimensional structures on a substrate by a single reactive ion each run whereby a mask is formed on said substrate before a series of iterations are carried out, each iteration including a mask etch and a substrate etch, so that successive iterations give life to reduction in the mask area and exposure of further areas of substrate.
    Type: Grant
    Filed: July 7, 1998
    Date of Patent: January 27, 2004
    Assignee: Qinetiq Limited
    Inventors: David T Dutton, Anthony B Dean
  • Publication number: 20030057177
    Abstract: A method of forming three-dimensional structures on a substrate by a single reactive ion each run whereby a mask is formed on said substrate before a series of iterations are carried out, each iteration including a mask etch and a substrate etch, so that successive iterations give life to reduction in the mask area and exposure of further areas of substrate.
    Type: Application
    Filed: July 7, 1998
    Publication date: March 27, 2003
    Inventors: DAVID T DUTTON, ANTHONY B DEAN