Patents by Inventor David T. Mattson

David T. Mattson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Selective removal of boron doped carbon hard mask layers
    Patent number: 9691590
    Abstract: Systems and methods for processing a substrate include arranging a substrate including a film layer on a substrate support in a processing chamber. The film layer includes a boron doped carbon hard mask. A plasma gas mixture is supplied and includes molecular hydrogen, nitrogen trifluoride, and a gas selected from a group consisting of carbon dioxide and nitrous oxide. Plasma is struck in the processing chamber or supplied to the processing chamber for a predetermined stripping period. The plasma strips the film layer during the predetermined stripping period and the plasma is extinguished.
    Type: Grant
    Filed: June 9, 2016
    Date of Patent: June 27, 2017
    Assignee: LAM RESEARCH CORPORATION
    Inventor: David T. Mattson
  • SELECTIVE REMOVAL OF BORON DOPED CARBON HARD MASK LAYERS
    Publication number: 20160379803
    Abstract: Systems and methods for processing a substrate include arranging a substrate including a film layer on a substrate support in a processing chamber. The film layer includes a boron doped carbon hard mask. A plasma gas mixture is supplied and includes molecular hydrogen, nitrogen trifluoride, and a gas selected from a group consisting of carbon dioxide and nitrous oxide. Plasma is struck in the processing chamber or supplied to the processing chamber for a predetermined stripping period. The plasma strips the film layer during the predetermined stripping period and the plasma is extinguished.
    Type: Application
    Filed: June 9, 2016
    Publication date: December 29, 2016
    Inventor: David T. Mattson