Patents by Inventor David T. Wei

David T. Wei has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11957893
    Abstract: A neuromodulation therapy is delivered via at least one electrode implanted subcutaneously and superficially to a fascia layer superficial to a nerve of a patient. In one example, an implantable medical device is deployed along a superficial surface of a deep fascia tissue layer superficial to a nerve of a patient. Electrical stimulation energy is delivered to the nerve through the deep fascia tissue layer via implantable medical device electrodes.
    Type: Grant
    Filed: August 25, 2020
    Date of Patent: April 16, 2024
    Assignee: Medtronic, Inc.
    Inventors: Brad C. Tischendorf, John E. Kast, Thomas P. Miltich, Gordon O. Munns, Randy S. Roles, Craig L. Schmidt, Joseph J. Viavattine, Christian S. Nielsen, Prabhakar A. Tamirisa, Anthony M. Chasensky, Markus W. Reiterer, Chris J. Paidosh, Reginald D. Robinson, Bernard Q. Li, Erik R. Scott, Phillip C. Falkner, Xuan K. Wei, Eric H. Bonde, David A. Dinsmoor, Duane L. Bourget, Forrest C M Pape, Gabriela C. Molnar, Joel A. Anderson, Michael J. Ebert, Richard T. Stone, Shawn C. Kelley, Stephen J. Roddy, Timothy J. Denison, Todd V. Smith
  • Patent number: 11957894
    Abstract: A neuromodulation therapy is delivered via at least one electrode implanted subcutaneously and superficially to a fascia layer superficial to a nerve of a patient. In one example, an implantable medical device is deployed along a superficial surface of a deep fascia tissue layer superficial to a nerve of a patient. Electrical stimulation energy is delivered to the nerve through the deep fascia tissue layer via implantable medical device electrodes.
    Type: Grant
    Filed: August 25, 2020
    Date of Patent: April 16, 2024
    Assignee: Medtronic, Inc.
    Inventors: Anthony M. Chasensky, Bernard Q. Li, Brad C. Tischendorf, Chris J. Paidosh, Christian S. Nielsen, Craig L. Schmidt, David A. Dinsmoor, Duane L. Bourget, Eric H. Bonde, Erik R. Scott, Forrest C M Pape, Gabriela C. Molnar, Gordon O. Munns, Joel A. Anderson, John E. Kast, Joseph J. Viavattine, Markus W. Reiterer, Michael J. Ebert, Phillip C. Falkner, Prabhakar A. Tamirisa, Randy S. Roles, Reginald D. Robinson, Richard T. Stone, Shawn C. Kelley, Stephen J. Roddy, Thomas P. Miltich, Timothy J. Denison, Todd V. Smith, Xuan K. Wei
  • Patent number: 7495230
    Abstract: An integrated plasmon detector includes a top layer of material adapted to generate a plasmon when excited by a beam of light incident onto a surface of the top layer, an interface layer joined to the top layer opposite from the surface of the top layer and adapted to slow polarons emitted by the plasmon to thermal electrons, and a collector layer joined to the interface layer opposite from the top layer and adapted to collect the thermal electrons from the interface layer.
    Type: Grant
    Filed: August 16, 2005
    Date of Patent: February 24, 2009
    Assignee: California Institute of Technology
    Inventors: David T. Wei, Axel Scherer
  • Patent number: 7297966
    Abstract: A method for monitoring the surface roughness of a metal, comprises impinging a laser beam onto the surface of a metal layer to induce the formation of a plasmon therein, and monitoring a current of decay electrons emitted by the plasmon.
    Type: Grant
    Filed: August 16, 2005
    Date of Patent: November 20, 2007
    Assignee: California Institute of Technology
    Inventors: David T. Wei, Axel Scherer
  • Patent number: 6190511
    Abstract: A technique for ion beam sputter deposition of optical coatings. The technique includes the following features (i) an assist chemical emitted towards the sputter target to oppose the tendency of film growth on the target; (ii) a discriminate baffle to capture ions or assist chemicals reflected from the target; (iii) a screen chemical to protect the coating area from the assist chemical; (iv) compartmentalized of the coating chamber to reduce crossing effects between the different chemicals (D.W.) (C.L.); (v) a compartmentalized assist ion beam to modify the coating and to reduce microstructure, defects and impurities in the coating (D.W.) (C.L.); and (vi) to combine the above features or multiply use one of the above features to further advantage or to increase throughput.
    Type: Grant
    Filed: February 6, 1998
    Date of Patent: February 20, 2001
    Inventor: David T. Wei
  • Patent number: 4142958
    Abstract: A method for fabricating multiple layer interference optical films by ion beam sputtering, said films being used for mirrors in a ring laser apparatus. An ion beam strikes a target material obliquely, dislodging molecules of the target so that they can be deposited on a surface serving as a base for a multiple layer interference coating. The thickness of the coating is monitored so that the proper thickness of a given layer can be optimized to obtain the type of reflectance desired for a given light wave length. The surface to be coated is rotated during the deposition of the layer of target material. A stack of layers of alternating indices of refraction comprises the optical interference film. The coating process occurs inside of a vacuum chamber where the partial pressures of the gases are carefully controlled to insure the proper ion beam intensity and optimum stoichiometry of the deposited optical films.
    Type: Grant
    Filed: April 13, 1978
    Date of Patent: March 6, 1979
    Assignee: Litton Systems, Inc.
    Inventors: David T. Wei, Anthony W. Louderback
  • Patent number: RE32849
    Abstract: A method for fabricating multiple layer interference optical films by ion beam sputtering, said films being used for mirrors in a ring laser apparatus. An ion beam strikes a target material obliquely, dislodging molecules of the target so that they can be deposited on a surface serving as a base for a multiple layer interference coating. The thickness of the coating is monitored so that the proper thickness of a given layer can be optimized to obtain the type of reflectance desired for a given light wave length. The surface to be coated is rotated during the deposition of the layer of target material. A stack of layers of alternating indices of refraction comprises the optical interference film. The coating process occurs inside of a vacuum chamber where the partial pressures of the gases are carefully controlled to insure the proper ion beam intensity and optimum stoichiometry of the deposited optical films.
    Type: Grant
    Filed: July 2, 1985
    Date of Patent: January 31, 1989
    Assignee: Litton Systems, Inc.
    Inventors: David T. Wei, Anthony W. Louderback