Abstract: A breast pump (1) comprising: a casing (2); a milk collection unit (4) comprising a breast shield (6) and a tank (8) suitable for being fluidly connected, the milk collection unit (4) being suitable for being attached as a whole to the casing (2), after the breast shield (6) and the tank (8) have been fluidly connected, and being separated from the casing (2) while holding the breast shield (6) and the tank (8) fluidly connected; and a pump (18) arranged in the casing (8), the pump being configured to cause extraction of milk from a breast positioned against the breast shield when the milk collection unit (4) is attached to the casing (2), so as to cause a flow of milk from the breast shield (6) to the tank (8).

Abstract: An exhaust bypass valve assembly for an internal combustion engine includes an exhaust bypass valve having valve structure coupled to a rotatable shaft such that rotation of the shaft moves the valve structure between opened and closed positions. An actuator is disposed remotely from the bypass valve for selectively causing rotation of the shaft associated with the valve structure in opposing directions. Linkage structure is connected between the actuator and the shaft to transfer motion of actuator to the shaft.

Abstract: A photomask repair method is provided which has the spatial resolution of a focused energy beam process without the corresponding potential for damage to the photomask pattern and underlying transparent substrate. A photomask defect is repaired by first providing a masking film over the photomask pattern. Next, a high spatial resolution focused energy beam repair technique, such as laser ablation, focused ion beam, or electron beam, is used to remove a portion of the masking film which corresponds to an underlying defect in the photomask pattern. After the defect in the photomask pattern has been exposed and the rest of the non-defective photomask pattern is protected by the masking film, a chemical etching process is used to remove the defect which selectively etches the photomask pattern material without harming the underlying substrate. Once the defect has been removed, the masking film is removed.