Abstract: A hand-held device includes a display, a position sensor, a communication port operable to receive screen image data, and a processor. The processor is operable to determine a new cursor position in response to a change of position detected by the position sensor. The processor is additionally operable either to display on the display a window of an image positionally referenced to the new cursor position in response to screen image data when the hand-held device is operated in a remote mode. Alternatively, the processor is operable to display on the display a local image in response to local image data and a cursor icon overlaid on the local image when the hand-held device is operated in a local mode. The image displayed represents a fractional portion of the local image data, and the fractional portion is selected in response to the new cursor position.

Abstract: A hand-held device includes a display, a position sensor, a communication port operable to receive screen image data, and a processor. The processor is operable to determine a new cursor position in response to a change of position detected by the position sensor. The processor is additionally operable either to display on the display a window of an image positionally referenced to the new cursor position in response to screen image data when the hand-held device is operated in a remote mode. Alternatively, the processor is operable to display on the display a local image in response to local image data and a cursor icon overlaid on the local image when the hand-held device is operated in a local mode. The image displayed represents a fractional portion of the local image data, and the fractional portion is selected in response to the new cursor position.

Abstract: A method for planarizing a substrate surface having a non-planar surface topography comprises forming a material layer over the substrate, the material layer having a surface topography, determining the surface topography of the material layer, and forming a mask using information relating to the surface topography of the material layer. The mask defines portions of averaging regions of the material layer for selective removal to equalize the averaging regions in average height, the averaging regions having a maximum dimension. The material layer is etched using the mask, and a planarizing layer is formed over the substrate surface. The planarizing layer provides a low-pass lateral filtering effect characterized by a length greater than the maximum dimension of the averaging region.