Abstract: An E×B Wien mass filter provides an independently-adjustable electric field combined with the dipole electric field required for mass separation. The independently adjustable electric field can be used provide a larger optical aperture, to correct astigmatism and to deflect the beam in direction parallel and/or perpendicular to the magnetic field.

Abstract: An ExB Wien mass filter provides an independently-adjustable electric field combined with the dipole electric field required for mass separation. The independently adjustable electric field can be used provide a larger optical aperture, to correct astigmatism and to deflect the beam in direction parallel and/or perpendicular to the magnetic field.

Abstract: A mass filter for an ion beam system includes at least two stages and reduces chromatic aberration. One embodiment includes two symmetrical mass filter stages, the combination of which reduces or eliminates chromatic aberration, and entrance and exit fringing field errors. Embodiments can also prevent neutral particles from reaching the sample surface and avoid crossovers in the beam path. In one embodiment, the filter can pass a single species of ion from a source that produces multiple species. In other embodiments, the filter can pass a single ion species with a range of energies and focus the multi-energetic ions at the same point on the substrate surface.

Abstract: A mass filter for an ion beam system includes at least two stages and reduces chromatic aberration. One embodiment includes two symmetrical mass filter stages, the combination of which reduces or eliminates chromatic aberration, and entrance and exit fringing field errors. Embodiments can also prevent neutral particles from reaching the sample surface and avoid crossovers in the beam path. In one embodiment, the filter can pass a single species of ion from a source that produces multiple species. In other embodiments, the filter can pass a single ion species with a range of energies and focus the multi-energetic ions at the same point on the substrate surface.

Abstract: A multibeam system in which a charged particle beam and one or more additional beams can be directed to the target within a single vacuum chamber. A first beam colunm preferably produces a beam for rapid processing, and a second beam column produces a beam for more precise processing. A third beam column can be used to produce a beam useful for forming an image of the sample while producing little or no change in the sample.

Abstract: A method is disclosed for directly synthesizing nanoscale structures, particularly in defined locations. The method overcomes problems in nanoscale manufacturing by enabling the direct fabrication of composites useful for constructing electronic devices. In one aspect of the method, nanotubes and arrays of nanotubes are synthesized directly at defined locations useful for constructing electronic devices.

Abstract: A microcolumn including a plurality of beam modification components coupled to an assembly substrate, wherein the plurality of beam modification components includes: (1) an extractor component; (2) a first focusing electrode component; (3) a first anode component; (4) a first deflector component; (5) a second focusing electrode component; (6) a second deflector component; (7) a third focusing electrode component; (8) a third deflector component; (9) a second anode component; (10) a fourth focusing electrode component; and (11) a third anode component. The beam modification components may be ordered on the substrate in this sequence or other sequences.

Abstract: A microcolumn including a plurality of beam modification components coupled to an assembly substrate, wherein the plurality of beam modification components includes: (1) an extractor component; (2) a first focusing electrode component; (3) a first anode component; (4) a first deflector component; (5) a second focusing electrode component; (6) a second deflector component; (7) a third focusing electrode component; (8) a third deflector component; (9) a second anode component; (10) a fourth focusing electrode component; and (11) a third anode component. The beam modification components may be ordered on the substrate in this sequence or other sequences.