Abstract: An integrated intra-bay transfer, storage and delivery system is provided for moving an article between a conveyor and a station such as a work station. The system includes a transfer assembly which includes a lift mechanism and a displacement mechanism. The transfer assembly transfers the article between the conveyor system and a buffer or storage station for storage of the article. A delivery robot transfers the article between the buffer or storage station and a work station for delivery to the station. The robot includes a vertical movement mechanism and a horizontal movement mechanism. The robot also includes an arm that is adapted to grip the article, particularly an article of a standard configuration having a mushroom-shaped handle on top. The arm engages the handle and lifts the article or transport pod from the storage station to a load port of the work station. In one embodiment, the arm includes a C-shaped adaptation that passively engages the handle from a side thereof.

Abstract: A control device for converting a manual input into an electrical signal is provided. The control device includes a control button, a first magnet having a first predetermined polarity, a second magnet having a second predetermined polarity, and a hall-effect sensor located adjacent to the control button. The control button is mounted for pivotal displacement about a neutral position in accordance with the manual input. The first magnet and the second magnet are mounted to the control button. The polarity of the second magnet is opposite the polarity of the first magnet. The hall-effect sensor has an electrical input and an electrical output. The electrical signal produced by the control device may, for example, be used to control the velocity of a motor, which rotates an ultrasound transducer.

Abstract: A verification system monitors the operation of a digital control system in order to insure proper operation. The verification system receives control signals and monitors these control signals to determine whether operation is proper. The digital control system is adapted for operational control of various equipment. The verification system monitors control signals received from the digital control system as well as the status of the equipment, where appropriate, in determining whether the operation of the digital control system is proper. The verification system includes various portions which monitor the control signals at various stages. If there is an error detected at one of the stages, an error signal is generated which prevents operation of the associated equipment.

Abstract: An absolute encoder monitors rotary position and senses rotary displacement relative to a measuring scale. The absolute encoder evaluates rotary displacement by providing a plurality of rotatably mounted encoder wheels, and each wheel includes at least one code sequence which in combination comprises the measuring scale. A pinion is provided between each pair of encoder wheels in order that each of the encoder wheels will be rotated upon the rotation of the shaft. Each code sequence of the encoder wheel is monitored by a sensing mechanism and this information is utilized to evaluate the shaft position. The sensing mechanism includes both light emitting and light detecting devices which monitor a defined region of each code sequence and this is evaluated in determining the rotary position.

Abstract: A drive system with a rotary stop for driving a rotatable load is provided having a motor, a rotary stop and a spring stop assembly for coupling the motor to the rotary stop. The spring stop assembly has a motor-driven gear coupled to a hub by a torsional spring. A position encoder may be attached to the motor. In addition, a drive shaft may be coupled to the motor and the multiturn rotary stop through the spring stop assembly.

Abstract: A thermal reactor system for semiconductor processing incorporates a reaction vessel with a rectangular quartz tube with reinforcing parallel quartz gussets. The gussets enable sub-ambient pressure processing, while the rectangular tube maximizes reactant gas flow uniformity over a wafer being processed. The gussets facilitate effective cooling, while minimally impairing heating of the wafer by allowing minimal wall thickness. The thermal reactor system further includes a gas source for supplying reactant gas and an exhaust handling system for removing spent gases from and establishing a reduced pressure within the reaction vessel. An array of infrared lamps is used to radiate energy through the quartz tube; the lamps are arranged in a staggered relation relative to the quartz gussets to minimize shadowing. In addition, other non-cylindrical gusseted vessel geometries are disclosed which provide for improved sub-ambient pressure thermal processing of semiconductor wafers.

Abstract: A thermal reactor for epitaxial deposition on a wafer comprises a double-dome vessel and dual heat sources. Each heat source comprises inner and outer circular arrays of infrared lamps. Circumferential heating uniformity is assured by the cylindrical symmetry of the vessel and the heating sources. Radial heating uniformity is provided by independent control of inner and outer heating arrays for both the top and bottom heat sources. The relative temperatures of wafer and susceptor are controlled by adjusting relative energies provided by the upper and lower heat sources so that backside migration. Reduced pressure operation is provided for by the convex top and bottom domes. Due to the provided control over transmitted energy distribution, a susceptor can have low thermal mass so that elevated temperature can be achieved more quickly and cooling can be facilitated as well. This improves throughput and reduces manufacturing costs per wafer. Reagent gas introduction can be axial or radial as desired.

Abstract: A quartz window for a wafer reactor vessel has a flat bow for withstanding the pressure differential between the ambient outside pressure and the reduced pressure in the wafer chamber. The bow is enhanced at elevated operating temperatures to compensate for the flattening effect of higher pressure differentials. The enhanced bowing is provided by a rigid peripheral flange which radially confines the window. The thermal expansion within the window is not expressed radially, but is directed outward to increase the bow.

Abstract: A thermal reactor system for semiconductor processing incorporates a reaction vessel with a rectangular quartz tube with reinforcing parallel quartz gussets. The gussets enable sub-ambient pressure processing, while the rectangular tube maximizes reactant gas flow uniformity over a wafer being processed. The gussets facilitate effective cooling, while minimally impairing heating of the wafer by allowing minimal wall thickness. The thermal reactor system further includes a gas source for supplying reactant gas and an exhaust handling system for removing spent gases from and establishing a reduced pressure within the reaction vessel. An array of infrared lamps is used to radiate energy through the quartz tube; the lamps are arranged in a staggered relation relative to the quartz gussets to minimize shadowing. In addition, other non-cylindrical gusseted vessel geometries are disclosed which provide for improved sub-ambient pressure thermal processing of semiconductor wafers.