Abstract: The present disclosure is drawn to an amorphous thin metal film coated substrate including a crosslinked polymer substrate and a 10 angstrom nm to 10 ?m amorphous thin metal film applied directly to the crosslinked polymer substrate. The amorphous thin metal film can include from 10 at % to 50 at % of a metalloid, wherein the metalloid is carbon, silicon, boron, or a mixture thereof. The film can also include from 5 at % to 70 at % of a first metal and 5 at % to 70 at % of a second metal. The first and the second metal can be, independently, titanium, vanadium, chromium, iron, cobalt, nickel, zirconium, niobium, molybdenum, ruthenium, rhodium, palladium, hafnium, tantalum, tungsten, osmium, iridium, or platinum. The first metal and the second metal can also be from different periods of the periodic table of elements.