Abstract: A microaccelerometer is provided which has a silicon substrate bonded to a silicon capping plate and silicon back plate, wherein the bonds between the three silicon wafers are characterized by a relatively low residual stress level over a wide temperature range. The bonds are formed by means of an appropriate adhesive at a relatively low temperature without degradation to the microaccelerometer. The bonds between the silicon wafers also provide stress relief during use and packaging of the microaccelerometer. With this invention, the damping distance for the proof mass of the microaccelerometer is accurately controllable and stop means are provided for preventing excessive deflection of the proof mass in a direction perpendicular to the plane of the microaccelerometer.

Abstract: A method is disclosed for forming thin, suspended membranes of epitaxial silicon material. Silicon oxide strips having a predetermined thickness are first formed on a silicon substrate. The gap, or spacing, between adjaceant beams is preferably less than or equal to about 1.4 times the thickness of the silicon oxide strip. The underlying silicon substrate is exposed within these gaps in the silicon oxide layer, thereby the gaps provide a seed hole for subsequent epitaxial growth from the silicon substrate. Epitaxial silicon is grown through the seed holes and then allowed to grow laterally over the silicon oxide strips to form a continuous layer of epitaxial silicon over the silicon oxide strips. The backside of the silicon substrate, or surface opposite the surface having the silicon oxide strips, is then masked to delineate the desired diaphragm and microbridge pattern. The silicon is etched conventionally from the backside.