Patents by Inventor David Warren Burry

David Warren Burry has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for determining exposure settings, lithographic exposure apparatus, computer program and data carrier
    Patent number: 8208118
    Abstract: Embodiments of the invention relate to a method for determining exposure settings for a target field on a substrate in a lithographic exposure process, including providing calibration data by determining the position of a calibration field in a first direction at a plurality of calibration positions in a second and third direction relative to the position of the calibration field. The method also includes providing production data by establishing the position on the substrate of the target field in the second and third direction and by measuring the position of the exposure field in the first direction at least one measurement position relative to the position of the exposure field in the second and third direction.
    Type: Grant
    Filed: February 6, 2009
    Date of Patent: June 26, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: David Warren Burry, Ralph Brinkhof, Frank Staals, Robert Franken, Erik Johan Koop
  • Method for Determining Exposure Settings, Lithographic Exposure Apparatus, Computer Program and Data Carrier
    Publication number: 20090201473
    Abstract: Embodiments of the invention relate to a method for determining exposure settings for a target field on a substrate in a lithographic exposure process, including providing calibration data by determining the position of a calibration field in a first direction at a plurality of calibration positions in a second and third direction relative to the position of the calibration field. The method also includes providing production data by establishing the position on the substrate of the target field in the second and third direction and by measuring the position of the exposure field in the first direction at least one measurement position relative to the position of the exposure field in the second and third direction.
    Type: Application
    Filed: February 6, 2009
    Publication date: August 13, 2009
    Applicant: ASML Netherlands B.V.
    Inventors: David Warren BURRY, Ralph BRINKHOF, Frank STAALS, Robert FRANKEN, Erik Johan KOOP