Abstract: A method deposits a layer of an indium chalcogenide onto a substrate. The method includes the steps of: providing an indium source in a reaction zone, providing a gaseous source of a chalcogen in the reaction zone, and heating the substrate. Thereby in the reaction zone, at a pressure of approximately atmospheric ambient pressure, the indium originating from the indium source and the chalcogen originating from the source of a chalcogen are converted to an indium chalcogenide being deposited onto the surface of the substrate.

Abstract: A method for deposition of titania, and titania-containing, thin films by CVD, using an atmospheric pressure glow discharge plasma as a major source of reaction, which leads to film properties, and film growth rates, normally only achievable (by atmospheric pressure CVD) with significantly higher substrate temperatures.

Abstract: A method of producing mirrors comprising depositing a reflecting metal layer by pyrolysis on a ribbon of hot glass during the glass production process characterized by applying to the glass ribbon prior to deposition of the reflecting metal layer a primer for enhancing metal nucleation on the glass. The invention also provides a method of producing mirrors during the glass production process the method comprising pre-treating the surface of a ribbon of hot glass with an activating agent and pyrolytically depositing over the pre-treated surface a reflecting metal layer.