Patents by Inventor David Y. Chan

David Y. Chan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20040209173
    Abstract: A method for creating a photomask which includes a layer of hard mask material the inclusion of which improves the uniformity of critical dimensions on the photomask by minimizing the affect of macro and micro loading. The method for producing the photomask of the instant invention includes two etching processes. The first etching process etches the layer of hard mask, and the second etching process etches the anti-reflective material and opaque material.
    Type: Application
    Filed: May 4, 2004
    Publication date: October 21, 2004
    Inventor: David Y. Chan
  • Publication number: 20040141264
    Abstract: Resettable circuit interrupting devices, such as GFCI devices, that include a reset lockout mechanism, an independent trip mechanism and reverse wiring protection. A conical reset plunger is notched to force a successful test before reset.
    Type: Application
    Filed: December 29, 2003
    Publication date: July 22, 2004
    Inventors: Frantz Germain, Stephen Stewart, Roger M. Bradley, David Y. Chan, Nichalas L. Disalvo, William R. Ziegler
  • Patent number: 6749974
    Abstract: A method for creating a photomask which includes a layer of hard mask material the inclusion of which improves the uniformity of critical dimensions on the photomask by minimizing the affect of macro and micro loading. The method for producing the photomask of the instant invention includes two etching processes. The first etching process etches the layer of hard mask, and the second etching process etches the anti-reflective material and opaque material.
    Type: Grant
    Filed: September 3, 2002
    Date of Patent: June 15, 2004
    Assignee: Photronics, Inc.
    Inventor: David Y. Chan
  • Patent number: 6682861
    Abstract: A method for creating a phase shift photomask which includes a layer of hard mask material, the inclusion of which improves the uniformity of critical dimensions on the photomask by minimizing the affect of macro and micro loading. The method for producing the phase shift photomask of the instant invention includes two etching processes. The first etching process etches the layer of hard mask, and the second etching process etches opaque material (and anti-reflective layer, if used) and phase shift layers.
    Type: Grant
    Filed: February 19, 2003
    Date of Patent: January 27, 2004
    Assignee: Photronics, Inc.
    Inventor: David Y. Chan
  • Publication number: 20040004795
    Abstract: Resettable circuit interrupting devices, such as GFCI devices, that include neutral fault test simulation.
    Type: Application
    Filed: July 3, 2003
    Publication date: January 8, 2004
    Inventors: David Y. Chan, James Richter, Gerald N. King
  • Patent number: 6671145
    Abstract: Resettable circuit interrupting devices, such as GFCI devices, that include a reset lockout mechanism, an independent trip mechanism and reverse wiring protection. A conical reset plunger is notched to force a successful test before reset.
    Type: Grant
    Filed: March 20, 2001
    Date of Patent: December 30, 2003
    Assignee: Leviton Manufacturing Co., Inc.
    Inventors: Frantz Germain, Stephen Stewart, Roger M. Bradley, David Y. Chan, Nichalas L. Disalvo, William R. Ziegler
  • Publication number: 20030186137
    Abstract: A method for creating a phase shift photomask which includes a layer of hard mask material, the inclusion of which improves the uniformity of critical dimensions on the photomask by minimizing the affect of macro and micro loading. The method for producing the phase shift photomask of the instant invention includes two etching processes. The first etching process etches the layer of hard mask, and the second etching process etches opaque material (and anti-reflective layer, if used) and phase shift layers.
    Type: Application
    Filed: February 19, 2003
    Publication date: October 2, 2003
    Applicant: Photronics, Inc.
    Inventor: David Y. Chan
  • Patent number: 6556395
    Abstract: A device for providing ground fault protection for one or more loads in an electrical wiring system. The device includes a pickup for sensing electrical characteristics associated with conductors supplying power to the one or more loads and generating a pick up signal when predefined electrical characteristics are sensed; a ground fault detector powered using conductors that are independent of the conductors supplying power to the one or more loads, said ground fault detector being configured to receive said pickup signal, detect ground faults from said pickup signal, and generate a trigger signal when a ground fault is detected, and a power disconnect responsive to said trigger signal such that when said trigger signal is generated power to the one or more loads is disconnected. A corresponding method is also provided.
    Type: Grant
    Filed: July 6, 2000
    Date of Patent: April 29, 2003
    Assignee: Leviton Manufacturing Co., Inc.
    Inventors: David Y. Chan, Roger M. Bradley, Frantz Germain
  • Patent number: 6537708
    Abstract: A method for measuring critical dimensions on photomasks, and more specifically to a method for measuring critical dimensions on photomasks using an electrical test structure. The test structure 30 may be comprised of a cross resistor 32 for van der Pauw sheet resistance measurements, a bridge resistor 34, and a split-bridge resistor 36.
    Type: Grant
    Filed: January 31, 2001
    Date of Patent: March 25, 2003
    Assignee: Photronics, Inc.
    Inventor: David Y. Chan
  • Publication number: 20030013023
    Abstract: A method for creating a photomask which includes a layer of hard mask material the inclusion of which improves the uniformity of critical dimensions on the photomask by minimizing the affect of macro and micro loading. The method for producing the photomask of the instant invention includes two etching processes. The first etching process etches the layer of hard mask, and the second etching process etches the anti-reflective material and opaque material.
    Type: Application
    Filed: September 3, 2002
    Publication date: January 16, 2003
    Inventor: David Y. Chan
  • Patent number: 6472107
    Abstract: A method for creating a photomask which includes a layer of hard mask material the inclusion of which improves the uniformity of critical dimensions on the photomask by minimizing the affect of macro and micro loading. The method for producing the photomask of the instant invention includes two etching processes. The first etching process etches the layer of hard mask, and the second etching process etches the anti-reflective material and opaque material.
    Type: Grant
    Filed: September 30, 1999
    Date of Patent: October 29, 2002
    Assignee: Photronics, Inc.
    Inventor: David Y. Chan
  • Publication number: 20020135958
    Abstract: Resettable circuit interrupting devices, such as GFCI devices, that include a reset lockout mechanism, an independent trip mechanism and reverse wiring protection. A conical reset plunger is notched to force a successful test before reset.
    Type: Application
    Filed: March 20, 2001
    Publication date: September 26, 2002
    Inventors: Frantz Germain, Stephen Stewart, Roger M. Bradley, David Y. Chan, Nichalas L. Disalvo, William R. Ziegler
  • Publication number: 20020135957
    Abstract: Resettable circuit interrupting devices, such as GFCI devices, that include neutral fault test simulation.
    Type: Application
    Filed: March 20, 2001
    Publication date: September 26, 2002
    Inventors: David Y. Chan, James Richter, Gerald N. King
  • Publication number: 20020102472
    Abstract: A method for measuring critical dimensions on photomasks, and more specifically to a method for measuring critical dimensions on photomasks using an electrical test structure. The test structure 30 may be comprised of a cross resistor 32 for van der Pauw sheet resistance measurements, a bridge resistor 34, and a split-bridge resistor 36.
    Type: Application
    Filed: January 31, 2001
    Publication date: August 1, 2002
    Inventor: David Y. Chan
  • Patent number: 5917686
    Abstract: A high current ground fault circuit interrupter has an induction sensor mounted on the device remote from the ground fault circuit interrupter circuitry in such a manner as to allow cables capable of carrying larger currents than the current carrying capability of the contacts in the interrupter circuitry to be passed therethrough. The induction sensor carries a differential transformer for sensing line to ground faults and a neutral transformer for sensing neutral to ground faults. It makes use of an external contactor whose coil is engaged by contacts of the ground fault circuit interrupter to interrupt the cables carrying the high currents, even at a distance somewhat remote from the ground fault circuit interrupter. The induction sensor has the capability of carrying therethrough cables of 240 volts AC line to ground or line to line.
    Type: Grant
    Filed: August 26, 1997
    Date of Patent: June 29, 1999
    Assignee: Leviton Manufacturing Co., Inc.
    Inventors: David Y. Chan, Saul Rosenbaum
  • Patent number: 5864455
    Abstract: An in-line cord ground fault circuit interrupter which contains within a common housing the sensing unit and the tripping relay usually found separately packaged at a remote location. The fixed contacts are mounted on fixed contact arms mounted adjacent one surface of a printed circuit board with the movable contacts mounted on movable contact arms mounted adjacent the second surface. The tripping relay operates an armature between an open and a closed condition and by cams on the arms of the armature opens and closes the movable contacts with the fixed contacts. The two portion housing allows the components of the interrupter to be mounted on one portion of the housing which also supports the line and load conductors making assembly of the rear housing portion to the front housing portion easy. A stop member and a positioning post are provided on the interior of the front cover to check the position of the armature in the non-energized state to verify proper contact placement and gaps.
    Type: Grant
    Filed: October 1, 1997
    Date of Patent: January 26, 1999
    Assignee: Leviton Manufacturing Co., Inc.
    Inventors: Paul D. Gernhardt, David Y. Chan, Serge P. Krzyzanowski, James Richter
  • Patent number: D313971
    Type: Grant
    Filed: October 3, 1988
    Date of Patent: January 22, 1991
    Assignee: Leviton Manufacturing Co., Inc.
    Inventors: Saul Rosenbaum, Sergius P. Krzyzanowski, David Y. Chan