Patents by Inventor David Y. Kim

David Y. Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12097140
    Abstract: An absorbent article can have a topsheet layer, a liquid impermeable layer, and an absorbent core positioned between the topsheet layer and the liquid impermeable layer. The absorbent article can further include an exudate management layer in fluid communication with the topsheet layer. In various embodiments, the exudate management layer can be positioned on a body facing surface of the topsheet layer. In various embodiments, the exudate management layer can be positioned between the topsheet layer and the absorbent core. The exudate management layer has a first component which defines an opening for direct passage of body exudates into the absorbent core. The exudate management layer has a second component which at least partially overlaps the first component of the exudate management layer and further extends in the longitudinal direction of the absorbent article in a direction towards the posterior region of the absorbent article.
    Type: Grant
    Filed: March 29, 2018
    Date of Patent: September 24, 2024
    Assignee: Kimberly-Clark Worldwide, Inc.
    Inventors: Matthew D. Woods, David J. Nickel, Jason G. Csida, Palani Raj R. Wallajapet, Hwa Y. Kim
  • Patent number: 6731241
    Abstract: A dual-polarization common aperture antenna having fully populated common aperture dual polarized arrays. The inventive antenna includes a first and second arrays of radiating slots disposed in a faceplate. The second array is generally orthogonal and therefor cross-polarized relative to the first array. The first array is waveguide fed and the second array is stripline fed. In the illustrative implementation, the first array and the second array share a common aperture. The common aperture is fully populated and each array uses the aperture in its entirety. The first and second arrays of slots are arranged for four-way symmetry. Each slot in the first array is a vertically oriented, iris-excited shunt slot fed by a rectangular waveguide and centered on a broad wall thereof. The second array is a standing wave array in which each slot is an air cavity backed slot fed by an inverted micro-stripline offset from a center thereof.
    Type: Grant
    Filed: June 13, 2001
    Date of Patent: May 4, 2004
    Assignee: Raytheon Company
    Inventors: Pyong K. Park, Sang H. Kim, Joseph M. Anderson, Jack H. Anderson, Kevin P. Grabe, David Y. Kim, Richard M. Oestreich
  • Publication number: 20040056814
    Abstract: A dual-polarization common aperture antenna having fully populated common aperture dual polarized arrays. The inventive antenna includes a first and second arrays of radiating slots disposed in a faceplate. The second array is generally orthogonal and therefor cross-polarized relative to the first array. The first array is waveguide fed and the second array is stripline fed. In the illustrative implementation, the first array and the second array share a common aperture. The common aperture is fully populated and each array uses the aperture in its entirety. The first and second arrays of slots are arranged for four-way symmetry. Each slot in the first array is a vertically oriented, iris-excited shunt slot fed by a rectangular waveguide and centered on a broad wall thereof. The second array is a standing wave array in which each slot is an air cavity backed slot fed by an inverted micro-stripline offset from a center thereof.
    Type: Application
    Filed: June 13, 2001
    Publication date: March 25, 2004
    Inventors: Pyong K. Park, Sang H. Kim, Joseph M. Anderson, Jack H. Anderson, Kevin P. Grabe, David Y. Kim, Richard M. Oestreich, Jack H. Anderson
  • Patent number: 6166701
    Abstract: Disclosed is a common aperture dual polarization antenna array (30). This common aperture dual polarization antenna array (30) includes an antenna aperture (36) and a plurality of centered slot arrays (32) positioned within the antenna aperture (36). A plurality of notch dipole arrays (34) are positioned within the antenna aperture (36) and positioned substantially orthogonal to the plurality of centered slot arrays (32). A first feed guide (46) is coupled to the plurality of centered slot arrays (32) and a second feed guide (56) is coupled to the plurality of notch dipole arrays (34).
    Type: Grant
    Filed: August 5, 1999
    Date of Patent: December 26, 2000
    Assignee: Raytheon Company
    Inventors: Pyong K. Park, Steven E. Bradshaw, Steven W. Bartley, Joseph M. Anderson, Sang H. Kim, David Y. Kim
  • Patent number: 3949024
    Abstract: A phosphite ester of a hindered bis phenol of the formula: ##SPC1##Wherein X is an alkylene radical or sulfur, R is hydrogen or alkyl, and R.sub.1 is alkyl, cycloalkyl or an alkyl-substituted aryl radical, which compounds are useful as stabilizers for polymeric materials.
    Type: Grant
    Filed: December 1, 1971
    Date of Patent: April 6, 1976
    Assignee: Stepan Chemical Company
    Inventors: Walter Beck, David Y. Kim