Abstract: A detector supplement device for integration in a spectroscopy setup with the spectroscopy setup including a vacuum chamber, a light source, a sample irradiating a reflected photon beam and a charged particle beam in the same direction of propagation into a radiation detector which is able to detect ultrafast electric currents originating from charged particles. The detector supplement device includes a Rogowski coil placeable inside the vacuum chamber between the sample and radiation detector. The charged particle beam is guided through the hollow core of the Rogowski coil allowing synchronized measurements of electrical currents due to the charged particle beam correlated to the reflected photon beam, while irradiation of the reflected photon beam and the charged particle beam takes place in the same direction of propagation.

Abstract: A detector supplement device for integration in a spectroscopy setup with the spectroscopy setup including a vacuum chamber, a light source, a sample irradiating a reflected photon beam and a charged particle beam in the same direction of propagation into a radiation detector which is able to detect ultrafast electric currents originating from charged particles. The detector supplement device includes a Rogowski coil placeable inside the vacuum chamber between the sample and radiation detector. The charged particle beam is guided through the hollow core of the Rogowski coil allowing synchronized measurements of electrical currents due to the charged particle beam correlated to the reflected photon beam, while irradiation of the reflected photon beam and the charged particle beam takes place in the same direction of propagation.

Abstract: The extreme ultraviolet light source comprises a production site capable of producing extreme ultraviolet radiation in a laser-produced plasma (3), and a collector optics (6) for collimating the extreme ultraviolet radiation. A pressurized influx of gas forms a gas curtain between the production site and the collector optics (6) in order to protect the collector optics (6) from debris (4) generated at the production site. The gas influx is directed in a way that it follows the surface of the collector optics (6). By thus shielding the collector optics (6) from the debris (4) its lifetime is enhanced. The shielding gas can further be used for cooling the collector optics (6).

Abstract: The extreme ultraviolet light source comprises a production site capable of producing extreme ultraviolet radiation in a laser-produced plasma (3), and a collector optics (6) for collimating the extreme ultraviolet radiation. A pressurized influx of gas forms a gas curtain between the production site and the collector optics (6) in order to protect the collector optics (6) from debris (4) generated at the production site. The gas influx is directed in a way that it follows the surface of the collector optics (6). By thus shielding the collector optics (6) from the debris (4) its lifetime is enhanced. The shielding gas can further be used for cooling the collector optics (6).