Patents by Inventor Davit HARUTYUNYAN
Davit HARUTYUNYAN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230370412Abstract: Computer systems and methods for two-way communication between the author and the addressee of an anonymous initial message are provided. An anonymous initial message (for example: offering or inquiry) of any type is sent by one person (sender) to another person (recipient). The message is delivered to the recipient without disclosing the identity of the sender. The recipient may reply to one or more persons specified by such recipient. Various replies may be sent to various persons. A reply will not be delivered to its addressee if such addressee is not the sender of the original anonymous message.Type: ApplicationFiled: April 13, 2023Publication date: November 16, 2023Inventors: Davit Harutyunyan, Vahan Harutyunyan
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Patent number: 11803127Abstract: A method for determining a root cause affecting yield in a process for manufacturing devices on a substrate, the method including: obtaining yield distribution data including a distribution of a yield parameter across the substrate or part thereof; obtaining sets of metrology data, each set including a spatial variation of a process parameter over the substrate or part thereof corresponding to a different layer of the substrate; comparing the yield distribution data and metrology data based on a similarity metric describing a spatial similarity between the yield distribution data and an individual set out of the sets of the metrology data; and determining a first similar set of metrology data out of the sets of metrology data, being the first set of metrology data in terms of processing order for the corresponding layers, which is determined to be similar to the yield distribution data.Type: GrantFiled: November 4, 2019Date of Patent: October 31, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Chenxi Lin, Cyrus Emil Tabery, Hakki Ergün Cekli, Simon Philip Spencer Hastings, Boris Menchtchikov, Yi Zou, Yana Cheng, Maxime Philippe Frederic Genin, Tzu-Chao Chen, Davit Harutyunyan, Youping Zhang
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Patent number: 11754931Abstract: A method for determining a correction for an apparatus used in a process of patterning substrates, the method including: obtaining a group structure associated with a processing history and/or similarity in fingerprint of to be processed substrates; obtaining metrology data associated with a plurality of groups within the group structure, wherein the metrology data is correlated between the groups; and determining the correction for a group out of the plurality of groups by applying a model to the metrology data, the model including at least a group-specific correction component and a common correction component.Type: GrantFiled: March 18, 2020Date of Patent: September 12, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Roy Werkman, David Frans Simon Deckers, Simon Philip Spencer Hastings, Jeffrey Thomas Ziebarth, Samee Ur Rehman, Davit Harutyunyan, Chenxi Lin, Yana Cheng
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Patent number: 11526085Abstract: In a dark-field metrology method using a small target, a characteristic of an image of the target, obtained using a single diffraction order, is determined by fitting a combination fit function to the measured image. The combination fit function includes terms selected to represent aspects of the physical sensor and the target. Some coefficients of the combination fit function are determined based on parameters of the measurement process and/or target. In an embodiment the combination fit function includes jinc functions representing the point spread function of a pupil stop in the imaging system.Type: GrantFiled: August 10, 2020Date of Patent: December 13, 2022Assignee: ASML NETHERLANDS B.V.Inventors: Hendrik Jan Hidde Smilde, Bastiaan Onne Fagginger Auer, Davit Harutyunyan, Patrick Warnaar
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Publication number: 20220342319Abstract: A method, system and program for determining a fingerprint of a parameter. The method includes determining a contribution from a device out of a plurality of devices to a fingerprint of a parameter. The method includes obtaining parameter data and usage data, wherein the parameter data is based on measurements for multiple substrates having been processed by the plurality of devices, and the usage data indicates which of the devices out of the plurality of the devices were used in the processing of each substrate; and determining the contribution using the usage data and parameter data.Type: ApplicationFiled: July 1, 2022Publication date: October 27, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Davit Harutyunyan, Fei Jia, Frank Staals, Fuming Wang, Hugo Thomas Looijestijn, Cornelis Johannes Rijnierse, Maxim Pisarenco, Roy Werkman, Thomas Theeuwes, Tom Van Hemert, Vahid Bastani, Jochem Wildenberg, Everhardus Cornelis Mos, Erik Johannes Maria Wallerbos
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Publication number: 20220252988Abstract: A method for determining a correction for an apparatus used in a process of patterning substrates, the method including: obtaining a group structure associated with a processing history and/or similarity in fingerprint of to be processed substrates; obtaining metrology data associated with a plurality of groups within the group structure, wherein the metrology data is correlated between the groups; and determining the correction for a group out of the plurality of groups by applying a model to the metrology data, the model including at least a group-specific correction component and a common correction component.Type: ApplicationFiled: March 18, 2020Publication date: August 11, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Roy WERKMAN, David Frans Simon DECKERS, Simon Philip Spencer HASTINGS, Jeffrey Thomas ZIEBARTH, Samee Ur REHMAN, Davit HARUTYUNYAN, Chenxi LIN, Yana CHENG
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Patent number: 11378891Abstract: A method, system and program for determining a fingerprint of a parameter. The method includes determining a contribution from a device out of a plurality of devices to a fingerprint of a parameter. The method includes obtaining parameter data and usage data, wherein the parameter data is based on measurements for multiple substrates having been processed by the plurality of devices, and the usage data indicates which of the devices out of the plurality of the devices were used in the processing of each substrate; and determining the contribution using the usage data and parameter data.Type: GrantFiled: September 17, 2020Date of Patent: July 5, 2022Assignee: ASML Netherlands B.V.Inventors: Davit Harutyunyan, Fei Jia, Frank Staals, Fuming Wang, Hugo Thomas Looijestijn, Cornelis Johannes Rijnierse, Maxim Pisarenco, Roy Werkman, Thomas Theeuwes, Tom Van Hemert, Vahid Bastani, Jochem Sebastiaan Wildenberg, Everhardus Cornelis Mos, Erik Johannes Maria Wallerbos
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Publication number: 20210389677Abstract: A method for determining a root cause affecting yield in a process for manufacturing devices on a substrate, the method including: obtaining yield distribution data including a distribution of a yield parameter across the substrate or part thereof; obtaining sets of metrology data, each set including a spatial variation of a process parameter over the substrate or part thereof corresponding to a different layer of the substrate; comparing the yield distribution data and metrology data based on a similarity metric describing a spatial similarity between the yield distribution data and an individual set out of the sets of the metrology data; and determining a first similar set of metrology data out of the sets of metrology data, being the first set of metrology data in terms of processing order for the corresponding layers, which is determined to be similar to the yield distribution data.Type: ApplicationFiled: November 4, 2019Publication date: December 16, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Chenxi LIN, Cyrus Emil TABERY, Hakki Ergün CEKLI, Simon Philip Spencer HASTINGS, Boris MENCHTCHIKOV, Yi ZOU, Yana CHENG, Maxime Philippe Frederic GENIN, Tzu-Chao CHEN, Davit HARUTYUNYAN, Youping ZHANG
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Publication number: 20210003927Abstract: A method, system and program for determining a fingerprint of a parameter. The method includes determining a contribution from a device out of a plurality of devices to a fingerprint of a parameter. The method includes obtaining parameter data and usage data, wherein the parameter data is based on measurements for multiple substrates having been processed by the plurality of devices, and the usage data indicates which of the devices out of the plurality of the devices were used in the processing of each substrate; and determining the contribution using the usage data and parameter data.Type: ApplicationFiled: September 17, 2020Publication date: January 7, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Davit Harutyunyan, Fei Jia, Frank Staals, Fuming Wang, Hugo Thomas Looijestijn, Cornelis Johannes Rijnierse, Maxim Pisarenco, Roy Werkman, Thomas Theeuwes, Tom Van Hemert, Vahid Bastani, Jochem Sebastiaan Wildenberg, Everhardus Cornelis Mos, Erik Johannes Maria Wallerbos
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Publication number: 20200379359Abstract: In a dark-field metrology method using a small target, a characteristic of an image of the target, obtained using a single diffraction order, is determined by fitting a combination fit function to the measured image. The combination fit function includes terms selected to represent aspects of the physical sensor and the target. Some coefficients of the combination fit function are determined based on parameters of the measurement process and/or target. In an embodiment the combination fit function includes jinc functions representing the point spread function of a pupil stop in the imaging system.Type: ApplicationFiled: August 10, 2020Publication date: December 3, 2020Applicant: ASML Netherlands B.V.Inventors: Hendrik Jan Hidde SMILDE, Bastiaan Onne FAGGINGER AUER, Davit HARUTYUNYAN, Patrick WARNAAR
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Patent number: 10816904Abstract: A method, system and program for determining a fingerprint of a parameter. The method includes determining a contribution from a device out of a plurality of devices to a fingerprint of a parameter. The method including: obtaining parameter data and usage data, wherein the parameter data is based on measurements for multiple substrates having been processed by the plurality of devices, and the usage data indicates which of the devices out of the plurality of the devices were used in the processing of each substrate; and determining the contribution using the usage data and parameter data.Type: GrantFiled: May 23, 2018Date of Patent: October 27, 2020Assignee: ASML Netherlands B.V.Inventors: Davit Harutyunyan, Fei Jia, Frank Staals, Fuming Wang, Hugo Thomas Looijestijn, Cornelis Johannes Rijnierse, Maxim Pisarenco, Roy Werkman, Thomas Theeuwes, Tom Van Hemert, Vahid Bastani, Jochem Sebastiaan Wildenberg, Everhardus Cornelis Mos, Erik Johannes Maria Wallerbos
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Patent number: 10739687Abstract: In a dark-field metrology method using a small target, a characteristic of an image of the target, obtained using a single diffraction order, is determined by fitting a combination fit function to the measured image. The combination fit function includes terms selected to represent aspects of the physical sensor and the target. Some coefficients of the combination fit function are determined based on parameters of the measurement process and/or target. In an embodiment the combination fit function includes jinc functions representing the point spread function of a pupil stop in the imaging system.Type: GrantFiled: November 9, 2018Date of Patent: August 11, 2020Assignee: ASML Netherlands B.V.Inventors: Hendrik Jan Hidde Smilde, Bastiaan Onne Fagginger Auer, Davit Harutyunyan, Patrick Warnaar
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Publication number: 20190271919Abstract: A method, system and program for determining a fingerprint of a parameter. The method includes determining a contribution from a device out of a plurality of devices to a fingerprint of a parameter. The method including: obtaining parameter data and usage data, wherein the parameter data is based on measurements for multiple substrates having been processed by the plurality of devices, and the usage data indicates which of the devices out of the plurality of the devices were used in the processing of each substrate; and determining the contribution using the usage data and parameter data.Type: ApplicationFiled: May 23, 2018Publication date: September 5, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Davit HARUTYUNYAN, Fei JIA, Frank STAALS, Fuming WANG, Hugo Thomas LOOIJESTIJN, Cornelis Johannes RIJNIERSE, Maxim PISARENCO, Roy WERKMAN, Thomas THEEUWES, Tom VAN HEMERT, Vahid BASTANI, Jochem Sebastian WILDENBERG, Everhardus Cornelis MOS, Erik Johannes Maria WALLERBOS
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Publication number: 20190236700Abstract: An internal market system for determining strategy leg prices and leg quantities based on a defined strategy parameter, thus allowing for the matching of standard strategies or pre-defined strategies. An application platform derives strategy leg prices and leg quantities based on a strategy head price, a reference exchange price of individual legs, leg price ratio, and number of legs. As a result, whenever two strategy orders are crossed in an internal market system, a leg trade transaction is generated with prices and quantities that correspond to head strategy order trades. The internal market trade transactions are available to upstream processes for consumption within, for example, an order management system platform. Transactions are also reported to downstream processes for consumption by back-office and middle-office solutions for reporting and allocation purposes.Type: ApplicationFiled: January 30, 2019Publication date: August 1, 2019Applicant: FIDESSA TRADING UK LIMITEDInventors: Yuriy Shterk, Davit Harutyunyan
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Publication number: 20190164656Abstract: The technical solution relates to a fluoride salt-cooled high-temperature nuclear reactor with low output.Type: ApplicationFiled: February 8, 2018Publication date: May 30, 2019Inventors: Marek RUSCAK, Evzen LOSA, Davit HARUTYUNYAN, Pavel DOSTAL
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Publication number: 20190094712Abstract: In a dark-field metrology method using a small target, a characteristic of an image of the target, obtained using a single diffraction order, is determined by fitting a combination fit function to the measured image. The combination fit function includes terms selected to represent aspects of the physical sensor and the target. Some coefficients of the combination fit function are determined based on parameters of the measurement process and/or target. In an embodiment the combination fit function includes jinc functions representing the point spread function of a pupil stop in the imaging system.Type: ApplicationFiled: November 9, 2018Publication date: March 28, 2019Applicant: ASML Netherlands B.V.Inventors: Hendrik Jan Hidde SMILDE, Bastiaan Onne FAGGINGER AUER, Davit HARUTYUNYAN, Patrick WARNAAR
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Patent number: 10162271Abstract: In a dark-field metrology method using a small target, a characteristic of an image of the target, obtained using a single diffraction order, is determined by fitting a combination fit function to the measured image. The combination fit function includes terms selected to represent aspects of the physical sensor and the target. Some coefficients of the combination fit function are determined based on parameters of the measurement process and/or target. In an embodiment the combination fit function includes jinc functions representing the point spread function of a pupil stop in the imaging system.Type: GrantFiled: December 30, 2014Date of Patent: December 25, 2018Assignee: ASML Netherlands B.V.Inventors: Hendrik Jan Hidde Smilde, Bastiaan Onne Fagginger Auer, Davit Harutyunyan, Patrick Warnaar
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Publication number: 20160334715Abstract: In a dark-field metrology method using a small target, a characteristic of an image of the target, obtained using a single diffraction order, is determined by fitting a combination fit function to the measured image. The combination fit function includes terms selected to represent aspects of the physical sensor and the target. Some coefficients of the combination fit function are determined based on parameters of the measurement process and/or target. In an embodiment the combination fit function includes jinc functions representing the point spread function of a pupil stop in the imaging system.Type: ApplicationFiled: December 30, 2014Publication date: November 17, 2016Applicant: ASML Netherlands B.VInventors: Hendrik Jan Hidde SMILDE, Bastiann Onne FAGGINGER AUER, Davit HARUTYUNYAN