Patents by Inventor Dawei Heh

Dawei Heh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11972826
    Abstract: Disclosed herein are related to a system and a method of extending a lifetime of a memory cell. In one aspect, a memory controller applies a first pulse having a first amplitude to the memory cell to write input data to the memory cell. In one aspect, the memory controller applies a second pulse having a second amplitude larger than the first amplitude to the memory cell to extend a lifetime of the memory cell. The memory cell may include a resistive memory device or a phase change random access memory device. In one aspect, the memory controller applies the second pulse to the memory cell to repair the memory cell in response to determining that the memory cell has failed. In one aspect, the memory controller periodically applies the second pulse to the memory cell to extend the lifetime of the memory cell before the memory cell fails.
    Type: Grant
    Filed: July 8, 2021
    Date of Patent: April 30, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yung-Huei Lee, Pei-Chun Liao, Jian-Hong Lin, Dawei Heh, WenHsien Kuo
  • Patent number: 11894461
    Abstract: A semiconductor device includes a semiconductor substrate, an interfacial layer formed on the semiconductor substrate, a high-k dielectric layer formed on the interfacial layer, and a conductive gate electrode layer formed on the high-k dielectric layer. At least one of the high-k dielectric layer and the interfacial layer is doped with: a first dopant species, a second dopant species, and a third dopant species. The first dopant species and the second dopant species form a plurality of first dipole elements having a first polarity. The third dopant species forms a plurality of second dipole elements having a second polarity, and the first and second polarities are opposite.
    Type: Grant
    Filed: November 29, 2021
    Date of Patent: February 6, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Hsiang-Pi Chang, Yen-Tien Tung, Dawei Heh, Chung-Liang Cheng, I-Ming Chang, Yao-Sheng Huang, Tzer-Min Shen, Huang-Lin Chao
  • Publication number: 20230009913
    Abstract: Disclosed herein are related to a system and a method of extending a lifetime of a memory cell. In one aspect, a memory controller applies a first pulse having a first amplitude to the memory cell to write input data to the memory cell. In one aspect, the memory controller applies a second pulse having a second amplitude larger than the first amplitude to the memory cell to extend a lifetime of the memory cell. The memory cell may include a resistive memory device or a phase change random access memory device. In one aspect, the memory controller applies the second pulse to the memory cell to repair the memory cell in response to determining that the memory cell has failed. In one aspect, the memory controller periodically applies the second pulse to the memory cell to extend the lifetime of the memory cell before the memory cell fails.
    Type: Application
    Filed: July 8, 2021
    Publication date: January 12, 2023
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yung-Huei Lee, Pei-Chun Liao, Jian-Hong Lin, Dawei Heh, WenHsien Kuo
  • Publication number: 20220310846
    Abstract: A semiconductor device includes a semiconductor substrate, an interfacial layer formed on the semiconductor substrate, a high-k dielectric layer formed on the interfacial layer, and a conductive gate electrode layer formed on the high-k dielectric layer. At least one of the high-k dielectric layer and the interfacial layer is doped with: a first dopant species, a second dopant species, and a third dopant species. The first dopant species and the second dopant species form a plurality of first dipole elements having a first polarity. The third dopant species forms a plurality of second dipole elements having a second polarity, and the first and second polarities are opposite.
    Type: Application
    Filed: November 29, 2021
    Publication date: September 29, 2022
    Inventors: Hsiang-Pi Chang, Yen-Tien Tung, Dawei Heh, Chung-Liang Cheng, I-Ming Chang, Yao-Sheng Huang, Tzer-Min Shen, Huang-Lin Chao
  • Patent number: 7548067
    Abstract: Methods for determining capacitance values of a metal on semiconductor (MOS) structure are provided. A time domain reflectometry circuit may be loaded with a MOS structure. The MOS structure may be biased with various voltages, and reflectometry waveforms from the applied voltage may be collected. The capacitance of the MOS structure may be determined from the reflectometry waveforms.
    Type: Grant
    Filed: October 25, 2006
    Date of Patent: June 16, 2009
    Assignees: Sematech, Inc., Rutgers University
    Inventors: Kin P. Cheung, Dawei Heh, Byoung Hun Lee, Rino Choi
  • Publication number: 20080100283
    Abstract: Methods for determining capacitance values of a metal on semiconductor (MOS) structure are provided. A time domain reflectometry circuit may be loaded with a MOS structure. The MOS structure may be biased with various voltages, and reflectometry waveforms from the applied voltage may be collected. The capacitance of the MOS structure may be determined from the reflectometry waveforms.
    Type: Application
    Filed: October 25, 2006
    Publication date: May 1, 2008
    Inventors: Kin P. Cheung, Dawei Heh, Byoung Hun Lee, Rino Choi