Abstract: The present disclosure provides a display screen and a display apparatus, the display screen comprising: a special-shaped display panel (01) of an irregular closed shape, and a display driving circuit (02) which is bonded at any edge of the special-shaped display panel (01) and configured to supply respective signals to gate lines and data lines in the special-shaped display panel (01).

Abstract: Embodiments of the present disclosure provide a touch display substrate and manufacturing method thereof. The method includes forming a touch signal line on a base substrate through patterning process; depositing a photoresist layer, and forming a first thickness photoresist layer, a second thickness photoresist layer and a photoresist layer opening area through patterning process, the touch signal line being located in the photoresist layer opening area; depositing a first insulating layer on the photoresist layer, the first insulating layer comprising a first area and a second area, wherein the first area is located on the first thickness photoresist layer, the second area is located on the second thickness photoresist layer and the photoresist layer opening area, the first area and the second area of the first insulating layer are disconnected; removing the photoresist layer and the first insulating layer located on the photoresist layer; and depositing a second insulating layer.

Abstract: The present disclosure relates to a method for manufacturing a display panel, a display panel and a display device. There is provided a method for manufacturing a display panel, comprising: forming a first metal layer on a substrate; forming a second metal layer on the first metal layer; oxidizing a portion of the second metal layer to form an oxide extending to a surface of the first metal layer; removing the oxide to expose the surface of the first metal layer; and forming a conductive layer on the exposed surface of the first metal layer.

Abstract: A display panel is provided in the embodiments of the disclosure, including an array substrate, an opposing substrate, and a liquid crystal layer provided between the array substrate and the opposing substrate. The array substrate comprises a plurality of data lines, a plurality of gate lines and a plurality of pixel units distributed in an array, and the opposing substrate comprises a base substrate, a common electrode layer provided on one side of the base substrate facing towards the liquid crystal layer and a first touch electrode provided on the other side of the base substrate facing away from the liquid crystal layer.

Abstract: A method includes obtaining information identifying (i) uncertainties associated with multiple time-domain parameters of a model and (ii) time-domain performance specifications for a model-based industrial process controller. The model mathematically represents a MIMO industrial process. The method also includes generating multiple tuning parameters for the controller based on the uncertainties and the time-domain performance specifications. The tuning parameters include vectors of tuning parameters associated with the controller, and each vector includes values associated with different outputs of the industrial process. The time-domain parameters could include a process gain, a time constant, and a time delay for each input-output pair of the model. The time-domain performance specifications could include requirements related to worst-case overshoots, settling times, and total variations. The uncertainties could be specified as intervals in which the time-domain parameters lie.

Abstract: An array substrate, a manufacturing method, a display panel and an electronic device are provided. The array substrate includes a substrate, and a gate line, an insulation layer, an active layer and a data line which are formed on the substrate. The insulation layer is provided on the gate line, the data line is provided on the gate line through the insulation layer and is crossed with the gate line, and the active layer is provided between the gate line and the data line in a direction perpendicular to the substrate, and a first shield layer is provided on the gate line through the insulation layer, and the first shield layer covers the gate line in the direction perpendicular to the substrate and is electrically insulated from the gate line, the active layer and the data line.

Abstract: The present invention provides an exposure system including a light source and a carrier which are arranged opposite to each other. The carrier is used for placing a to-be-exposed film, and the to-be-exposed film is to be exposed to light emitted from the light source. The exposure system further includes a thickness measurement unit and a light intensity adjustment unit which are electrically connected to each other. The thickness measurement unit is used for measuring thicknesses of different regions of the to-be-exposed film, and the light intensity adjustment unit is used for adjusting exposure-light intensities of different regions of the to-be-exposed film according to the thicknesses of corresponding regions of the to-be-exposed film measured by the thickness measurement unit.

Abstract: The present invention discloses an array substrate and a manufacturing method thereof, and a display device, the array substrate includes a pixel electrode and a thin film transistor, the pixel electrode includes a first sub-electrode, a first connection part formed integrally with the first sub-electrode, a second sub-electrode, and a second connection part formed integrally with the second sub-electrode, the first sub-electrode and the second sub-electrode are insulated from each other and are disposed in different layers, and both the first connection part and the second connection part are connected to a drain of the thin film transistor. With the present invention, the pixel electrode of the discrete pattern structure can be manufactured to have a narrow gap smaller than the resolution of the exposure machine, to solve the problem that the single-layered pixel electrode of the discrete pattern structure cannot be resolved by the existing exposure machine.

Abstract: A method includes obtaining information identifying (i) uncertainties associated with multiple time-domain parameters of a model and (ii) time-domain performance specifications for a model-based industrial process controller. The model mathematically represents a MIMO industrial process. The method also includes generating multiple tuning parameters for the controller based on the uncertainties and the time-domain performance specifications. The tuning parameters include vectors of tuning parameters associated with the controller, and each vector includes values associated with different outputs of the industrial process. The time-domain parameters could include a process gain, a time constant, and a time delay for each input-output pair of the model. The time-domain performance specifications could include requirements related to worst-case overshoots, settling times, and total variations. The uncertainties could be specified as intervals in which the time-domain parameters lie.

Abstract: Embodiments of the present disclosure provide a mask and a fabrication method thereof, and a method of patterning by using a mask. The mask comprises: a first substrate and a second substrate disposed oppositely; a liquid crystal layer located between the first substrate and the second substrate; a transparent conductive layer formed on the first substrate, the transparent conductive layer and the liquid crystal layer being located on a same side of the first substrate; and a mask pattern made of a non-transparent conductive material formed on the second substrate, wherein the mask pattern and the transparent electrode are configured to be capable of generating an electric field therebetween, so as to drive liquid crystal molecules in the liquid crystal layer to deflect.

Abstract: An array structure and a manufacturing method thereof are disclosed. The method for manufacturing the array structure includes: forming a gate insulating layer on a glass substrate; and etching the gate insulating layer at a position corresponding to a source/drain signal access terminal, and forming a through-hole structure provided with an outward-inclined side wall in the gate insulating layer. Conductive films in the source/drain signal access terminal and a gate signal access terminal which have wires thereof alternate with each other have a same height, so that the forces applied to conductive balls can be more uniform, and hence the conductivity can be improved.

Abstract: Embodiments of the present disclosure provide a mask and a fabrication method thereof, and a method of patterning by using a mask. The mask comprises: a first substrate and a second substrate disposed oppositely; a liquid crystal layer located between the first substrate and the second substrate; a transparent conductive layer formed on the first substrate, the transparent conductive layer and the liquid crystal layer being located on a same side of the first substrate; and a mask pattern made of a non-transparent conductive material formed on the second substrate, wherein the mask pattern and the transparent electrode are configured to be capable of generating an electric field therebetween, so as to drive liquid crystal molecules in the liquid crystal layer to deflect.

Abstract: Embodiments of the invention disclose a mask plate and a method for detecting an exposure defect using the mask plate. The mask includes a mask pattern, and the mask further includes a plurality of detection-mark mask patterns arranged along a scan direction of an exposure machine, the detection-mark mask patterns are arranged at an edge of the mask pattern. The detection-mark mask patterns are adapted for forming detection marks on a substrate. The detection marks are adapted for reflecting exposure defects of the exposure machine. With the mask plate of the invention, the reason for the exposure defect may be precisely decided, thereby improving the exposure effect and improving the parameter index of the substrate.

Abstract: A method includes obtaining information identifying uncertainties associated with multiple parameters of a model for an industrial model-based controller. The method also includes obtaining information identifying multiple tuning parameters for the controller. The method further includes generating a graphical display identifying (i) one or more expected step responses of an industrial process that are based on the tuning parameters of the controller and (ii) an envelope around the one or more expected step responses that is based on the uncertainties associated with the parameters of the model. The parameters could include a process gain, a time constant, and a time delay associated with the model. The uncertainties associated with the parameters of the model could include, for each parameter of the model, an uncertainty expressed in the time domain. The information identifying the tuning parameters could include a settling time and an overshoot associated with the controller.

Abstract: The present invention provides an exposure system including a light source and a carrier which are arranged opposite to each other. The carrier is used for placing a to-be-exposed film, and the to-be-exposed film is to be exposed to light emitted from the light source. The exposure system further includes a thickness measurement unit and a light intensity adjustment unit which are electrically connected to each other. The thickness measurement unit is used for measuring thicknesses of different regions of the to-be-exposed film, and the light intensity adjustment unit is used for adjusting exposure-light intensities of different regions of the to-be-exposed film according to the thicknesses of corresponding regions of the to-be-exposed film measured by the thickness measurement unit. (FIG.

Abstract: Embodiments of the invention disclose a mask plate and a method for detecting an exposure defect using the mask plate. The mask includes a mask pattern, and the mask further includes a plurality of detection-mark mask patterns arranged along a scan direction of an exposure machine, the detection-mark mask patterns are arranged at an edge of the mask pattern. The detection-mark mask patterns are adapted for forming detection marks on a substrate. The detection marks are adapted for reflecting exposure defects of the exposure machine. With the mask plate of the invention, the reason for the exposure defect may be precisely decided, thereby improving the exposure effect and improving the parameter index of the substrate.

Abstract: Fluctuation monitoring method based on the mid-layer data comprising a monitoring component of the customized instance, mid-layer telephone traffic statistics, a component of self learning telephone traffic and a drawing component of multidimensional traffic monitor. 1) Modeling of telephone traffic status is based on social science empirical model, and uses telephone traffic per day as an analysis granularity, which is composed of three dimensions—time, region and business. 2) the mid-layer of the telephone traffic statistics is calculated based on a monitoring target in regular time. 3) the self learning component of telephone traffic studies and forecasts based on monitoring data. 4) the drawing component of multidimensional traffic monitor will extract data from in the mid-layer of traffic data statistics.