Patents by Inventor Da-woon CHOI

Da-woon CHOI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240188336
    Abstract: A display device includes first pixel and second electrodes spaced apart from each other on a substrate, an inorganic insulating layer on the substrate and partially covering the first pixel electrode and the second pixel electrode, residual patterns disposed between the first or second pixel electrodes and the inorganic insulating layer, a bank structure on the inorganic insulating layer with first and second openings defined therethrough to overlap the first and second pixel electrodes, first and second light emitting layers on the first and second pixel electrodes, first and second common electrodes on the first and second light emitting layers, and first and second inorganic layers on the first and second common electrodes in the first and second openings. The bank structure includes first and second bank layers including different metal materials, and the second bank layer includes tips protruding to a center of the first or second opening.
    Type: Application
    Filed: September 21, 2023
    Publication date: June 6, 2024
    Inventors: Dae Won CHOI, Yun Jong YEO, Su Bin BAE, Da Woon JUNG
  • Patent number: 10684544
    Abstract: An optical proximity correction (OPC) whereby corner rounding may be effectively controlled, and a mask manufacturing method performed using the OPC method are provided. According to the OPC method, an inner edge is generated through decomposition of a layout, and a displacement (DISin_frag) of an inner fragment and a displacement (DISsel) of a selected fragment are calculated based on the inner edge to additionally displace a fragment, so as to manufacture a mask layout with minimized corner rounding without violating mask rule check (MRC).
    Type: Grant
    Filed: July 5, 2018
    Date of Patent: June 16, 2020
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Da-woon Choi, Yu-kyung Kim, Yun-kyoung Song
  • Publication number: 20190187552
    Abstract: An optical proximity correction (OPC) whereby corner rounding may be effectively controlled, and a mask manufacturing method performed using the OPC method are provided. According to the OPC method, an inner edge is generated through decomposition of a layout, and a displacement (DISin_frag) of an inner fragment and a displacement (DISsel) of a selected fragment are calculated based on the inner edge to additionally displace a fragment, so as to manufacture a mask layout with minimized corner rounding without violating mask rule check (MRC).
    Type: Application
    Filed: July 5, 2018
    Publication date: June 20, 2019
    Inventors: Da-woon CHOI, Yu-kyung KIM, Yun-kyoung SONG