Abstract: An image sensor includes a first substrate and a photoelectric structure in the first substrate. The first substrate includes opposite first surface and second surfaces. The conductivity type of the photoelectric structure is opposite to that of the first substrate. The photoelectric structure includes a second doped region and multiple first doped regions. Each of the first doped regions is connected to the second doped region. The distance from the second doped region to the first surface is smaller than the distance from the first doped region to the first surface. The size of the first doped region in a direction parallel to the first surface is smaller than or equal to the size of the second doped region in the direction. The quantum efficiency (QE), detection band, and photo-sensing capability are improved.

Abstract: A pixel unit includes: a base, the base including a substrate, a photosensitive element, and memory nodes; overflow doping regions in the second surface of the substrate; and overflow interconnection structures electrically connected to the overflow doping regions. Vertical-overflow-drain structures are formed between the overflow doping regions and the memory nodes, allowing the charge stored in the memory nodes to be discharged at a certain rate through the overflow interconnection structures. This configuration reduces the oversaturation of memory nodes effectively without altering the exposure time or affecting circuit power consumption, thereby addressing background noise issue. Furthermore, the memory nodes and the overflow doping regions are in the first and second surfaces of the substrate, respectively. Therefore, the placement of the overflow doping regions does not affect the area of the pixel unit, and the resolution of the photosensor is preserved.

Abstract: The present disclosure relates to a semiconductor structure and a method for forming the semiconductor structure. The semiconductor structure includes: a first wafer, including a first substrate and a first dielectric layer on the first substrate, a pad groove and a pad structure in the pad groove are formed in the first substrate and the first dielectric layer, and the pad groove extends through the first substrate along a direction from the first substrate to the first dielectric layer and extends into a partial thickness of the first dielectric layer; and an isolation ring structure, arranged in the first substrate around the pad groove and extending through the first substrate along the direction from the first substrate to the first dielectric layer.

Abstract: The present disclosure relates to a semiconductor structure and a method for forming the semiconductor structure. The semiconductor structure includes: a first wafer, including a first substrate and a first dielectric layer on the first substrate, a plurality of through-silicon via (TSV) structures in an array arrangement are formed in the first substrate, and the TSV structures extend through the first substrate along a direction from the first substrate to the first dielectric layer and extend into a partial thickness of the first dielectric layer; and an isolation ring structure, arranged in the first substrate around the plurality of TSV structures and extending through the first substrate along the direction from the first substrate to the first dielectric layer.