Abstract: A method for transferring a wafer alternately uses a gas providing device and a vacuum generating device. The method includes decontaminating a wafer by contacting a wafer supporter having a wafer provided thereon with a positive pressure mediated stream of gas provided from suction cups of a transferring assembly, where the suction cups are connected to the gas providing device through a gas transmitting tube. After decontamination, the wafer supporter is vacuum adhered to the transferring assembly by contacting the wafer supporter with the suction cups, where the suction cups are connected to the vacuum generating device through the gas transmitting tube. Because the wafer is transferred by picking up the wafer supporter after removing waste washing solution from the wafer and wafer supporter, breakdown and performance deterioration of the transferring assembly is prevented.