Patents by Inventor Dean C. Jennings
Dean C. Jennings has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 9737959Abstract: The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, a three-dimensional auto-focus, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation.Type: GrantFiled: September 5, 2014Date of Patent: August 22, 2017Assignee: Applied Materials, Inc.Inventors: Dean C. Jennings, Mark Yam, Abhilash J. Mayur, Vernon Behrens, Paul A. O'Brien, Leonid M. Teritski, Alexander Goldin
-
Publication number: 20150053659Abstract: The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, a three-dimensional auto-focus, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation.Type: ApplicationFiled: September 5, 2014Publication date: February 26, 2015Inventors: Dean C. Jennings, Mark Yam, Abhilash J. Mayur, Vernon Behrens, Paul A. O'Brien, Leonid M. Teritski, Alexander Goldin
-
Patent number: 8829393Abstract: The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, a three-dimensional auto-focus, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation.Type: GrantFiled: April 9, 2012Date of Patent: September 9, 2014Assignee: Applied Materials, Inc.Inventors: Dean C. Jennings, Mark Yam, Abhilash J. Mayur, Vernon Behrens, Paul A. O'Brien, Leonid M. Tertitski, Alexander Goldin
-
Patent number: 8796769Abstract: A method including introducing a species into a substrate including semiconductor material; and translating linearly focused electromagnetic radiation across a surface of the substrate, the electromagnetic radiation being sufficient to thermally influence the species. An apparatus including an electromagnetic radiation source; a stage having dimensions suitable for accommodating a semiconductor substrate within a chamber; an optical element disposed between the electromagnetic radiation source and the stage to focus radiation from the electromagnetic radiation source into a line having a length determined by the diameter of a substrate to be placed on the stage; and a controller coupled to the electromagnetic radiation source including machine readable program instructions that allow the controller to control the depth into which a substrate is exposed to the radiation.Type: GrantFiled: September 14, 2012Date of Patent: August 5, 2014Assignee: Applied Matierials, Inc.Inventors: Dean C. Jennings, Amir Al-Bayati
-
Patent number: 8432613Abstract: Substrate processing equipment and methods are used to improve the uniformity of illumination across an illuminated portion of a substrate by processing light with multiple optical homogenizers. The multiple optical homogenizers each include micro-lens arrays and Fourier lens. The multiple optical homogenizers are arranged so that the output numerical aperture of one of the optical homogenizers is within 5% of the input numerical aperture of another optical homogenizer.Type: GrantFiled: April 18, 2010Date of Patent: April 30, 2013Assignee: Applied Materials, Inc.Inventors: Dean C. Jennings, Timothy N. Thomas, Samuel C. Howells, Bruce E. Adams, Jiping Li
-
Publication number: 20130008878Abstract: A method including introducing a species into a substrate including semiconductor material; and translating linearly focused electromagnetic radiation across a surface of the substrate, the electromagnetic radiation being sufficient to thermally influence the species. An apparatus including an electromagnetic radiation source; a stage having dimensions suitable for accommodating a semiconductor substrate within a chamber; an optical element disposed between the electromagnetic radiation source and the stage to focus radiation from the electromagnetic radiation source into a line having a length determined by the diameter of a substrate to be placed on the stage; and a controller coupled to the electromagnetic radiation source including machine readable program instructions that allow the controller to control the depth into which a substrate is exposed to the radiation.Type: ApplicationFiled: September 14, 2012Publication date: January 10, 2013Applicant: Applied Materials, Inc.Inventors: Dean C. Jennings, Amir Al-Bayati
-
Patent number: 8316867Abstract: Methods and apparatus for cleaning electrostatic chucks in processing chambers are provided. The process comprises flowing a backside gas comprising a reactive agent into a zone in a process chamber, the zone defined by a space between a surface of an electrostatic chuck or of a cleaning station and a surface of a substrate. The surface of the electrostatic chuck is etched with the reactive agent to remove debris. An apparatus for cleaning an electrostatic chuck is also provided, the apparatus comprising: a process chamber; an elongate arm having a reach disposed through a wall of the process chamber; an electrostatic chuck attached to the elongate arm; a cleaning station located within the reach of the elongate arm; and a reactive gas source that is operatively connected to the cleaning station.Type: GrantFiled: July 25, 2011Date of Patent: November 27, 2012Assignee: Applied Materials, Inc.Inventors: Dean C. Jennings, Majeed Foad, Jonathan Simmons
-
Patent number: 8288239Abstract: A method including introducing a species into a substrate including semiconductor material; and translating linearly focused electromagnetic radiation across a surface of the substrate, the electromagnetic radiation being sufficient to thermally influence the species. An apparatus including an electromagnetic radiation source; a stage having dimensions suitable for accommodating a semiconductor substrate within a chamber; an optical element disposed between the electromagnetic radiation source and the stage to focus radiation from the electromagnetic radiation source into a line having a length determined by the diameter of a substrate to be placed on the stage; and a controller coupled to the electromagnetic radiation source including machine readable program instructions that allow the controller to control the depth into which a substrate is exposed to the radiation.Type: GrantFiled: September 30, 2002Date of Patent: October 16, 2012Assignee: Applied Materials, Inc.Inventors: Dean C. Jennings, Amir Al-Bayati
-
Patent number: 8288685Abstract: The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, a three-dimensional auto-focus, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation.Type: GrantFiled: December 29, 2010Date of Patent: October 16, 2012Assignee: Applied Materials, Inc.Inventors: Dean C. Jennings, Mark Yam, Abhilash J. Mayur, Vernon Behrens, Paul A. O'Brien, Leonid M. Tertitski, Alexander Goldin
-
Publication number: 20120205347Abstract: The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, a three-dimensional auto-focus, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation.Type: ApplicationFiled: April 9, 2012Publication date: August 16, 2012Applicant: APPLIED MATERIALS, INC.Inventors: Dean C. Jennings, Mark Yam, Abhilash J. Mayur, Vernon Behrens, Paul A. O'Brien, Leonid M. Tertitski, Alexander Goldin
-
Patent number: 8178819Abstract: The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, a three-dimensional auto-focus, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation.Type: GrantFiled: March 14, 2005Date of Patent: May 15, 2012Assignee: Applied Materials, Inc.Inventors: Dean C. Jennings, Mark Yam, Abhilash J. Mayur, Vernon Behrens, Paul A. O'Brien, Leonid M. Tertitski, Alexander Goldin
-
Publication number: 20110277932Abstract: Methods and apparatus for cleaning electrostatic chucks in processing chambers are provided. The process comprises flowing a backside gas comprising a reactive agent into a zone in a process chamber, the zone defined by a space between a surface of an electrostatic chuck or of a cleaning station and a surface of a substrate. The surface of the electrostatic chuck is etched with the reactive agent to remove debris. An apparatus for cleaning an electrostatic chuck is also provided, the apparatus comprising: a process chamber; an elongate arm having a reach disposed through a wall of the process chamber; an electrostatic chuck attached to the elongate arm; a cleaning station located within the reach of the elongate arm; and a reactive gas source that is operatively connected to the cleaning station.Type: ApplicationFiled: July 25, 2011Publication date: November 17, 2011Applicant: Applied Materials, Inc.Inventors: Dean C. Jennings, Majeed Foad, Jonathan Simmons
-
Patent number: 7993465Abstract: Methods and apparatus for cleaning electrostatic chucks in processing chambers are provided. The process comprises flowing a backside gas comprising a reactive agent into a zone in a process chamber, the zone defined by a space between a surface of an electrostatic chuck or of a cleaning station and a surface of a substrate. The surface of the electrostatic chuck is etched with the reactive agent to remove debris. An apparatus for cleaning an electrostatic chuck is also provided, the apparatus comprising: a process chamber; an elongate arm having a reach disposed through a wall of the process chamber; an electrostatic chuck attached to the elongate arm; a cleaning station located within the reach of the elongate arm; and a reactive gas source that is operatively connected to the cleaning station.Type: GrantFiled: September 7, 2006Date of Patent: August 9, 2011Assignee: Applied Materials, Inc.Inventors: Dean C. Jennings, Majeed Foad, Jonathon Simmons
-
Publication number: 20110095007Abstract: The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, a three-dimensional auto-focus, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation.Type: ApplicationFiled: December 29, 2010Publication date: April 28, 2011Applicant: Applied Materials, Inc.Inventors: Dean C. Jennings, Mark Yam, Abhilash J. Mayur, Vernon Behrens, Paul A. O'Brien, Leonid M. Tertitski, Alexander Goldin
-
Patent number: 7875829Abstract: The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, a three-dimensional auto-focus, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation.Type: GrantFiled: November 20, 2006Date of Patent: January 25, 2011Assignee: Applied Materials, Inc.Inventors: Dean C. Jennings, Mark Yam, Abhilash J. Mayur, Vernon Behrens, Paul A. O'Brien, Leonid M. Tertitski, Alexander Goldin
-
Patent number: 7872209Abstract: The thermal processing device includes a stage, a continuous wave electromagnetic radiation source, a series of lenses, a translation mechanism, a detection module, a three-dimensional auto-focus, and a computer system. The stage is configured to receive a substrate thereon. The continuous wave electromagnetic radiation source is disposed adjacent the stage, and is configured to emit continuous wave electromagnetic radiation along a path towards the substrate. The series of lenses is disposed between the continuous wave electromagnetic radiation source and the stage, and are configured to condense the continuous wave electromagnetic radiation into a line of continuous wave electromagnetic radiation on a surface of the substrate. The translation mechanism is configured to translate the stage and the line of continuous wave electromagnetic radiation relative to one another. The detection module is positioned within the path, and is configured to detect continuous wave electromagnetic radiation.Type: GrantFiled: October 25, 2007Date of Patent: January 18, 2011Assignee: Applied Materials, Inc.Inventors: Dean C. Jennings, Mark Yam, Abhilash J. Mayur, Vernon Behrens, Paul A. O'Brien, Leonid M. Tertitski, Alexander Goldin
-
Patent number: 7837357Abstract: An illumination system has a light source, an optical train, and a wavelength beam splitter. The optical train focuses light from the light source into a defined geometrical pattern on a surface. The wavelength beam splitter transmits light of a first wavelength and redirects light of a second wavelength. One of these wavelengths is included by the light from the light source, while the other is an emission wavelength generated by thermal excitation of the surface by the focused geometrical pattern.Type: GrantFiled: June 30, 2006Date of Patent: November 23, 2010Assignee: Applied Materials, Inc.Inventors: Dean C. Jennings, Timothy N. Thomas
-
Publication number: 20100266268Abstract: Substrate processing equipment and methods are used to improve the uniformity of illumination across an illuminated portion of a substrate by processing light with multiple optical homogenizers. The multiple optical homogenizers each include micro-lens arrays and Fourier lens. The multiple optical homogenizers are arranged so that the output numerical aperture of one of the optical homogenizers is within 5% of the input numerical aperture of another optical homogenizer.Type: ApplicationFiled: April 18, 2010Publication date: October 21, 2010Applicant: Applied Materials, Inc.Inventors: Dean C. Jennings, Timothy N. Thomas, Samuel C. Howells, Bruce E. Adams, Jiping Li
-
Publication number: 20090015830Abstract: Methods and devices are provided for profiling a beam of light that includes a wavelength ?. The beam of light is received. Secondary light is generated at a wavelength ?? different from wavelength ? by fluorescing a material with the received beam of light. The secondary light is separated from the received beam of light. The separated secondary light is optically directed to a sensor.Type: ApplicationFiled: August 29, 2008Publication date: January 15, 2009Applicant: Applied Materials, Inc.Inventors: Timothy N. Thomas, Bruce Adams, Dean C. Jennings
-
Patent number: 7440088Abstract: Methods and devices are provided for profiling a beam of light that includes a wavelength ?. The beam of light is received. Secondary light is generated at a wavelength ?? different from wavelength ? by fluorescing a material with the received beam of light. The secondary light is separated from the received beam of light. The separated secondary light is optically directed to a sensor.Type: GrantFiled: October 28, 2005Date of Patent: October 21, 2008Assignee: Applied Materials, Inc.Inventors: Timothy N. Thomas, Bruce Adams, Dean C. Jennings