Patents by Inventor Dean Joseph Eichman

Dean Joseph Eichman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6613204
    Abstract: Before submitting a sample, including a first material layered upon a substrate, to an ion milling process, whereby a second material is sputtered onto the surface of the first material and the sample is then submitted to an etching process, an irregularity is formed on the surface of the first material. The overall process results in the formation of cones, or micro-tip structures, which may then be layered with a layer of low work function material, such as amorphous diamond. The irregularity in the surface of the first material may be formed by polishing, sandblasting, photolithography, or mechanical means such as scratching.
    Type: Grant
    Filed: February 7, 2001
    Date of Patent: September 2, 2003
    Assignee: SI Diamond Technology, Inc.
    Inventors: Chenggang Xie, Dean Joseph Eichman
  • Publication number: 20010047931
    Abstract: Before submitting a sample, including a first material layered upon a substrate, to an ion milling process, whereby a second material is sputtered onto the surface of the first material and the sample is then submitted to an etching process, an irregularity is formed on the surface of the first material. The overall process results in the formation of cones, or micro-tip structures, which may then be layered with a layer of low work function material, such as amorphous diamond. The irregularity in the surface of the first material may be formed by polishing, sandblasting, photolithography, or mechanical means such as scratching.
    Type: Application
    Filed: February 7, 2001
    Publication date: December 6, 2001
    Applicant: SI Diamond Technology, Inc.
    Inventors: Chenggang Xie, Dean Joseph Eichman
  • Patent number: 6296740
    Abstract: Before submitting a sample, including a first material layered upon a substrate, to an ion milling process, whereby a second material is sputtered onto the surface of the first material and the sample is then submitted to an etching process, an irregularity is formed on the surface of the first material. The overall process results in the formation of cones, or micro-tip structures, which may then be layered with a layer of low work function material, such as amorphous diamond. The irregularity in the surface of the first material may be formed by polishing, sandblasting, photolithography, or mechanical means such as scratching.
    Type: Grant
    Filed: April 24, 1995
    Date of Patent: October 2, 2001
    Assignee: SI Diamond Technology, Inc.
    Inventors: Chenggang Xie, Dean Joseph Eichman