Patents by Inventor Dean T. Deibler

Dean T. Deibler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8932733
    Abstract: There is provided an electroactive composition. The composition has (a) a host material having Formula I and (b) an electroactive dopant capable of electroluminescence having an emission maximum between 500 and 700 nm. In Formula I: R1 to R8 are the same or different and can be H, alkyl, or alkoxy, or adjacent R groups may be joined together to form a 5- or 6-membered aliphatic ring, with the proviso that at least one of R1 to R8 is not H, Ar1 to Ar4 are the same or different and are aryl groups, A is the same or different at each occurrence and can be a single bond or a phenylene group, and a and b are the same or different and are an integer of 0-2.
    Type: Grant
    Filed: December 18, 2009
    Date of Patent: January 13, 2015
    Assignee: E I du Pont de Nemours and Company
    Inventors: Weiying Gao, Dean T. Deibler, Vsevolod Rostovtsev
  • Publication number: 20120001164
    Abstract: There is provided an organic electronic device including an anode; a photoactive layer; an electron transport layer; an electron tunneling layer having a thickness in the range of 10-50 ?; and a cathode.
    Type: Application
    Filed: May 11, 2010
    Publication date: January 5, 2012
    Applicant: E.I. DU PONT DE NEMOURS AND COMPANY
    Inventors: Weiying Gao, Dean T. Deibler
  • Publication number: 20100187981
    Abstract: There is provided an electroactive composition. The composition has (a) a host material having Formula I and (b) an electroactive dopant capable of electroluminescence having an emission maximum between 500 and 700 nm. In Formula I: R1 to R8 are the same or different and can be H, alkyl, or alkoxy, or adjacent R groups may be joined together to form a 5- or 6-membered aliphatic ring, with the proviso that at least one of R1 to R8 is not H, Ar1 to Ar4 are the same or different and are aryl groups, A is the same or different at each occurrence and can be a single bond or a phenylene group, and a and b are the same or different and are an integer of 0-2.
    Type: Application
    Filed: December 18, 2009
    Publication date: July 29, 2010
    Applicant: E. I. DU PONT DE NEMOURS AND COMPANY
    Inventors: Weiying Gao, Dean T. Deibler, Vsevolod Rostovtsev
  • Patent number: 5484074
    Abstract: A method for manufacturing a shadow mask for use in a cathode ray tube includes providing a thin metal web having a first and second major surfaces. Photosensitive layers are formed on the first and second major surfaces. The first photosensitive layer is exposed to a first patterned light and the second photosensitive layer is exposed to a second patterned light. The exposure is continued until respective accumulated exposure of the photosensitive layers reaches a predetermined value. Next, a first protective film is applied to the second photosensitive layer to prevent etching of the second surface. The first surface is then etched to form a first cavity. The first cavity has a depth that is less than a distance from the first surface to the second surface. A second protective film is applied to the first surface to prevent additional etching of the first surface. Then the first protective film is removed and the second surface is etched to form a second cavity.
    Type: Grant
    Filed: May 3, 1994
    Date of Patent: January 16, 1996
    Assignee: BMC Industries, Inc.
    Inventors: Dean T. Deibler, Thomas Ratz, Peter L. Takach, Roland Thoms
  • Patent number: 5236794
    Abstract: An emulsion covered photo printing plate for use in printing an etchant resist pattern on a light sensitive etchant resist located on a metal web covered with an etchant resist wherein the emulsion layer contains an exterior master pattern separated from an interior master pattern by a strip line with the interior master pattern having optically clear spacers located on top of the emulsion layer opaque projections and the nonopaque emulsion layer and the exterior emulsion layer having clear spacers located on top of the exterior emulsion layer with the area of the strip line being substantially devoid of spacers to provide evacuation channel past the strip line between the exterior master pattern and the interior master pattern.
    Type: Grant
    Filed: July 13, 1992
    Date of Patent: August 17, 1993
    Assignee: BMC Industries, Inc.
    Inventors: Dean T. Deibler, Joseph A. Marcanio
  • Patent number: 5149608
    Abstract: An emulsion covered photo printing plate for use in printing an echant resist pattern on a light sensitive etchant resist located on a metal web covered with an etchant resist wherein the emulsion layer contains an exterior master pattern separated from an interior master pattern by a strip line with the interior master pattern having optically clear spacers located on top of the emulsion layer opaque projections and the nonopaque emulsion layer and the exterior emulsion layer having clear spacers located on top of the exterior emulsion layer with the area of the strip line being substantially devoid of spacers to provide evacuation channel past the strip line between the exterior master pattern and the interior master pattern.
    Type: Grant
    Filed: June 9, 1989
    Date of Patent: September 22, 1992
    Assignee: BMC Industries
    Inventors: Dean T. Deibler, Joseph A. Marcanio
  • Patent number: 4669871
    Abstract: A method and apparatus for exposing a layer of photoresist on a sheet includes positioning the sheet in a vacuum printing frame comprising a glass photographic printing plate carrying an opaque master pattern of metal or metal oxide on a central area of the printing plate. A light transmissive rubbery material is patterned in such a fashion as to overlie the opaque portions of the master pattern and provide a continuous path between the islands overlying the opaque master pattern. The rubbery material also extends in the peripheral area of the photographic printing plate and a plurality of mesas separated by channels are formed in this peripheral area. The channels have a width substantially greater than the path width formed between adjacent islands of rubbery material overlying the opaque portions of the pattern. The peripheral channels facilitate the evacuation of the plate and reduce evacuation time.
    Type: Grant
    Filed: August 1, 1986
    Date of Patent: June 2, 1987
    Assignee: RCA Corporation
    Inventors: Charles M. Wetzel, John J. Moscony, Thomas J. Michielutti, Dean T. Deibler