Patents by Inventor Deana Delp

Deana Delp has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11853899
    Abstract: A method and apparatus for data analysis according to various aspects of the present invention is configured to test a set of components and generate test data for the components. A diagnostic system automatically analyzes the test data to identify a characteristic of a component fabrication process by recognizing a pattern in the test data and classifying the pattern using a neural network.
    Type: Grant
    Filed: May 29, 2018
    Date of Patent: December 26, 2023
    Assignee: In-Depth Test LLC
    Inventor: Deana Delp
  • Publication number: 20180293500
    Abstract: A method and apparatus for data analysis according to various aspects of the present invention is configured to test a set of components and generate test data for the components. A diagnostic system automatically analyzes the test data to identify a characteristic of a component fabrication process by recognizing a pattern in the test data and classifying the pattern using a neural network.
    Type: Application
    Filed: May 29, 2018
    Publication date: October 11, 2018
    Inventor: Deana Delp
  • Publication number: 20160026915
    Abstract: A method and apparatus for data analysis according to various aspects of the present invention is configured to test a set of components and generate test data for the components. A diagnostic system automatically analyzes the test data to identify a characteristic of a component fabrication process by recognizing a pattern in the test data and classifying the pattern using a neural network.
    Type: Application
    Filed: September 16, 2015
    Publication date: January 28, 2016
    Inventor: Deana Delp
  • Publication number: 20110178967
    Abstract: A method and apparatus for data analysis according to various aspects of the present invention is configured to test a set of components and generate test data for the components. A diagnostic system automatically analyzes the test data to identify a characteristic of a component fabrication process by recognizing a pattern in the test data and classifying the pattern using a neural network.
    Type: Application
    Filed: March 9, 2011
    Publication date: July 21, 2011
    Inventor: Deana Delp
  • Publication number: 20060259198
    Abstract: Embodiments of an intelligent modeling method and system monitor and perform analysis of semiconductor processing equipment as well as predict future states of that equipment based on the analysis, predict failures of the semiconductor processing equipment and/or determine equipment maintenance schedules.
    Type: Application
    Filed: May 26, 2006
    Publication date: November 16, 2006
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Jozef Brcka, Deana Delp, Michael Grapperhaus, Paul Moroz
  • Publication number: 20050199341
    Abstract: A method and system for analyzing multivariate data of plasma processes in which response surface and neural networks are utilized to improve or find optimal process settings of the plasma process such that performance measurements are compared against model measurements to modify a current plasma process to achieve optimized processing performance.
    Type: Application
    Filed: March 30, 2005
    Publication date: September 15, 2005
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Deana Delp, Lee Chen
  • Publication number: 20050184668
    Abstract: Integrated voltage and current (VI) probe (18) for integration inside a transmission line (17) having inner (3) and an outer (4) conductors. Current probes, often implemented as loop antennas, can be coupled to the outer conductor. The probes can either be built onto the same panel or on different panels.
    Type: Application
    Filed: February 27, 2003
    Publication date: August 25, 2005
    Applicant: Tokyo Electron Limited
    Inventors: Rick Parsons, Robert Jackson, Deana Delp
  • Publication number: 20050087515
    Abstract: A method and system for determining an endpoint in a (near) real-time environment using statistical process control. By utilizing such control, an endpoint of a semiconductor process (e.g., an etch) can be monitored. Monitoring may lead to increased yields by avoiding or reducing error conditions (e.g., under- or over-etching).
    Type: Application
    Filed: August 12, 2004
    Publication date: April 28, 2005
    Applicant: TOKYO ELECTRON LIMITED
    Inventor: Deana Delp