Abstract: The present disclosure provides a process for synthesizing functionalized multi-walled carbon nanotubes (MWCNTs), comprising: refluxing MWCNTs with an acidic mixture to obtain a acid functionalized MWCNTs; and reacting the acid functionalized MWCNTs with oleyl amine in presence of an organic solvent to obtain an oleylamine derivative of MWCNTs. The present disclosure also provides a process for synthesizing a polycarbosilane coated MWCNT, comprising: mixing polycarbosilane and MWCNTs to obtain a mixture; stirring the mixture in Tetrahydrofuran, in presence of a catalyst under an inert atmosphere, to obtain a reaction mixture; and drying the reaction mixture under vacuum followed by heating to obtain polycarbosilane coated MWCNT's.

Abstract: The present disclosure provides a process for synthesizing functionalized multi-walled carbon nanotubes (MWCNTs), comprising: refluxing MWCNTs with an acidic mixture to obtain a acid functionalized MWCNTs; and reacting the acid functionalized MWCNTs with oleyl amine in presence of an organic solvent to obtain an oleylamine derivative of MWCNTs. The present disclosure also provides a process for synthesizing a polycarbosilane coated MWCNT, comprising: mixing polycarbosilane and MWCNTs to obtain a mixture; stirring the mixture in Tetrahydrofuran, in presence of a catalyst under an inert atmosphere, to obtain a reaction mixture; and drying the reaction mixture under vacuum followed by heating to obtain polycarbosilane coated MWCNT's.

Abstract: A two step process for preparation of “high ortho” novolac resins. A first step involving reaction of phenolic component with formaldehyde carried out at room temperature, which ensures that all the formaldehyde used in the reaction is in liquid state, which almost completely reacts with phenolic compound, leaving no unreacted formaldehyde as effluents. The process uses CNSL or CNSL based phosphorylated prepolymer, or CNSL based monomeric Cardanol or hydrogenated Cardanol or vicinally hydroxylated Cardanol with formaldehyde and other phenolic compounds like m-cresol or p-cresol or o-cresol or 3.5-dimethylphenol or p-chlorophenol or resorcinol or t-butylphenol the positive and negative photoresists are made by mixing these polymers with appropriate photoactive components. For preparation of e-beam photoresist, these novolac resins are fist derivatised by t-BOC and then mixed with photoacid generator.