Abstract: A sampling system for use with an optical particle analyzer is disclosed. The sampling system includes a manifold having multiple ports, with each port receiving a chemical-mechanical polishing slurry. Each of the slurries enter the manifold through a separate slurry line. The optical particle analyzer is in operational association with the manifold in order to selectively measure the slurries after going through the manifold. The system flushes the manifold with a flushing fluid, such as ultra-pure water, to flush the slurry sample out of the manifold, followed by a purging with nitrogen to remove the ultra-pure water from the manifold, overall contributing to optimal slurry measurement. The system permits sampling of multiple slurries with a single particle analyzer.