Patents by Inventor Deepak Manaoharlal

Deepak Manaoharlal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for wafer detection
    Patent number: 6377060
    Abstract: An apparatus and a method for detecting the presence and position of a wafer upon a semiconductor wafer support pedestal surface. Specifically, a wafer detector comprising a plurality of electrodes on a surface of the wafer support pedestal. The electrodes are coupled to a capacitance measurement circuit that measures the capacitance between the electrodes and generates a signal corresponding to a wafer's presence, location and chucking condition. The wafer's presence completes an electrical circuit between the electrodes, increasing the capacitance between the electrodes. As such, the presence of a wafer, the position of the wafer, and the condition of the wafer, i.e., wafer damage, can be detected upon a wafer support pedestal during wafer processing.
    Type: Grant
    Filed: April 18, 2000
    Date of Patent: April 23, 2002
    Assignee: Applied Materials, Inc.
    Inventors: Vincent E. Burkhart, Deepak Manaoharlal
  • Apparatus for wafer detection
    Patent number: 6075375
    Abstract: An apparatus and a method for detecting the presence and position of a wafer upon a semiconductor wafer support pedestal surface. Specifically, a wafer detector comprising a plurality of electrodes on a surface of the wafer support pedestal. The electrodes are coupled to a capacitance measurement circuit that measures the capacitance between the electrodes and generates a signal corresponding to a wafer's presence, location and chucking condition. The wafer's presence completes an electrical circuit between the electrodes, increasing the capacitance between the electrodes. As such, the presence of a wafer, the position of the wafer, and the condition of the wafer, i.e., wafer damage, can be detected upon a wafer support pedestal during wafer processing.
    Type: Grant
    Filed: June 11, 1997
    Date of Patent: June 13, 2000
    Assignee: Applied Materials, Inc.
    Inventors: Vincent E. Burkhart, Deepak Manaoharlal