Abstract: The independent claims of the present disclosure signify a concise description of embodiments. An electronic structure based on complementary-field effect transistor (CFET) architecture is disclosed. The electronic structure comprises an n-channel metal-oxide-semiconductior (NMOS) gate-all-around (GAA) channel in a first layer, and p-channel metal-oxide-semiconductor (PMOS) GAA channel in a second layer. The PMOS GAA channel is wider compared to the NMOS GAA channel. The first layer is above the second layer and separated by a dielectric layer.

Abstract: A method includes generating a first bitmap for a cell. The first bitmap is indicative of mapping constraints of the cell. The method also includes generating a second bitmap for a PSC filler cell. The second bitmap is indicative of the mapping constraints of the PSC filler cell. The method also includes a bitwise logical operation between a portion of the first bitmap and a respective portion of the second bitmap and determining a compatibility between the cell and the PSC filler cell based on at least a result of the bitwise logical operation.

Abstract: A method includes generating a first bitmap for a cell. The first bitmap is indicative of mapping constraints of the cell. The method also includes generating a second bitmap for a PSC filler cell. The second bitmap is indicative of the mapping constraints of the PSC filler cell. The method also includes a bitwise logical operation between a portion of the first bitmap and a respective portion of the second bitmap and determining a compatibility between the cell and the PSC filler cell based on at least a result of the bitwise logical operation.

Abstract: A finFET block architecture suitable for use of a standard cell library, is based on an arrangement including a first set of semiconductor fins in a first region of the substrate having a first conductivity type, and a second set of semiconductor fins in a second region of the substrate, the second region having a second conductivity type. A patterned gate conductor layer including gate traces in the first and second regions, arranged over channel regions of the first and second sets of semiconductor fins is used for transistor gates. Patterned conductor layers over the gate conductor layer are arranged in orthogonal layout patterns, and can include a plurality of floating power buses over the fins in the first and second regions.

Abstract: A finFET block architecture includes a first set of semiconductor fins having a first conductivity type, and a second set of semiconductor fins having a second conductivity type. An inter-block insulator is placed between outer fins of the first and second sets. A patterned gate conductor layer includes a first plurality of gate traces extending across the set of fins in the first block without crossing the inter-block insulator, and a second plurality of gate traces extending across the set of fins in the second block without crossing the inter-block insulator. Patterned conductor layers over the gate conductor layer are arranged in orthogonal layout patterns, and include an inter-block connector arranged to connect gate traces in the first and second blocks.

Abstract: Various methods and apparatuses are described for a power distribution structure. In an embodiment, an integrated circuit contains power gating cells that each contain Metal Oxide Semiconductor (MOS) device switches located relative in the power distribution structure to power up and down a block of logic containing a plurality of individual cells using these MOS device switches. The MOS device switches can be tuned to requirements of a target block of logic in order to meet its optimal voltage drop requirements during its active operational state while minimizing leakage current in its off state.

Abstract: A finFET block architecture includes a first set of semiconductor fins having a first conductivity type, and a second set of semiconductor fins having a second conductivity type. An inter-block insulator is placed between outer fins of the first and second sets. A patterned gate conductor layer includes a first plurality of gate traces extending across the set of fins in the first block without crossing the inter-block insulator, and a second plurality of gate traces extending across the set of fins in the second block without crossing the inter-block insulator. Patterned conductor layers over the gate conductor layer are arranged in orthogonal layout patterns, and include an inter-block connector arranged to connect gate traces in the first and second blocks.

Abstract: A finFET block architecture suitable for use of a standard cell library, is based on an arrangement including a first set of semiconductor fins in a first region of the substrate having a first conductivity type, and a second set of semiconductor fins in a second region of the substrate, the second region having a second conductivity type. A patterned gate conductor layer including gate traces in the first and second regions, arranged over channel regions of the first and second sets of semiconductor fins is used for transistor gates. Patterned conductor layers over the gate conductor layer are arranged in orthogonal layout patterns, and can include a plurality of floating power buses over the fins in the first and second regions.

Abstract: An integrated circuit has a power rail formed of a first wire in a lower metal layer and a second wire in an upper metal layer and that run in the same direction in their respective layers. A number of vias connect the first and second wires, to form a sandwich power rail structure. Other embodiments are also described and claimed.

Abstract: An integrated circuit has a power rail formed of a first wire in a lower metal layer and a second wire in an upper metal layer and that run in the same direction in their respective layers. A number of vias connect the first and second wires, to form a sandwich power rail structure. Other embodiments are also described and claimed.

Abstract: Various methods and apparatuses are described in which an integrated circuit is organized into rows and columns of macro cells having a layout architecture that includes at least two metal layers and a plurality of traces carrying three or more different potentials of voltage routed by the metal layers. A first, a second, and a third adjacent metal layers extend across the integrated circuit. The plurality of traces carry three or more different potentials of voltage and are routed in the metal layers. A first power trace supplies a VDD voltage potential. A second power trace supplies a VSS voltage potential. A third power trace supplies a third voltage potential to support sleep modes and retain data during sleep modes. All three power supply traces connect to one or more transistors in a first macro cell.

Abstract: An apparatus for a volatile latch circuit. The volatile latch circuit may have a master latch sub circuit coupled to a slave latch sub circuit. The slave latch sub circuit maintains the logic state stored by the volatile latch circuit. The slave sub circuit may connect to a first power trace that continuously provides a first voltage potential to the slave latch sub circuit even during a sleep mode. The master latch sub circuit may connect to a second power trace that provides a second voltage potential to the master latch sub circuit that is switchably turned off during the sleep mode.