Patents by Inventor Deepkishore Mukhopadhyay

Deepkishore Mukhopadhyay has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11719719
    Abstract: A method of batch-fabricating an array of probe devices for a surface analysis instrument, such as an atomic force microscope (AFM), includes providing a wafer, and photolithographically forming a base and a cantilever for each probe. The cantilever includes a built-in angle, ?, relative to the base, and the base is substantially parallel to a sample holder when the probe device is mounted in a probe holder of the surface analysis instrument.
    Type: Grant
    Filed: June 16, 2021
    Date of Patent: August 8, 2023
    Assignee: Bruker Nano, Inc.
    Inventors: Jeffrey Wong, Joseph Fragala, Weijie Wang, Deepkishore Mukhopadhyay, Xing Zhao, Rakesh Poddar
  • Patent number: 11644480
    Abstract: A probe assembly for a surface analysis instrument such as an atomic force microscope (AFM) that accommodates potential thermal drift effects includes a substrate defining a base of the probe assembly, a cantilever extending from the base and having a distal end, and a reflective pad disposed at or near the distal end. The reflective pad has a lateral dimension (e.g., length) between about twenty-five (25) microns, and can be less than a micron. Ideally, the reflective pad is patterned on the cantilever using photolithography. A corresponding method of manufacture of the thermally stable, drift resistant probe is also provided.
    Type: Grant
    Filed: August 3, 2018
    Date of Patent: May 9, 2023
    Assignee: Bruker Nano, Inc.
    Inventors: Jeffrey K. Wong, Deepkishore Mukhopadhyay
  • Publication number: 20220404392
    Abstract: A method of batch-fabricating an array of probe devices for a surface analysis instrument, such as an atomic force microscope (AFM), includes providing a wafer, and photolithographically forming a base and a cantilever for each probe. The cantilever includes a built-in angle, ?, relative to the base, and the base is substantially parallel to a sample holder when the probe device is mounted in a probe holder of the surface analysis instrument.
    Type: Application
    Filed: June 16, 2021
    Publication date: December 22, 2022
    Inventors: Jeffrey Wong, Joseph Fragala, Weijie Wang, Deepkishore Mukhopadhyay, Xing Zhao, Rakesh Poddar
  • Publication number: 20200241038
    Abstract: A probe assembly for a surface analysis instrument such as an atomic force microscope (AFM) that accommodates potential thermal drift effects includes a substrate defining a base of the probe assembly, a cantilever extending from the base and having a distal end, and a reflective pad disposed at or near the distal end. The reflective pad has a lateral dimension (e.g., length) between about twenty-five (25) microns, and can be less than a micron. Ideally, the reflective pad is patterned on the cantilever using photolithography. A corresponding method of manufacture of the thermally stable, drift resistant probe is also provided.
    Type: Application
    Filed: August 3, 2018
    Publication date: July 30, 2020
    Inventors: Jeffrey K. Wong, Deepkishore Mukhopadhyay
  • Patent number: 9487002
    Abstract: Provided are high-resolution electrohydrodynamic inkjet (e-jet) printing systems and related methods for printing functional materials on a substrate surface. In an embodiment, a nozzle with an ejection orifice that dispenses a printing fluid faces a surface that is to be printed. The nozzle is electrically connected to a voltage source that applies an electric charge to the fluid in the nozzle to controllably deposit the printing fluid on the surface. In an aspect, a nozzle that dispenses printing fluid has a small ejection orifice, such as an orifice with an area less than 700 ?m2 and is capable of printing nanofeatures or microfeatures. In an embodiment the nozzle is an integrated-electrode nozzle system that is directly connected to an electrode and a counter-electrode. The systems and methods provide printing resolutions that can encompass the sub-micron range.
    Type: Grant
    Filed: April 14, 2015
    Date of Patent: November 8, 2016
    Assignee: The Board of Trustees of the University of Illinois
    Inventors: John A Rogers, Jang-Ung Park, Placid M. Ferreira, Deepkishore Mukhopadhyay
  • Patent number: 9412480
    Abstract: A method and apparatus are provided for implementing Bragg-diffraction leveraged modulation of X-ray pulses using MicroElectroMechanical systems (MEMS) based diffractive optics. An oscillating crystalline MEMS device generates a controllable time-window for diffraction of the incident X-ray radiation. The Bragg-diffraction leveraged modulation of X-ray pulses includes isolating a particular pulse, spatially separating individual pulses, and spreading a single pulse from an X-ray pulse-train.
    Type: Grant
    Filed: May 9, 2013
    Date of Patent: August 9, 2016
    Assignee: uchicago Argonne, LLC
    Inventors: Daniel Lopez, Gopal Shenoy, Jin Wang, Donald A. Walko, Il-Woong Jung, Deepkishore Mukhopadhyay
  • Publication number: 20150290938
    Abstract: Provided are high-resolution electrohydrodynamic inkjet (e-jet) printing systems and related methods for printing functional materials on a substrate surface. In an embodiment, a nozzle with an ejection orifice that dispenses a printing fluid faces a surface that is to be printed. The nozzle is electrically connected to a voltage source that applies an electric charge to the fluid in the nozzle to controllably deposit the printing fluid on the surface. In an aspect, a nozzle that dispenses printing fluid has a small ejection orifice, such as an orifice with an area less than 700 ?m2 and is capable of printing nanofeatures or microfeatures. In an embodiment the nozzle is an integrated-electrode nozzle system that is directly connected to an electrode and a counter-electrode. The systems and methods provide printing resolutions that can encompass the sub-micron range.
    Type: Application
    Filed: April 14, 2015
    Publication date: October 15, 2015
    Inventors: John A. ROGERS, Jang-Ung PARK, Placid M. FERREIRA, Deepkishore MUKHOPADHYAY
  • Patent number: 9061494
    Abstract: Provided are high-resolution electrohydrodynamic inkjet (e-jet) printing systems and related methods for printing functional materials on a substrate surface. In an embodiment, a nozzle with an ejection orifice that dispenses a printing fluid faces a surface that is to be printed. The nozzle is electrically connected to a voltage source that applies an electric charge to the fluid in the nozzle to controllably deposit the printing fluid on the surface. In an aspect, a nozzle that dispenses printing fluid has a small ejection orifice, such as an orifice with an area less than 700 ?m2 and is capable of printing nanofeatures or microfeatures. In an embodiment the nozzle is an integrated-electrode nozzle system that is directly connected to an electrode and a counter-electrode. The systems and methods provide printing resolutions that can encompass the sub-micron range.
    Type: Grant
    Filed: August 30, 2007
    Date of Patent: June 23, 2015
    Assignee: The Board of Trustees of the University of Illinois
    Inventors: John A. Rogers, Jang-Ung Park, Placid M. Ferreira, Deepkishore Mukhopadhyay
  • Patent number: 8976933
    Abstract: A method and apparatus are provided for spatially modulating X-rays or X-ray pulses using microelectromechanical systems (MEMS) based X-ray optics. A torsionally-oscillating MEMS micromirror and a method of leveraging the grazing-angle reflection property are provided to modulate X-ray pulses with a high-degree of controllability.
    Type: Grant
    Filed: September 27, 2011
    Date of Patent: March 10, 2015
    Assignee: UChicago Argonne, LLC
    Inventors: Daniel Lopez, Gopal Shenoy, Jin Wang, Donald A. Walko, Il-Woong Jung, Deepkishore Mukhopadhyay
  • Publication number: 20140334607
    Abstract: A method and apparatus are provided for implementing Bragg-diffraction leveraged modulation of X-ray pulses using MicroElectroMechanical systems (MEMS) based diffractive optics. An oscillating crystalline MEMS device generates a controllable time-window for diffraction of the incident X-ray radiation. The Bragg-diffraction leveraged modulation of X-ray pulses includes isolating a particular pulse, spatially separating individual pulses, and spreading a single pulse from an X-ray pulse-train.
    Type: Application
    Filed: May 9, 2013
    Publication date: November 13, 2014
    Applicant: UChicago Argonne, LLC
    Inventors: Daniel Lopez, Gopal Shenoy, Jin Wang, Donald A. Walko, Il-Woong Jung, Deepkishore Mukhopadhyay
  • Patent number: 8574139
    Abstract: A machine tool having an automatic tool changer (ATC). The machine tool includes a gantry, a spindle extending from the gantry, a configurable work area, and an ATC adjacent to a front wall of the machine tool. The ATC includes a rotary tool magazine and a plurality of receptacles oriented radially around the rotary tool magazine configured to hold a plurality of cutting tools having cutting edges. The cutting edges of the cutting tools point radially inwardly around the rotary tool magazine, and the cutting tools are removed directly from the automatic tool changer by the spindle and brought to a part to be machined. A tool sensor may be located between the ATC and the spindle to take measurements of the cutting tool. The ATC includes at least one receptacle configured to hold a cutting tool.
    Type: Grant
    Filed: August 12, 2009
    Date of Patent: November 5, 2013
    Assignee: Microlution, Inc.
    Inventors: Andrew Honegger, Andrew Phillip, Deepkishore Mukhopadhyay, Abhinandan Tulsian, Elizabeth Creighton
  • Publication number: 20130077759
    Abstract: A method and apparatus are provided for spatially modulating X-rays or X-ray pulses using microelectromechanical systems (MEMS) based X-ray optics. A torsionally-oscillating MEMS micromirror and a method of leveraging the grazing-angle reflection property are provided to modulate X-ray pulses with a high-degree of controllability.
    Type: Application
    Filed: September 27, 2011
    Publication date: March 28, 2013
    Applicant: UCHICAGO ARGONNE, LLC
    Inventors: Daniel Lopez, Gopal Shenoy, Jin Wang, Donald A. Walko, Il-Woong Jung, Deepkishore Mukhopadhyay
  • Patent number: 8310128
    Abstract: MEMS stages comprising a plurality of comb drive actuators provide micro and up to nano-positioning capability. Flexure hinges and folded springs that operably connect the actuator to a movable end stage provide independent motion from each of the actuators that minimizes unwanted off-axis displacement, particularly for three-dimensional movement of a cantilever. Also provided are methods for using and making MEMS stages. In an aspect, a process provides a unitary MEMS stage made from a silicon-on-insulator wafer that avoids any post-fabrication assembly steps. Further provided are various devices that incorporate any of the stages disclosed herein, such as devices requiring accurate positioning systems in applications including scanning probe microscopy, E-jet printing, near-field optic sensing, cell probing and material characterization.
    Type: Grant
    Filed: May 7, 2009
    Date of Patent: November 13, 2012
    Assignee: The Board of Trustees of the University of Illinois
    Inventors: Placid M. Ferreira, Jingyan Dong, Deepkishore Mukhopadhyay
  • Publication number: 20110187798
    Abstract: Provided are high-resolution electrohydrodynamic inkjet (e-jet) printing systems and related methods for printing functional materials on a substrate surface. In an embodiment, a nozzle with an ejection orifice that dispenses a printing fluid faces a surface that is to be printed. The nozzle is electrically connected to a voltage source that applies an electric charge to the fluid in the nozzle to controllably deposit the printing fluid on the surface. In an aspect, a nozzle that dispenses printing fluid has a small ejection orifice, such as an orifice with an area less than 700 ?m2 and is capable of printing nanofeatures or microfeatures. In an embodiment the nozzle is an integrated-electrode nozzle system that is directly connected to an electrode and a counter-electrode. The systems and methods provide printing resolutions that can encompass the sub-micron range.
    Type: Application
    Filed: August 30, 2007
    Publication date: August 4, 2011
    Inventors: John A. Rogers, Jang-Ung Park, Placid M. Ferreira, Deepkishore Mukhopadhyay
  • Publication number: 20110039670
    Abstract: A machine tool having an automatic tool changer (ATC). The machine tool includes a gantry, a spindle extending from the gantry, a configurable work area, and an ATC adjacent to a front wall of the machine tool. The ATC includes a rotary tool magazine and a plurality of receptacles oriented radially around the rotary tool magazine configured to hold a plurality of cutting tools having cutting edges. The cutting edges of the cutting tools point radially inwardly around the rotary tool magazine, and the cutting tools are removed directly from the automatic tool changer by the spindle and brought to a part to be machined. A tool sensor may be located between the ATC and the spindle to take measurements of the cutting tool. The ATC includes at least one receptacle configured to hold a cutting tool.
    Type: Application
    Filed: August 12, 2009
    Publication date: February 17, 2011
    Applicant: MICROLUTION, INC.
    Inventors: Andrew Honegger, Andrew Phillip, Deepkishore Mukhopadhyay, Abhinandan Tulsian, Elizabeth Creighton
  • Publication number: 20100001616
    Abstract: MEMS stages comprising a plurality of comb drive actuators provide micro and up to nano-positioning capability. Flexure hinges and folded springs that operably connect the actuator to a movable end stage provide independent motion from each of the actuators that minimizes unwanted off-axis displacement, particularly for three-dimensional movement of a cantilever. Also provided are methods for using and making MEMS stages. In an aspect, a process provides a unitary MEMS stage made from a silicon-on-insulator wafer that avoids any post-fabrication assembly steps. Further provided are various devices that incorporate any of the stages disclosed herein, such as devices requiring accurate positioning systems in applications including scanning probe microscopy, E-jet printing, near-field optic sensing, cell probing and material characterization.
    Type: Application
    Filed: May 7, 2009
    Publication date: January 7, 2010
    Inventors: Placid M. FERREIRA, Jingyan DONG, Deepkishore MUKHOPADHYAY