Abstract: The present disclosure belongs to the technical field of silica. The present disclosure particularly relates to an abrasive-type silica for toothpaste with a low specific surface area and a low pore volume and a preparation method therefor. The abrasive-type silica provided by the present disclosure has a specific surface area less than 2.79 m2/g and a pore volume less than 0.4 cm3/g, has the advantages of high stability, better essence volatility, high dispersive performance, high cleanliness, good fluorine compatibility, and the like, is suitable for use in toothpaste, and complies with the requirements of European Union regulations. The preparation method for silica provided by the present disclosure has the advantages of a simple and stable process, easy condition control, low cost, and the like, and is easier for industrial production and popularization and application.

Abstract: A preparation method for silicon dioxide, controls temperature, pH and stirring rate in steps of preparing a silicon dioxide solution to exert an influence on the stability of a silicon dioxide solution gel system. The prepared silicon dioxide solution has a low viscosity, and finally prepared silicon dioxide has a high dispersity. The prepared silicon dioxide solution with a low viscosity will not adhere to a reaction tank, thus being easy to discharge. When the silicon dioxide prepared by the preparation method is used for preparing a toothpaste, since the silicon dioxide shows high dispersity due to its large BET specific area, low oil absorption and low viscosity, paste of the prepared toothpaste is not prone to caking and can be rinsed off easily. The paste of the prepared toothpaste shows high stability in a follow-up test of the viscosity stability of the toothpaste, thus being suitable for long-term storage.