Patents by Inventor Dejan Stojakovic

Dejan Stojakovic has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230019816
    Abstract: A sterling silver chain and method of manufacturing a sterling silver chain comprising a plurality of chain links. Each of the chain links can comprise a sterling silver wire, the sterling silver wire comprising a first end and a second end. Each of the first end and the second end of each of the plurality of chain links can be joined together through a weld. Each of the plurality of chain links can comprise at least 92.5% by weight silver and at least 6.5% by weight tin.
    Type: Application
    Filed: July 13, 2021
    Publication date: January 19, 2023
    Inventor: Dejan Stojakovic
  • Patent number: 11101118
    Abstract: Methods for making a high purity (>99.99%) and low oxygen (<40 ppm) sputtering target containing Co, CoFe, CoNi, CoMn, CoFeX (X=B, C, Al), Fe, FeNi, or Ni alloys with a column microstructure framed by boron intermetallics are disclosed. The sputtering target is made by directional casting a molten mixture of the metal alloy, annealing to remove residual stresses, slicing, and optional annealing and finishing to obtain the sputtering target.
    Type: Grant
    Filed: January 25, 2019
    Date of Patent: August 24, 2021
    Assignee: Materion Corporation
    Inventors: Xingbo Yang, Dejan Stojakovic, Matthew J. Komertz, Arthur V. Testanero
  • Patent number: 10604836
    Abstract: Methods for finishing a sputtering target to reduce particulation and to reduce burn-in time are disclosed. The surface of the unfinished sputtering target is blasted with beads to remove machining-induced defects. Additional post-processing steps include dust blowing-off, surface wiping, dry ice blasting, removing moisture using hot air gun, and annealing, resulting in a homogeneous, ultra-clean, residual-stress-free, hydrocarbon chemicals-free surface.
    Type: Grant
    Filed: May 13, 2016
    Date of Patent: March 31, 2020
    Assignee: MATERION CORPORATION
    Inventors: Longzhou Ma, Xingbo Yang, Dejan Stojakovic, Arthur V. Testanero, Matthew J. Komertz
  • Publication number: 20190157055
    Abstract: Methods for making a high purity (>99.99%) and low oxygen (<40 ppm) sputtering target containing Co, CoFe, CoNi, CoMn, CoFeX (X=B, C, Al), Fe, FeNi, or Ni alloys with a column microstructure framed by boron intermetallics are disclosed. The sputtering target is made by directional casting a molten mixture of the metal alloy, annealing to remove residual stresses, slicing, and optional annealing and finishing to obtain the sputtering target.
    Type: Application
    Filed: January 25, 2019
    Publication date: May 23, 2019
    Inventors: Xingbo Yang, Dejan Stojakovic, Matthew J. Komertz, Arthur V. Testanero
  • Patent number: 10199203
    Abstract: Methods for making a high purity (>99.99%) and low oxygen (<40 ppm) sputtering target containing Co, CoFe, CoNi, CoMn, CoFeX (X?B, C, Al), Fe, FeNi, or Ni alloys with a column microstructure framed by boron intermetallics are disclosed. The sputtering target is made by directional casting a molten mixture of the metal alloy, annealing to remove residual stresses, slicing, and optional annealing and finishing to obtain the sputtering target.
    Type: Grant
    Filed: May 13, 2016
    Date of Patent: February 5, 2019
    Assignee: MATERION CORPORATION
    Inventors: Xingbo Yang, Dejan Stojakovic, Matthew J. Komertz, Arthur V. Testanero
  • Publication number: 20160333461
    Abstract: Methods for finishing a sputtering target to reduce particulation and to reduce burn-in time are disclosed. The surface of the unfinished sputtering target is blasted with beads to remove machining-induced defects. Additional post-processing steps include dust blowing-off, surface wiping, dry ice blasting, removing moisture using hot air gun, and annealing, resulting in a homogeneous, ultra-clean, residual-stress-free, hydrocarbon chemicals-free surface.
    Type: Application
    Filed: May 13, 2016
    Publication date: November 17, 2016
    Inventors: Longzhou Ma, Xingbo Yang, Dejan Stojakovic, Arthur V. Testanero, Matthew J. Komertz
  • Publication number: 20160336155
    Abstract: Methods for making a high purity (>99.99%) and low oxygen (<40 ppm) sputtering target containing Co, CoFe, CoNi, CoMn, CoFeX (X?B, C, Al), Fe, FeNi, or Ni alloys with a column microstructure framed by boron intermetallics are disclosed. The sputtering target is made by directional casting a molten mixture of the metal alloy, annealing to remove residual stresses, slicing, and optional annealing and finishing to obtain the sputtering target.
    Type: Application
    Filed: May 13, 2016
    Publication date: November 17, 2016
    Inventors: Xingbo Yang, Dejan Stojakovic, Matthew J. Komertz, Arthur V. Testanero