Patents by Inventor Delphine MORALES

Delphine MORALES has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10711248
    Abstract: A method and device for standardizing myoblast differentiation into myotubes, including a substrate (1) and at least one cell-adhesive pattern (2) for culturing myoblasts on the substrate. The pattern (2) has an elongated surface. A central region (2C) and two lateral regions (2L) extend from the central region in both directions along a longitudinal axis of the pattern. The ratio between the maximum width (WC) of the central region (2C) and the maximum width (WL) of the lateral regions (2L) is greater than or equal to 2. The ratio between the length (L) and the maximum width (WC) of the pattern (2) is less than or equal to 4. The method includes providing a device as described above, depositing myoblasts on at least one cell-adhesive pattern of the device, culturing the myoblasts in a differentiation medium to promote cell differentiation into myotubes and constrain elongation of the myotubes.
    Type: Grant
    Filed: December 17, 2014
    Date of Patent: July 14, 2020
    Assignee: CYTOO
    Inventors: Mathieu Fernandes, Sebastien Degot, Yoran Margaron, Jie Liu, Michel Bornens, Maria Luisa Calvo Munoz, Aurelie Berthelot, Alexandra Fuchs, Joanne Young, Delphine Morales
  • Publication number: 20160312187
    Abstract: The invention relates to a device for standardizing myoblast differentiation into myotubes, comprising a substrate (1) and at least one cell-adhesive pattern (2) for culturing myoblasts on said substrate, wherein: said pattern (2) has an elongated surface comprising a central region (2C) and two lateral regions (2L) extending from said central region in both directions along a longitudinal axis of the pattern with a contour discontinuity between the central region (2C) and each lateral region (2L), the ratio between the maximum width (WC) of the central region (2C) and the maximum width (WL) of the lateral regions (2L) is greater than or equal to 2, the ratio between the length (L) and the maximum width (WC) of the pattern (2) is less than or equal to 4.
    Type: Application
    Filed: December 17, 2014
    Publication date: October 27, 2016
    Inventors: Mathieu FERNANDES, Sebastien DEGOT, Yoran MARGARON, Jie LIU, Michel BORNENS, Maria Luisa CALVO MUNOZ, Aurelie BERTHELOT, Alexandra FUCHS, Joanne YOUNG, Delphine MORALES