Abstract: An in-line particle sensor includes a sensor body, an illumination source, an illumination detector and communication electronics. The sensor body has an electronics enclosure and a flowthrough portion with a fluid inlet, a fluid outlet, a sample interaction region and a fluid path extending through the sample interaction region from the fluid inlet to the fluid outlet. The illumination source is disposed to provide light through at least a portion of the sample interaction region. The illumination detector is disposed to detect illumination variation resulting from illumination impinging at least one particle in the flow path in the sample interaction region. The communication electronics are operably coupled to the illumination detector to provide an indication of the at least one particle sensed by the illumination detector. The sample interaction region is configured to withstand high operating pressure.

Abstract: A wireless sensor includes at least one capacitive plate for sensing a distance relative to an object of interest within a semiconductor-processing environment. The sensor includes an internal power source and wireless communication such that distance and/or parallelism measurements effected using the capacitive plate(s) can be provided wirelessly to an external device.

Abstract: A wireless substrate-like sensor is provided to facilitate alignment and calibration of semiconductor processing systems. The wireless substrate-like sensor includes an optical image acquisition system that acquires one or more images of targets placed within the semiconductor processing system. Analysis of images of the targets obtained by the wireless substrate-like sensor provides position and/or orientation information in at least three degrees of freedom. An additional target is affixed to a known location within the semiconductor processing system such that imaging the reference position with the wireless substrate-like sensor allows the measurement and compensation for pick-up errors.

Abstract: A wireless substrate-like sensor is provided to facilitate alignment and calibration of semiconductor processing systems. The wireless substrate-like sensor includes an optical image acquisition system that acquires one or more images of targets placed within the semiconductor processing system. Analysis of images of the targets obtained by the wireless substrate-like sensor provides position and/or orientation information in at least three degrees of freedom. An additional target is affixed to a known location within the semiconductor processing system such that imaging the reference position with the wireless substrate-like sensor allows the measurement and compensation for pick-up errors.

Abstract: In accordance with one aspect of the present invention, a wireless substrate-like sensor is provided having at least one weight-reducing feature. The feature can include the type of material from which the sensor is constructed, such as aluminum, an aluminum alloy, magnesium, or ceramic. The feature can also include one or more structural adaptations such as holes, whether through or partial, and struts.

Abstract: In accordance with an aspect of the present invention, a wireless substrate-like sensor is configured to ensure it does not contaminate a semiconductor processing chamber. The sensor is sealed except for one or more apertures. In one embodiment, a vent is disposed proximate the apertures. In another embodiment, the aperture is coupled to a pressure equalization member that deforms in response to a differential in pressure between the sensor interior and exterior.

Abstract: In accordance with an aspect of the present invention, a wireless substrate-like sensor is configured to be low-profile. One exemplary low-profile design includes using an image acquisition system on a leadless ceramic carrier chip. Then a circuit board, or rigid interconnect, is provided with a recess to accommodate the image acquisition system. The image acquisition system is disposed within the recess and coupled to the board through the periphery of the leadless ceramic carrier chip.

Abstract: Embodiments of the present invention generally provide accurate spatial determination, in three dimensions, of the wafer location, along with the provision of information about the presence of any error conditions relative to the wafer(s) such as cross slotting or double stacked wafers inside the wafer carrier. A device in accordance with an embodiment of the invention can be used in conjunction with a wafer handling system which requires the measurement of a wafer's location before it can be picked up and passed through a set of processing steps.