Patents by Inventor Deng-Guey Juang

Deng-Guey Juang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6365303
    Abstract: A mask pattern having an anti-ESD ring which protects the pattern region of the mask from damage due to ESD events. The anti-ESD ring has a space between two broad border regions formed of an opaque metal such as chrome. ESD fingers, or rods extend from one of the border regions to within a small gap of the other border region. These ESD fingers act as lightning rods so that ESD events preferably occur across this small gap between the ESD fingers and one of the border regions. The ESD fingers are small enough so that any metal transferred across the gap in an ESD event is very small. The gap is located so that any metal transferred is far away from the pattern region of the mask. The ESD fingers confine ESD events to a preferred region of the mask and damage to the pattern region is avoided.
    Type: Grant
    Filed: April 24, 2000
    Date of Patent: April 2, 2002
    Assignee: Taiwan Semiconductor Manufacturing Company
    Inventors: Chang-Cheng Hung, Jeen-Hao Liu, Yi-Hsu Chen, Yung-Haw Liaw, Dong-Hsu Cheng, Deng-Guey Juang
  • Patent number: 6248169
    Abstract: A liquid coating apparatus that is adapted for dispensing two or more different liquids and a method for using such apparatus are disclosed. In the apparatus, when two different liquids are dispensed in the same coating apparatus, two separate drain cups are utilized in which an upper drain cup is constructed in a toroidal shape and formed in two symmetrical halves such that they may be withdrawn from an operating position outwardly to allow a wafer platform and a liquid spray nozzle to be lowered into a lower drain cup for dispensing a second liquid material. The lower drain cup can be mounted concentrically with the upper drain cup. The present invention novel apparatus allows at least two different liquids to be processed in the same coating apparatus such that chemical reactions between the different liquids and the resulting particle formation and contamination problems can be avoided.
    Type: Grant
    Filed: June 1, 1999
    Date of Patent: June 19, 2001
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Deng-Guey Juang, Wen-Jye Chung
  • Patent number: 6247599
    Abstract: An electrostatic discharge-free container equipped with a metal shield for holding an insulating article therein is described. In the container, an electrically conductive layer substantially covers a bottom lid made of a non-conductive material so as to sufficiently shield the insulating article from electrostatic discharge damages. The present invention novel ESD-free container may further be provided with a metal knob situated in a top lid of the container, or be provided with a metal enclosure positioned inside the container between the top lid and the insulating article. The metal layer that substantially overlaps the bottom lid may be injection molded as an insert in the bottom lid, or may be coated or plated on the bottom lid. The present invention novel ESD-free container eliminates any electrostatic discharge from occurring on a reticle plate and thus avoiding any potential damages.
    Type: Grant
    Filed: January 14, 2000
    Date of Patent: June 19, 2001
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd
    Inventors: Dong-Hsu Cheng, Yung Haw Liaw, Deng-Guey Juang