Patents by Inventor Deng-Yann Huoh

Deng-Yann Huoh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Slurry for color photoresist planarization
    Publication number: 20050136669
    Abstract: The present invention relates to a chemical mechanical abrasive slurry for polishing a color photoresist, comprising composite abrasive particles and an aqueous medium. The abrasive slurry of the present invention can effectively polish off horn-like protuberances color filter processing.
    Type: Application
    Filed: May 18, 2004
    Publication date: June 23, 2005
    Applicant: Eternal Chemical Co., Ltd.
    Inventors: Chia-Hao Lee, Wen-Cheng Liu, Deng-Yann Huoh