Patents by Inventor Denis GLUSHKOV

Denis GLUSHKOV has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANUFACTURING A SPECTRAL PURITY FILTER
    Publication number: 20120147350
    Abstract: A transmissive spectral purity filter configured to transmit extreme ultraviolet radiation includes a filter part having a plurality of apertures to transmit extreme ultraviolet radiation and to suppress transmission of a second type of radiation. The apertures may be manufactured in semiconductor material such as silicon by an anisotropic etching process. The semiconductor material is provided with a hydrogen-resistant layer, such as silicon nitride Si3N4, silicon dioxide SiO2, or silicon carbide SiC.
    Type: Application
    Filed: May 11, 2010
    Publication date: June 14, 2012
    Applicant: ASML NETHERLANDS B.V
    Inventors: Andrei Yakunin, Vadim Banine, Denis Glushkov
  • TARGET MATERIAL, A SOURCE, AN EUV LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD USING THE SAME
    Publication number: 20110043777
    Abstract: A target material is configured to be used in a source constructed and arranged to generate a radiation beam having a wavelength in an extreme ultraviolet range. The target material includes a Gd-based composition configured to modify a melting temperature of Gd.
    Type: Application
    Filed: March 20, 2009
    Publication date: February 24, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Vladimir Mihailovitc Krivtsun, Vadim Yevgenyevich Banine, Arno Jan Bleeker, Vladimir Vitalevitch Ivanov, Konstantin Nikolaevitch Koshelev, Johannes Hubertus Josephina Moors, Sergey Churilov, Denis Glushkov
  • LITHOGRAPHIC APPARATUS
    Publication number: 20100002211
    Abstract: A discharge produced plasma radiation source includes a laser beam pulse generator configured to provide a laser beam pulse to trigger a pinch in a plasma of the discharge produced plasma radiation source. The laser beam pulse generator is arranged to provide a laser beam pulse having an energy greater than an optimum laser beam pulse energy that corresponds to a maximum output of a given wavelength of radiation for a given discharge energy.
    Type: Application
    Filed: June 15, 2009
    Publication date: January 7, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Denis GLUSHKOV, Vadim Yevgenyevich BANINE, Vladimir Vitalevich IVANOV, Konstantin Nikolaevich KOSHELEV, Givi Georgievich ZUKAKISHVILI, Vladimir Mihailovitch KRIVTSUN, Yurii Victorovitch SIDELNIKOV, Kurt GIELISSEN, Oleg YAKUSHEV