Abstract: A material including a transparent substrate coated with a stack of thin layers including at least one silver-based functional metallic layer and at least one zinc-based metallic layer. The zinc-based metallic layer is located above or below a silver-based functional metallic layer and separated from this silver-based functional metallic layer by at least one intermediate oxide layer based on one or more elements chosen from zinc, titanium, zirconium, tin, niobium, magnesium, hafnium and nickel.

Abstract: A material includes a transparent substrate coated with a stack of thin layers including at least one silver-based functional metallic layer, at least one blocking layer located directly in contact with a silver-based functional metallic layer, and at least one zinc-based metallic layer located above or below this silver-based functional metallic layer, directly in contact or separated by one or more layers having a total thickness of less than or equal to 20 nm.

Abstract: A material includes a transparent substrate coated with a stack of thin layers including at least one silver-based functional metallic layer, at least one zinc-based metallic layer, located above and/or below a silver-based functional metallic layer, and at least one nickel oxide-based layer located above and/or below this silver-based functional metallic layer and separated from this layer by at least one crystallized dielectric layer.

Abstract: A material including a transparent substrate coated with a stack of thin layers including at least one silver-based functional metallic layer and at least one zinc-based metallic layer. The zinc-based metallic layer is located above or below a silver-based functional metallic layer and separated from this silver-based functional metallic layer by at least one intermediate oxide layer based on one or more elements chosen from zinc, titanium, zirconium, tin, niobium, magnesium, hafnium and nickel.

Abstract: A material includes a transparent substrate coated with a stack of thin layers including at least one silver-based functional metallic layer, at least one blocking layer located directly in contact with a silver-based functional metallic layer, and at least one zinc-based metallic layer located above or below this silver-based functional metallic layer, directly in contact or separated by one or more layers having a total thickness of less than or equal to 20 nm.

Abstract: A material includes a transparent substrate coated with a stack of thin layers including at least one silver-based functional metallic layer, at least one zinc-based metallic layer, located above and/or below a silver-based functional metallic layer, and at least one nickel oxide-based layer located above and/or below this silver-based functional metallic layer and separated from this layer by at least one crystallized dielectric layer.

Abstract: A transparent substrate is provided, on a main face, with a stack of thin layers including at least one metallic functional layer having properties of reflection in the infrared region and/or in the solar radiation region, based on silver or on silver-containing metal alloy, and two antireflective coating. The antireflective coatings each include at least one dielectric layer. The functional layer is positioned between the two antireflective coatings. Additionally, at least one nickel oxide NixO layer is located under and in contact with the functional layer in the direction of the substrate. A physical thickness of the nickel oxide NixO layer is at least 0.3 nm.

Abstract: A material includes a substrate coated, on at least one face, with a coating including a first dielectric layer, a wetting layer, a silver layer and a second dielectric layer. At least one of the first and second dielectric layers is an oxide-based dielectric layer and an oxygen-donating layer is positioned in the vicinity of the oxide-based dielectric layer. A process for obtaining such a material includes a stage of laser annealing of the coating.

Abstract: A transparent substrate is provided, on a main face, with a stack of thin layers including at least one metallic functional layer having properties of reflection in the infrared region and/or in the solar radiation region, based on silver or on silver-containing metal alloy, and two antireflective coating. The antireflective coatings each include at least one dielectric layer. The functional layer is positioned between the two antireflective coatings. Additionally, at least one nickel oxide NixO layer is located on and in contact with the functional layer starting with the substrate. A physical thickness of the nickel oxide NixO layer is at least 0.3 nm.

Abstract: A transparent substrate is provided, on a main face, with a stack of thin layers including at least one, metallic functional layer having properties of reflection in the infrared region and/or in the solar radiation region, based on silver or on silver-containing metal alloy, and two antireflective coatings. The antireflective coatings each include at least one dielectric layer. The functional layer is positioned between the two antireflective coatings. At least one nickel oxide NixO layer is located under the functional layer in the direction of the substrate and/or above the functional layer, with interposition of at least one layer or of just one layer made of a different material between the or each nickel oxide NixO layer and the functional layer.

Abstract: A material includes a substrate coated, on at least one face, with a coating including a first dielectric layer, a wetting layer, a silver layer and a second dielectric layer. At least one of the first and second dielectric layers is an oxide-based dielectric layer and an oxygen barrier layer is positioned between the oxide-based dielectric layer and the wetting layer. A process for obtaining such a material includes a stage of laser annealing of the coating.

Abstract: An electrically conducting support for an electrochromic device and its manufacture; the electrically conducting support including, in this order: a substrate, an optional underlayer, a first inorganic layer on the optional underlayer or on the substrate, partially or completely structured in thickness with traversing holes or cavities, an electrode, made of metal grid with strands which exhibit, along their length, a rough central region between less rough lateral regions which are flush with the top surface, an electrically conducting coating made of inorganic material.

Abstract: An electrically conductive OLED carrier includes in this order a glazing substrate; an electrode arranged in a metal grid made up of strands; an electrically insulating light extraction layer under the metal grid; and a layer partially structured in its thickness. The layer of refractive is of index n3 of 1.7 to 2.3, and is located on the light extraction layer. The partially structured layer is formed from a region structured with cavities at least partially containing the metal grid; and from another region, called the low region, located on the light extraction layer. The separation H between the surface of the structured region called the high surface, and therefore that furthest from the substrate, and the surface of the metal grid called the upper surface, and therefore that furthest from the substrate is, in absolute value, smaller than or equal to 100 nm.

Abstract: A transparent substrate is provided, on a main face, with a stack of thin layers including at least one, metallic functional layer having properties of reflection in the infrared region and/or in the solar radiation region, based on silver or on silver-containing metal alloy, and two antireflective coatings. The antireflective coatings each include at least one dielectric layer. The functional layer is positioned between the two antireflective coatings. At least one nickel oxide NixO layer is located under the functional layer in the direction of the substrate and/or above the functional layer, with interposition of at least one layer or of just one layer made of a different material between the or each nickel oxide NixO layer and the functional layer.

Abstract: An electrically conducting support for an electrochromic device and its manufacture; the electrically conducting support including, in this order: a substrate, an optional underlayer, a first inorganic layer on the optional underlayer or on the substrate, partially or completely structured in thickness with traversing holes or cavities, an electrode, made of metal grid with strands which exhibit, along their length, a rough central region between less rough lateral regions which are flush with the top surface, an electrically conducting coating made of inorganic material.

Abstract: A transparent substrate is provided, on a main face, with a stack of thin layers including at least one metallic functional layer having properties of reflection in the infrared region and/or in the solar radiation region, based on silver or on silver-containing metal alloy, and two antireflective coating. The antireflective coatings each include at least one dielectric layer. The functional layer is positioned between the two antireflective coatings. Additionally, at least one nickel oxide NixO layer is located on and in contact with the functional layer starting with the substrate. A physical thickness of the nickel oxide NixO layer is at least 0.3 nm.

Abstract: An electrically conductive OLED carrier includes a glazing substrate; an electrode arranged in a metal grid made up of strands; an insulating light extraction layer under the metal grid; and a layer partially structured in its thickness, this layer being of given composition and of refractive index n3 of 1.7 to 2.3, and being located on the light extraction layer, which partially structured layer is formed from a region structured with cavities containing the metal grid, and from another region, called the low region, located on the light extraction layer, the separation H between that surface of the structured region called the high surface, and that surface of the metal grid called the upper surface, and therefore that furthest from the substrate, is larger than 100 nm. The strands have along their length a central zone between lateral zones that are flush with the high surface.

Abstract: An electrically conductive OLED carrier includes a glazing substrate; an electrode arranged in a metal grid made up of strands; an insulating light extraction layer under the metal grid; and a layer partially structured in its thickness, this layer being of given composition and of refractive index n3 of 1.7 to 2.3, and being located on the light extraction layer, which partially structured layer is formed from a region structured with cavities containing the metal grid, and from another region, called the low region, located on the light extraction layer, the separation H between that surface of the structured region called the high surface, and that surface of the metal grid called the upper surface, and therefore that furthest from the substrate, is larger than 100 nm. The strands have along their length a central zone between lateral zones that are flush with the high surface.

Abstract: A laminated support for flexible optoelectronic devices can include, in the order indicated, the following elements: a mineral glass sheet having a thickness of 300 microns or less and a refractive index n1 below 1.65, preferably below 1.60, ideally below 1.55, a diffusing adhesive layer, a uniaxially or biaxially stretched transparent organic polymer film with a refractive index n3, measured in a direction along the film's plane, of 1.7 or more.

Abstract: An electroconductive support can include a layer that defines a cavity, and a conductive strand within the cavity of the layer. The conductive strand can have an upper surface within a central zone and a side zone, wherein the upper surface has a surface roughness within the central zone that is rougher than a surface roughness within the side zone. The electroconductive can further include an electroconductive layer and a passivation layer overlying the conductive strand. The relatively smoother upper surface within the side zone can allow the width of the passivation layer to be relatively narrow and still achieve acceptable leakage current. A method of forming the electroconductive support can be performed using a wet chemical technique to form the conductive strand while suppressing roughness along a side zone of the upper surface of the conductive strand.