Patents by Inventor Denis Jahan

Denis Jahan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8324014
    Abstract: The present invention relates to a process for depositing films on a substrate by chemical vapour deposition (CVD) or physical vapour deposition (PVD), said process employing at least one boron compound. This process is particularly useful for fabricating photovoltaic solar cells. The invention also relates to the use of boron compounds for conferring optical and/or electrical properties on materials in a CVD or PVD deposition process. This process is also particularly useful for fabricating a photovoltaic solar cell.
    Type: Grant
    Filed: November 3, 2008
    Date of Patent: December 4, 2012
    Assignee: L'Air Liquide Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges Claude
    Inventors: Audrey Pinchart, Denis Jahan
  • Publication number: 20110011129
    Abstract: The invention relates to a method for recycling silane that comprises the following consecutive steps: a) injecting a mixture of pure silane/pure hydrogen (SiH4/H2) in a reaction chamber for making silicon-containing thin layers; b) extracting from the mixture the excess of silane not used during step a)/hydrogen (SiH4/H2) via a pump using a supply gas; c) discharging from said pump, at a pressure close to the atmospheric pressure, a mixture containing at least silane (SiH4), hydrogen (H2) and an amount different from zero of said supply gas; d) separating the silane (SiH4) from the hydrogen/supply gas mixture resulting from the mixture from step c), the silane thus obtained containing less than 100 ppm of supply gas, preferably less than 10 ppm of supply gas and more preferably less than 1 ppm of supply gas; characterised in that at least 50%, preferably 70%, and more preferably 80% of the silane (SiH4) from step b) is reused after step d) for a new step a).
    Type: Application
    Filed: February 18, 2009
    Publication date: January 20, 2011
    Inventors: Pierre Briend, Bruno Alban, Henri Chevrel, Denis Jahan
  • Publication number: 20100227430
    Abstract: The present invention relates to a process for depositing films on a substrate by chemical vapour deposition (CVD) or physical vapour deposition (PVD), said process employing at least one boron compound. This process is particularly useful for fabricating photovoltaic solar cells. The invention also relates to the use of boron compounds for conferring optical and/or electrical properties on materials in a CVD or PVD deposition process. This process is also particularly useful for fabricating a photovoltaic solar cell.
    Type: Application
    Filed: November 3, 2008
    Publication date: September 9, 2010
    Inventors: Audrey Pinchart, Denis Jahan