Patents by Inventor Denis Kurapov
Denis Kurapov has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11965234Abstract: This invention relates to a coating comprising at least one AlTiN-based film deposited by means of a PVD process, wherein the at least one AlTiN-based film deposited is comprising an Al-content—in relation to the Ti-content—in atomic percentage higher than 75%, and wherein the AlTiN-based film exhibits solely a crystallographic cubic phase and internal compressive stresses and this invention relates to a method involving deposition of an AlTiN-based film.Type: GrantFiled: September 5, 2018Date of Patent: April 23, 2024Assignee: Oerlikon Surface Solutions AG, PfäffikonInventors: Denis Kurapov, Siva Phani Kumar Yalamanchili, Anders Olof Eriksson
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Publication number: 20240043985Abstract: This invention relates to a coating comprising at least one AlTiN-based film deposited by means of a PVD process, wherein the at least one AlTiN-based film deposited is comprising an Al-content—in relation to the Ti-content—in atomic percentage higher than 75%, and wherein the AlTiN-based film exhibits solely a crystallographic cubic phase and internal compressive stresses and this invention relates to a method involving deposition of an AlTiN-based film.Type: ApplicationFiled: September 28, 2023Publication date: February 8, 2024Inventors: Denis KURAPOV, Siva Phani Kumar YALAMANCHILI, Anders Olof ERIKSSON
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Publication number: 20230135238Abstract: A method for applying a coating having at least one TiCN layer to a surface of a substrate to be coated by means of high power impulse magnetron sputtering (HIPIMS), wherein, to deposit the at least one TiCN layer, at least one Ti target is used as the Ti source for producing the TiCN layer, said target being sputtered in a reactive atmosphere by means of a HIPIMS process in a coating chamber, wherein the reactive atmosphere comprises at least one inert gas, preferably argon, and at least nitrogen gas as the reactive gas, wherein: the reactive atmosphere additionally contains, as a second reactive gas, a gas containing carbon, preferably CH4, used as the source of carbon to produce the TiCN layer wherein, while depositing the TiCN layer, a bipolar bias voltage is applied to the substrate to be coated, or at least one graphite target is used as the source of carbon for producing the TiCN layer, said target being used for sputtering in the coating chamber using a HIPIMS process with the reactive atmosphere hType: ApplicationFiled: December 29, 2022Publication date: May 4, 2023Inventors: Denis Kurapov, Siegfried Krassnitzer
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Publication number: 20230097468Abstract: A coated tool of the present invention includes a base material and a hard coating film on the base material. The hard coating film is a nitride or carbonitride containing aluminum (Al) of 65 atomic % or more 90 atomic % or less, titanium (Ti) of 10 atomic % or more 35 atomic % or less, a total of aluminum (Al) and titanium (Ti) of 85 atomic % or more, and argon (Ar) of 0.20 atomic % or less. The hard coating film satisfies a relationship of Ih×100/Is?12 when a peak intensity of a (010) plane of AlN of a hexagonal close-packed structure is Ih and a sum of peak intensities due to predetermined nine crystal planes of TiN and AlN is Is in an intensity profile obtained from a selected area diffraction pattern of a transmission electron microscope.Type: ApplicationFiled: February 19, 2021Publication date: March 30, 2023Applicants: MOLDINO Tool Engineering, Ltd., Oerlikon Surface Solutions AG, PfaffikonInventors: Tomoya Sasaki, Kazuyuki Kubota, Kumar Yalamanchili, Denis Kurapov, Wolfgang Kalss
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Patent number: 11542587Abstract: A method for applying a coating having at least one TiCN layer to a surface of a substrate to be coated by means of high power impulse magnetron sputtering (HIPIMS), wherein, to deposit the at least one TiCN layer, at least one Ti target is used as the Ti source for producing the TiCN layer, said target being sputtered in a reactive atmosphere by means of a HIPIMS process in a coating chamber, wherein the reactive atmosphere comprises at least one inert gas; preferably argon, and at least nitrogen gas as the reactive gas, wherein: the reactive atmosphere additionally contains, as a second reactive gas, a gas containing carbon, preferably CH4, used as the source of carbon to produce the TiCN layer wherein, while depositing the TiCN layer, a bipolar bias voltage is applied to the substrate to be coated, or at least one graphite target is used as the source of carbon for producing the TiCN layer, said target being used for sputtering in the coating chamber using a HIPIMS process with the reactive atmosphere hType: GrantFiled: April 21, 2017Date of Patent: January 3, 2023Assignee: OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKONInventors: Denis Kurapov, Siegfried Krassnitzer
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Patent number: 11465214Abstract: The present invention discloses a coated cutting tool having a hard coating film on a surface of the tool. The hard coating film is a nitride, the content ratio of titanium (Ti) with respect to a total amount of metal elements (including semimetal elements) is in a range of 70 at % to 95 at %, the content ratio of silicon (Si) with respect to the total amount of metal elements (including semimetal elements) is in a range of 5 at % to 30 at %, and the content ratio of argon (Ar) with respect to the total amount of metal elements (including semimetal elements) and non-metal elements is 0.1 at % or less. The hard coating film has a NaCl type crystal structure and has an average crystal grain size in a range of 5 nm to 30 nm.Type: GrantFiled: March 28, 2017Date of Patent: October 11, 2022Assignees: MOLDINO Tool Engineering, Ltd., HITACHI METALS, LTD., Oerlikon Surface Solutions AG, PfaffikonInventors: Tomoya Sasaki, Shuho Koseki, Kana Morishita, Saleh Abusuilik, Kenichi Inoue, Denis Kurapov, Wolfgang Kalss
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Patent number: 11413695Abstract: The present invention relates to a tap drill comprising a substrate and a coating, wherein the coating is deposited on at least a portion of the substrate comprising the head of the drill, the coating comprising a first layer deposited directly on the substrate and a second layer deposited atop the first layer, wherein the first layer is a wear resistant layer of (Al, Cr)N deposited by Hi PIMS and the second layer is a friction reduction layer, wherein the second layer is a metal carbide layer or a metal-carbide comprising layer deposited by using a physical vapor deposition (PVD) process of the type magnetron sputtering, preferably of the type HiPIMS.Type: GrantFiled: August 6, 2018Date of Patent: August 16, 2022Assignee: Oerlikon Surface Solutions AG, PfäffikonInventor: Denis Kurapov
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Patent number: 11293089Abstract: The present invention relates to a component comprising a substrate coated with a coating having a film (3,4 or 3,4,5) comprising one or more transition metals, TM, aluminium, Al, and nitrogen, N, wherein the TM and N as well as Al and N are comprised in the film forming respectively nitride compounds, wherein the transition metal nitride, TM-N, is present in the film distributed in different portions exhibiting one crystalline phase of TM-N, and the aluminium nitride, Al—N, is present in the film in different portions exhibiting one phase of Al—N, whereas the phase of the transition metal nitride is cubic, c-TMN, the phase of the aluminium nitride is wurtzite, w-AIN, and wherein the film exhibits coherent or (semi-) coherent interfaces between the c-TMN phase portions and the w-AI-N phase portions.Type: GrantFiled: February 13, 2018Date of Patent: April 5, 2022Assignee: OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKONInventors: Siva Phani Kumar Yalamanchili, Mirjam Arndt, Juergen Ramm, Siegfried Krassnitzer, Denis Kurapov
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Publication number: 20220098721Abstract: The present invention relates to a tool (100) for machining workpieces (200), comprising a surface (110) which is at least partially covered by a PVD deposited wear-resistant coating (120), said wear resistant coating (120) comprising one or more wear-resistant layers (121, 122), the coating having a modulus of elasticity, E, which is in a range 300 GPa?E<350 GPa, and further having a hardness, H, which is greater than 30 GPa.Type: ApplicationFiled: February 10, 2020Publication date: March 31, 2022Inventor: Denis Kurapov
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Publication number: 20210395875Abstract: The present invention discloses a non-reactive PVD coating process for producing an aluminium-rich AlxTi1?xN-based thin film having an aluminium content of >75 at-% based on the total amount of aluminium and titanium in the thin film, a cubic crystal structure, and a columnar microstructure, wherein ceramic targets are used as a material source for the aluminium-rich AlxTi1?xN-based thin film.Type: ApplicationFiled: November 11, 2019Publication date: December 23, 2021Inventors: Siva Phani Kumar Yalamanchili, Denis Kurapov, Tomoya Sasaki, Kazuyuki Kubota
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Publication number: 20210362258Abstract: The present invention relates to a tap drill comprising a substrate and a coating, wherein the coating is deposited on at least a portion of the substrate comprising the head of the drill, the coating comprising a first layer deposited directly on the substrate and a second layer deposited atop the first layer, wherein the first layer is a wear resistant layer of (Al,Cr)N deposited by Hi PIMS and the second layer is a friction reduction layer, wherein the second layer is a metal carbide layer or a metal-carbide comprising layer deposited by using a physical vapor deposition (PVD) process of the type magnetron sputtering, preferably of the type HiPIMS.Type: ApplicationFiled: August 6, 2018Publication date: November 25, 2021Inventor: Denis KURAPOV
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Patent number: 11014167Abstract: A multilayer hard film-coated cutting tool including a cutting tool body and a multilayer hard film formed on a surface of the cutting tool body, wherein the multilayer hard film comprises at least an upper layer and a lower layer; the upper layer is made of a Ti and Si compound layer; the lower layer is made of a multi-layered film of an A-layer and a B-layer, a layer thickness of the B-layer is equal to or thicker than a layer thickness of the A-layer, a ratio of the layer thicknesses of the A-layer and the B-layer being A-layer:B-layer=1:1 to 1:2, the multilayer hard films having 2 to 8 pairs of the A-layer and the B-layer in a case where a single pair is defined by a combination of a single A-layer and a single B-layer.Type: GrantFiled: July 28, 2017Date of Patent: May 25, 2021Assignees: MITSUBISHI MATERIALS CORPORATION, Oerlikon Surface Solutions AG, PfaffikonInventors: Masakuni Takahashi, Denis Kurapov, Volker Derflinger, Wolfgang Kalss
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Publication number: 20210108306Abstract: This invention relates to a coating comprising at least one AlTiN-based film deposited by means of a PVD process, wherein the at least one AlTiN-based film deposited is comprising an Al-content—in relation to the Ti-content—in atomic percentage higher than 75%, and wherein the AlTiN-based film exhibits solely a crystallographic cubic phase and internal compressive stresses and this invention relates to a method involving deposition of an AlTiN-based film.Type: ApplicationFiled: September 5, 2018Publication date: April 15, 2021Inventors: Denis KURAPOV, Siva Phani Kumar YALAMANCHILI, Anders Olof ERIKSSON
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Patent number: 10943774Abstract: The present disclosure relates to a sputtering arrangement, a vacuum coating system, and a method for carrying out HiPIMS coating methods; the sputtering arrangement has at least two different interconnection possibilities and the switch to the second interconnection possibility, in which two sputtering sub-assemblies are operated simultaneously with high power pulses, achieves a productivity gain.Type: GrantFiled: November 14, 2016Date of Patent: March 9, 2021Assignee: OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKONInventors: Siegfried Krassnitzer, Daniel Lendi, Denis Kurapov
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Patent number: 10865472Abstract: Coating method for arc coating or arc ion plating coating of substrates in a vacuum chamber in which using an arc evaporator solid material that functions as cathode is evaporated, during arc evaporation the motion of the cathode spot on the solid material surface is accelerated using a magnetic field for avoiding ejection of a large amount of macro-particles or droplets from the solid material surface, negative charged particles resulted from the arc evaporation flow from the cathode to an anode, characterized by the motion of the negative charged particles from the cathode to the anode fundamentally doesn't cause an additional increase of the absolute value of the potential difference between cathode and anode allowing a lower increment of the substrate temperature during coating.Type: GrantFiled: December 14, 2012Date of Patent: December 15, 2020Assignee: OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKONInventors: Siegfried Krassnitzer, Denis Kurapov, Markus Lechthaler
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Publication number: 20200298316Abstract: The present invention discloses a coated cutting tool having a hard coating film on a surface of the tool. The hard coating film is a nitride, the content ratio of titanium (Ti) with respect to a total amount of metal elements (including semimetal elements) is in a range of 70 at % to 95 at %, the content ratio of silicon (Si) with respect to the total amount of metal elements (including semimetal elements) is in a range of 5 at % to 30 at %, and the content ratio of argon (Ar) with respect to the total amount of metal elements (including semimetal elements) and non-metal elements is 0.1 at % or less. The hard coating film has a NaCl type crystal structure and has an average crystal grain size in a range of 5 nm to 30 nm.Type: ApplicationFiled: March 28, 2017Publication date: September 24, 2020Inventors: Tomoya Sasaki, Shuho Koseki, Kana Morishita, Saleh Abusuilik, Kenichi Inoue, Denis Kurapov, Wolfgang Kalss
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Publication number: 20200277707Abstract: The present invention relates to a method for producing coated substrate bodies, wherein a plurality of substrate bodies comprising surfaces to be coated are provided with a colored coating surface, the method comprising following steps: providing the substrate bodies to be coated in the interior of a vacuum coating chamber, depositing a coating on a surface of the substrate bodies to be coated, the deposition of the coating involving the deposition of a metallic layer comprising at least two different metals, forming a colored oxide layer exhibiting a colored surface by anodic oxidation of the metallic layer, wherein: the anodic oxidation takes place in an alkaline electrolyte bath with the coated substrate bodies connected as anodes.Type: ApplicationFiled: September 17, 2018Publication date: September 3, 2020Inventors: Sven Matthias TWARDY, Jens EGGEMANN, Erik ALBERT, Christian BECKER, Denis KURAPOV
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Patent number: 10636635Abstract: A device for cooling a target, having a component that includes a cooling duct and having an additional thermally conductive plate that is detachably fastened to the cooling side of the component, the cooling side being the side on which the cooling duct exerts its cooling action, characterized in that between the additional thermally conductive plate and the cooling side of the component, a first self-adhesive carbon film is provided, which is extensively and self-adhesively glued to the one side of the additional thermally conductive plate that faces the cooling side.Type: GrantFiled: June 30, 2014Date of Patent: April 28, 2020Assignee: Oerlikon Surface Solutions AG, PfäffikonInventors: Denis Kurapov, Siegfried Krassnitzer
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Patent number: 10626493Abstract: A method for producing a tool coated with a hard coating, the method including the following steps: applying a TiAIN coating layer onto a substrate with a first magnetron sputtering process and applying a TixSi1-xN coating layer onto the TiAIN layer with a second magnetron sputtering process, where x is smaller than or equal to 0.85 and preferably between and including 0.80 and 0.70 whereas the second magnetron sputtering process is performed with power densities greater than 100 W/cm2 and as such is a HIPIMS process.Type: GrantFiled: September 17, 2015Date of Patent: April 21, 2020Assignees: OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKON, HITACHI METALS, LTD., MITSUBISHI HITACHI TOOL ENGINEERING, LTD.Inventors: Denis Kurapov, Tomoya Sasaki, Shuho Koseki, Kana Morishita, Saleh Breik Abusuilik, Kenichi Inoue
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Publication number: 20190376174Abstract: The present invention relates to a component comprising a substrate coated with a coating having a film (3,4 or 3,4,5) comprising one or more transition metals, TM, aluminium, Al, and nitrogen, N, wherein the TM and N as well as Al and N are comprised in the film forming respectively nitride compounds, wherein the transition metal nitride, TM-N, is present in the film distributed in different portions exhibiting one crystalline phase of TM-N, and the aluminium nitride, Al—N, is present in the film in different portions exhibiting one phase of Al—N, whereas the phase of the transition metal nitride is cubic, c-TMN, the phase of the aluminium nitride is wurtzite, w-AIN, and wherein the film exhibits coherent or (semi-) coherent interfaces between the c-TMN phase portions and the w-AI-N phase portions.Type: ApplicationFiled: February 13, 2018Publication date: December 12, 2019Inventors: Siva Phani Kumar YALAMANCHILI, Mirjam ARNDT, Juergen RAMM, Siegfried KRASSNITZER, Denis KURAPOV