Patents by Inventor Denis O'Kane

Denis O'Kane has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for forming buried oxygen precipitate layers in multi-layer wafers
    Publication number: 20060115958
    Abstract: A method of forming a SOI wafer obtains an intermediate apparatus having a first wafer, a second wafer, and an insulator material bonding the first and second wafers together. The first wafer has an oxygen precipitate concentration sufficient for gettering. The method reduces the profile of at least a portion of the first wafer to form an exposed surface, and adds a layer of material to the exposed surface of the first wafer. The layer of material substantially integrates with the first wafer to have substantially the same structure.
    Type: Application
    Filed: October 28, 2005
    Publication date: June 1, 2006
    Inventors: Jason Weigold, Thomas Chen, Denis O'Kane, David Collins, Andrew Bain
  • Integrated circuit with impurity barrier
    Publication number: 20050255677
    Abstract: An integrated circuit with an interface between a semiconductor layer (having a selected region) and a second layer has a barrier with a gettering effect that 1) substantially circumscribes the selected region and 2) extends to the interface. Despite the fact that its gettering effect extends to the interface, the barrier does not penetrate the second layer.
    Type: Application
    Filed: January 27, 2005
    Publication date: November 17, 2005
    Inventors: Jason Weigold, Thomas Chen, Denis O'Kane, Claire Leveugle, Stephen Brown, William Nevin