Patents by Inventor Denise Geitz

Denise Geitz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Composition for removing photoresist and/or etching residue from a substrate and use thereof
    Patent number: 9217929
    Abstract: Compositions containing certain organic solvents comprising at least 50% by weight of a glycol ether and a quaternary ammonium compound are capable of removing residues such as photoresist and/or etching residue from an article.
    Type: Grant
    Filed: July 22, 2004
    Date of Patent: December 22, 2015
    Assignee: AIR PRODUCTS AND CHEMICALS, INC.
    Inventors: Matthew I. Egbe, Denise Geitz
  • Composition for Removing Photoresist and/or Etching Residue From a Substrate and Use Thereof
    Publication number: 20120295828
    Abstract: Compositions containing certain organic solvents comprising at least 50% by weight of a glycol ether and a quaternary ammonium compound are capable of removing residues such as photoresist and/or etching residue from an article.
    Type: Application
    Filed: July 31, 2012
    Publication date: November 22, 2012
    Applicant: Air Products and Chemicals, Inc.
    Inventors: Matthew I. Egbe, Denise Geitz
  • Compositions comprising tannic acid as corrosion inhibitor
    Publication number: 20060116313
    Abstract: Compositions for removing residue comprising tannic acid and/or salt thereof and methods using same are described herein.
    Type: Application
    Filed: November 30, 2004
    Publication date: June 1, 2006
    Inventors: Denise Geitz, Jennifer Rieker
  • Composition for removing photoresist and/or etching residue from a substrate and use thereof
    Publication number: 20060016785
    Abstract: Compositions containing certain organic solvents comprising at least 50% by weight of a glycol ether and a quaternary ammonium compound are capable of removing residues such as photoresist and/or etching residue from an article.
    Type: Application
    Filed: July 22, 2004
    Publication date: January 26, 2006
    Inventors: Matthew Egbe, Denise Geitz