Patents by Inventor Denise Ward
Denise Ward has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20150107787Abstract: The present inventive concept relates to a drapery hanging system, especially the construction of a drapery rod and hardware. The drapery hanging system consists of a basic rod which is mounted adjacent to a window and at its top. The basic rod has a hollow tube sliding thereon to be able to adjust the same to a predetermined length. The hollow tube has a set screw thereon to apply a lateral pressure against the basic rod to arrest the same in a preset length. The basic rod can be mounted either to a vertical wall or against the ceiling. A free end of the hollow tube has a decorating item thereon to enhance the appearance of the drapery hanging system.Type: ApplicationFiled: October 22, 2013Publication date: April 23, 2015Inventors: Denise Ward, Lori Christy
-
Publication number: 20110174948Abstract: A device for hanging curtain rods is disclosed. In one embodiment, a device includes a mounting base, a post coupled to the mounting base, an adjustable sleeve designed to adjustably operatively engage the post, and a front portion coupled to the adjustable sleeve. In another embodiment, a device includes a double L-shaped bracket and a front portion that is designed to be removably coupled to one end of the double L-shaped bracket. In still another embodiment, a device includes a mounting base, a post coupled to the mounting base, and a front portion coupled to the post. The front portion in any of the embodiments may be one of many decorative faces contained in a kit. The kit may contain such suitable decorative faces, including but not limited to, a heart, a basketball, a crown, or any suitable combination or variation thereof.Type: ApplicationFiled: January 21, 2011Publication date: July 21, 2011Applicant: UNIQ DEZINZ, INC.Inventors: Denise Ward, Lori Christy
-
Patent number: 7697713Abstract: A novel and unique method and program distributing, transmitting and producing a personalized and autographed digital photograph of a celebrity figure, comprising the steps of first assembling executable program codes with asset elements of celebrity figures including photographs and signatures, then generating a personalized and autographed digital photograph file of a selected celebrity figure with said signature, and finally transmitting said personalized and autographed celebrity digital photograph file via a suitable medium for later access, display, reproduction or further transfer.Type: GrantFiled: June 14, 2004Date of Patent: April 13, 2010Assignee: Smart & Associates, Inc.Inventors: Denise Ward Verhoeven, Eric Ceasar Dominguez
-
Patent number: 6907131Abstract: A novel and unique method and program for producing a photograph of a celebrity figure with personalized and autographed messages. The method includes the steps of collecting signatures and photographs of celebrity figures, generating corresponding special character font sets for the celebrity figures respectively from their writing samples, and creating executable computer software programs and databases containing the signatures and photographs of celebrity figures and the special character font sets of the celebrity figures for producing a selected photograph of a celebrity figure chosen by a user with an autographed personal text message. The autographed text message is written in the respective character font set generated from the handwriting samples of the celebrity figure and therefore closely resembles the handwriting of the celebrity figure.Type: GrantFiled: August 27, 2002Date of Patent: June 14, 2005Assignee: SignaRom, Inc.Inventors: Denise Ward Verhoeven, Eric Ceasar Dominguez
-
Publication number: 20040234097Abstract: A novel and unique method and program for producing a photograph of a celebrity figure with personalized and autographed messages. The method includes the steps of collecting signatures and photographs of celebrity figures, generating corresponding special character font sets for the celebrity FIGS. respectively from their writing samples, and creating executable computer software programs and databases containing the signatures and photographs of celebrity figures and the special character font sets of the celebrity figures for producing a selected photograph of a celebrity figure chosen by a user with an autographed personal text message. The autographed text message is written in the respective character font set generated from the handwriting samples of the celebrity figure and therefore closely resembles the handwriting of the celebrity figure.Type: ApplicationFiled: August 27, 2002Publication date: November 25, 2004Applicant: SIGNAROM, INC.Inventors: Denise Ward Verhoeven, Eric Ceasar Dominquez
-
Patent number: 6769288Abstract: The present invention relates to a method and assembly for leak detection in a plasma system. The invention can accomplish not only leak detection, but also leak location while maintaining a plasma within the plasma system. Leak detection for the invention is achieved by obtaining spectral data of the plasma at one or more times while maintaining the plasma within the plasma system and comparing the same to predetermined spectral data of air. Upon a determination that air is present within the plasma system, one or more external surfaces of the plasma system are exposed to a test gas and the spectral data of the plasma is analyzed after each exposure to determine if the test gas is present in the system. If the test gas is present, a determination can be made that the particular external surface to which the test gas was applied is a leak location.Type: GrantFiled: November 1, 2002Date of Patent: August 3, 2004Assignee: Peak Sensor Systems LLCInventors: Pamela Peardon Denise Ward, Joel O'Don Stevenson, Michael Lane Smith, Jr.
-
Publication number: 20040083797Abstract: The present invention relates to a method and assembly for leak detection in a plasma system. The invention can accomplish not only leak detection, but also leak location while maintaining a plasma within the plasma system. Leak detection for the invention is achieved by obtaining spectral data of the plasma at one or more times while maintaining the plasma within the plasma system and comparing the same to predetermined spectral data of air. Upon a determination that air is present within the plasma system, one or more external surfaces of the plasma system are exposed to a test gas and the spectral data of the plasma is analyzed after each exposure to determine if the test gas is present in the system. If the test gas is present, a determination can be made that the particular external surface to which the test gas was applied is a leak location.Type: ApplicationFiled: November 1, 2002Publication date: May 6, 2004Inventors: Pamela Peardon Denise Ward, Joel O?apos;Don Stevenson, Michael Lane Smith
-
Publication number: 20030136663Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Yet another aspect associated with the present invention relates in at least some manner to the endpoint of a plasma process (e.g., plasma recipe, plasma clean, conditioning wafer operation) or discrete/discernible portion thereof (e.g., a plasma step of a multiple step plasma recipe). A final aspect associated with the present invention relates to how one or more of the above-noted aspects may be implemented into a semiconductor fabrication facility, such as the distribution of wafers to a wafer production system.Type: ApplicationFiled: June 6, 2002Publication date: July 24, 2003Inventors: Michael Lane Smith, Joel O?apos;Don Stevenson, Pamela Peardon Denise Ward
-
Publication number: 20030029720Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Yet another aspect associated with the present invention relates in at least some manner to the endpoint of a plasma process (e.g., plasma recipe, plasma clean, conditioning wafer operation) or discrete/discernible portion thereof (e.g., a plasma step of a multiple step plasma recipe). A final aspect associated with the present invention relates to how one or more of the above-noted aspects may be implemented into a semiconductor fabrication facility, such as the distribution of wafers to a wafer production system.Type: ApplicationFiled: June 5, 2002Publication date: February 13, 2003Inventors: Michael Lane Smith, Joel O?apos;Don Stevenson, Pamela Peardon Denise Ward
-
Publication number: 20030024810Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Yet another aspect associated with the present invention relates in at least some manner to the endpoint of a plasma process (e.g., plasma recipe, plasma clean, conditioning wafer operation) or discrete/discernible portion thereof (e.g., a plasma step of a multiple step plasma recipe). A final aspect associated with the present invention relates to how one or more of the above-noted aspects may be implemented into a semiconductor fabrication facility, such as the distribution of wafers to a wafer production system.Type: ApplicationFiled: June 6, 2002Publication date: February 6, 2003Inventors: Michael Lane Smith, Joel O?apos;Don Stevenson, Pamela Peardon Denise Ward
-
Patent number: 6419801Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber.Type: GrantFiled: April 23, 1998Date of Patent: July 16, 2002Assignee: Sandia CorporationInventors: Michael Lane Smith, Jr., Joel O'Don Stevenson, Pamela Peardon Denise Ward
-
Patent number: 6275740Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber.Type: GrantFiled: April 23, 1998Date of Patent: August 14, 2001Assignee: Sandia CorporationInventors: Michael Lane Smith, Jr., Joel O'Don Stevenson, Pamela Peardon Denise Ward
-
Patent number: 6269278Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber.Type: GrantFiled: April 23, 1998Date of Patent: July 31, 2001Assignee: Sandia CorporationInventors: Michael Lane Smith, Jr., Joel O'Don Stevenson, Pamela Peardon Denise Ward
-
Patent number: 6261470Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber.Type: GrantFiled: April 23, 1998Date of Patent: July 17, 2001Assignee: Sandia CorporationInventors: Michael Lane Smith, Jr., Joel O'Don Stevenson, Pamela Peardon Denise Ward
-
Patent number: 6254717Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber.Type: GrantFiled: April 23, 1998Date of Patent: July 3, 2001Assignee: Sandia CorporationInventors: Michael Lane Smith, Jr., Joel O'Don Stevenson, Pamela Peardon Denise Ward
-
Patent number: 6246473Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber.Type: GrantFiled: April 23, 1998Date of Patent: June 12, 2001Assignee: Sandia CorporationInventors: Michael Lane Smith, Jr., Joel O'Don Stevenson, Pamela Peardon Denise Ward
-
Patent number: 6223755Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber.Type: GrantFiled: April 23, 1998Date of Patent: May 1, 2001Assignee: Sandia CorporationInventors: Michael Lane Smith, Jr., Joel O'Don Stevenson, Pamela Peardon Denise Ward
-
Patent number: 6221679Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber.Type: GrantFiled: April 23, 1998Date of Patent: April 24, 2001Assignee: Sandia CorporationInventors: Michael Lane Smith, Jr., Joel O'Don Stevenson, Pamela Peardon Denise Ward
-
Patent number: 6192826Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber.Type: GrantFiled: April 23, 1998Date of Patent: February 27, 2001Assignee: Sandia CorporationInventors: Michael Lane Smith, Jr., Joel O'Don Stevenson, Pamela Peardon Denise Ward
-
Patent number: 6169933Abstract: The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber.Type: GrantFiled: April 23, 1998Date of Patent: January 2, 2001Assignee: Sandia CorporationInventors: Michael Lane Smith, Jr., Joel O'Don Stevenson, Pamela Peardon Denise Ward