Abstract: A management program for the benefit of a companion animal can maintain, enhance or improve the health and well-being of the companion animal. The management program can include recommendations for dietary modification, supplement administration, weight loss/management plans, physical activity recommendation, veterinary intervention and combinations thereof.

Abstract: One preferred method for use in making a device structure with use of the resist channel shrinking solution includes the steps of forming a first pedestal portion within a channel of a patterned resist; applying a resist channel shrinking solution comprising a resist channel shrinking film and corrosion inhibitors within the channel of the patterned resist; baking the resist channel shrinking solution over the patterned resist to thereby reduce a width of the channel of the patterned resist; removing the resist channel shrinking solution; and forming a second pedestal portion within the reduced-width channel of the patterned resist. Advantageously, the oxide layer and the corrosion inhibitors of the resist channel shrinking solution reduce corrosion in the pedestal during the act of baking the resist channel shrinking solution.

Abstract: An iris shutter case is disclosed for securely housing, protecting and displaying a decorative object while providing an elegant design that adds to the aesthetic appearance of the decorative object. The iris shutter case includes a container in which a decorative object, such as a piece of jewelry, can be securely fitted, and an openable and closable iris shutter assembly that alternatively reveals and conceals a contained decorative object from view. The container houses and protects the decorative object, and resembles a disc or a sphere in preferred embodiments. The iris shutter assembly is operated by a drive mechanism to display or conceal the decorative object. In preferred embodiments, the iris shutter assembly is a leaf and pin shutter assembly, and the drive mechanism is a drive ring with protruding lug handles which rotates relative to a master ring so as to open and close the iris shutter assembly.

Abstract: A brake assembly for a motor, the brake assembly comprising a stack of brake elements, at least one of which is rotatable with an output shaft of the motor, in use, and at least one of which is non-rotatable relative to a housing, and actuator means controlling the magnitude of a compressive load applied to the brake elements, wherein the brake elements are provided, at least in part, with a surface coating which raises the coefficient of friction of the brake elements to a value greater than 0.2. The invention also relates to a brake assembly comprising a plurality of brake elements and an electromagnetic actuator arranged to permit control of a compressive load applied to the brake elements, wherein the actuator includes a winding located such that the brake elements are accessible without requiring removal of the winding from the motor.

Abstract: A system automatically builds custom virtual appliances and/or other computing environments and their components, where applicable, based on user requirements and may offer a service for hosting, maintaining, monitoring and managing such appliances remotely. These virtual appliances may be delivered over a network, such as the Internet, and can be run at a customer site or at a hosting provider. Some embodiments of the invention can build these appliances using custom applications developed by customers.

Abstract: A read sensor for a magneto resistive head is formed through the use of a bilayer lift-off mask. According to one embodiment, a release layer is formed on top of a sensor layer. A silicon-containing resist layer is formed over the release layer. The resist layer is patterned according to the desired dimensions of the read sensor. Then, plasma etching, such as oxygen plasma etching, is used to remove the portion of the release layer that is exposed by removal of resist material. The release layer may be etched to undercut the patterned resist layer, or may entirely removed beneath the patterned resist layer to provide a bridge of the resist material. In either case, isotropic plasma etching, anisotropic plasma etching, or some combination thereof may be applied.

Abstract: A method of optimizing one or more attributes of a product according to a product context. A product context and one or more attributes of the product are presented to a user via a software graphical user interface (GUI). A visual rendering of the product including at least one attribute of the product may be presented via the GUI. The user either may select or modify the at least one attribute and submit a user input that corresponds to the attribute and/or the modified attribute of the product in reference to the product context. The user input is received and the product is displayed via the GUI based on the user input. If the attribute of the product was modified, then the attribute of the product is modified and displayed substantially simultaneously. A correlation between the user input and the attribute of the product in reference to the product context is determined when a termination command is received.

Abstract: A method for making a release agent suitable for use in the baking industry, along with examples of the release agent made according to the method. The method comprises heating a food grade oil to between about 100 and about 130 degrees Celsius, then adding water heated to near its boiling point. Agitation is used during the process to convert the mixture to a stable oil-in-water emulsion. A relatively small volume of emulsifying agent may also be added. The preferred embodiment uses a silicone oil, which leaves very little solid residue on the baking pans.

Abstract: A method is presented for repairing damaged photomasks for electronic component fabrication processes, particularly for fabrication of the ABS of a disk drive slider. The method includes applying an overcoat of material having index of fraction which is close to the index of refraction of the photoresist material of the damaged photomask to produce a non-scattering boundary surface. The overcoat material preferably includes an overcoat base material which is a polymer having an index of refraction which is in the range of plus or minus 0.1 from the index of refraction of said photoresist material.

Abstract: Methods of forming a component of a thin film magnetic head and improving the plating of a component of a thin film magnetic head are provided. The methods include the use of a high activation energy chemically amplified photoresist (CARS) that is contacted with a low pH high saturation magnetic moment plating solution to form a magnetic head component that is essentially free of plating defects. The methods find utility in hard disk drive applications, such as in the manufacture of magnetic poles for the write head of a hard disk drive.

Abstract: In one illustrative example, a method for use in making a magnetic write head includes the steps of forming a first pole piece layer of a first pole piece; forming a patterned resist over the first pole piece layer; electroplating a pedestal over the first pole piece layer within a channel of the patterned resist; electroplating a metal gap layer over the pedestal within the channel of the patterned resist; forming a resist channel shrinking film over the patterned resist; baking the resist channel shrinking film over the patterned to thereby reduce a width of the channel; removing the resist channel shrinking film; electroplating a second pole piece within the reduced-width channel of the patterned resist; removing the patterned resist; and milling the pedestal, using the second pole piece as a mask, to form a central notched pedestal having side walls with angled slopes.

Abstract: A disconnect mechanism is provided which, upon a suitable trigger event, such as excess temperature causes a camming element 40 having a tapered head 52 to move under the urging of a compression spring 60 such that the tapered head 52 becomes trapped between a rotating element 32 and a support 42. This gives rise to frictional inter-engagement which prevents further rotation of the rotating element 32 and thereby locks the rotating machine against further rotation. This is turn causes the shear region to fail thereby drivingly disconnecting the machine from its prime mover.

Abstract: A method is provided for planarization of structures which minimizes step heights, reduces process steps, improves cleanliness, and provides increased ease of debond. Structures are placed with working surfaces facing down onto an adhesive layer such that structures remain fixed during heating. A bi-layer encapsulating film is used to achieve planarization. A carrier is bi-laminated with a thermoplastic film layer followed by a chemically inert protective polymer film layer that can withstand etch and cleaning processes. The thermoplastic layer is laminated on top of the carrier; the polymer layer is laminated on top of the joined thermoplastic layer and carrier. The carrier with bi-layer film is then placed onto the backside of the structures to resist chemical attack from the front side during photostrip and enable planarization. When heat is applied, the bi-layer encapsulating film melts and pushes the polymer layer into the gaps between structures thereby achieving complete planarization.

Abstract: The present invention relates to a method for producing a transducer slider. The method involves first coating a substrate with a radiation-sensitive layer and exposing the radiation-sensitive layer to radiation according to an intensity pattern. Preferably, the intensity pattern is provided using a grayscale mask. Once the image is developed into the radiation-sensitive layer, the image is transferred into the substrate to form a transducer slider having a surface profile comprising a tapered edge. In the alternative or in addition, the surface profile may comprise a rounded corner. The invention also relates to a structure for forming a transducer slider.

Abstract: A process to reduce step heights in planarization of thin film carriers in an encapsulation system. The improvements include using an adhesive tape having a thinner adhesive thickness and a stiffer tape for the film sealing the encapsulant on the carrier to result in a low step height surface transition between the carrier and the cured encapsulant. The composition of the encapsulant is modified to reduce the shrinkage upon curing of the encapsulant. The encapsulant may include an absorbent that absorbs the irradiation and cause the top surface to harden first compared to the bulk of the encapsulant, and/or a gas-emitting additive that creates gaseous products that expand upon irradiation to thereby reduce the shrinkage of the encapsulant upon curing. Alternatively, irradiation at very low incidence angle relative to the top surface of the encapsulant causes the top surface to harden before the bulk of the encapsulant.

Abstract: A method for manufacturing thin-film magnetic head sliders is disclosed. Initially, an elastic layer, which may be made of poly-dimethyl siloxane (PDMS), is spun on a wafer and is thermally cured. Then, a resist layer is spun on the elastic layer. Both the resist layer and the elastic layer are subsequently peeled off together from the wafer. Next, the peeled resist layer/elastic layer is applied onto a group of magnetic heads with the resist layer in direct contact with the magnetic heads. Finally, the elastic layer is peeled off from the resist layer such that the resist layer remains attaching to the magnetic heads.

Abstract: A system for attaching fins to surfboards that utilizes fixing elements embedded in the body of the board, the elements having slots that receive footings extending from the end of the fin. The footings are removably secured by a passive wedge clip fixing system, enabling fins to be removed for transport or upon damage by hand or simple tool. Screws can also be used for attachment.

Abstract: A method is provided for planarization of structures which minimizes step heights, reduces process steps, improves cleanliness, and provides increased ease of debond. Structures are placed with working surfaces facing down onto an adhesive layer such that structures remain fixed during heating. A bi-layer encapsulating film is used to achieve planarization. A carrier is bi-laminated with a thermoplastic film layer followed by a chemically inert protective polymer film layer that can withstand etch and cleaning processes. The thermoplastic layer is laminated on top of the carrier; the polymer layer is laminated on top of the joined thermoplastic layer and carrier. The carrier with bi-layer film is then placed onto the backside of the structures to resist chemical attack from the front side during photostrip and enable planarization. When heat is applied, the bi-layer encapsulating film melts and pushes the polymer layer into the gaps between structures thereby achieving complete planarization.

Abstract: A release agent suitable for use in the baking industry. It includes an emulsion made from a food grade mineral oil, water, and an emulsifying agent. A vegetable oil may be optionally added. Suitable mineral oils include white oil and polydimethylsiloxane (“silicone oil”). Suitable vegetable oils include soybean oil, corn oil, sunflower oil, olive oil, peanut oil, safflower oil, cottonseed oil, and palm oil. The release agent can be made in a concentrated form suitable for dilution prior to use. Methods for making the release agent are disclosed. Methods for applying the release agent in the baking process are also disclosed. The use of the proposed release agent results in substantially less carbon fouling on the baking pans.

Abstract: A read sensor for a magneto resistive head is formed through the use of a bilayer lift-off mask. According to one embodiment, a release layer is formed on top of a sensor layer. A silicon-containing resist layer is formed over the release layer. The resist layer is patterned according to the desired dimensions of the read sensor. Then, plasma etching, such as oxygen plasma etching, is used to remove the portion of the release layer that is exposed by removal of resist material. The release layer may be etched to undercut the patterned resist layer, or may entirely removed beneath the patterned resist layer to provide a bridge of the resist material. In either case, isotropic plasma etching, anisotropic plasma etching, or some combination thereof may be applied.