Abstract: A pellicle having a metal oxysilicide layer. A pellicle having a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. A method of manufacturing a pellicle for a lithographic apparatus, the method including providing a metal oxysilicide layer. A lithographic assembly including a pellicle having a metal oxysilicide layer. The use of a pellicle having a metal oxysilicide layer in a lithographic apparatus.

Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.

Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.

Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.

Abstract: The present invention relates to a pair of knitted socks or stockings which can be removably connected to one another, in which a first attachment part is firmly attached to one of the two socks or stockings in order to receive a second complementary attachment part in a removable manner, the attachment part being firmly connected to the other of the two socks or stockings, wherein the knitted fabric of the socks or stockings has a stitch density of at least 2000 SD at least in the attachment region of the respective attachment part and is knitted using a reinforcing thread which is not visible from the outside of the socks or stockings and has a tear resistance which corresponds to at least the average tear resistance of the tear resistances of the ground thread, the plating thread and the reinforcing thread of the knitted fabric, none of the threads having a tear resistance of <10 cN/tex.

Abstract: A membrane for EUV lithography, the membrane having a thickness of no more than 200 nm and including a stack having: at least one silicon layer; and at least one silicon compound layer made of a compound of silicon and an element selected from the group consisting of boron, phosphorous, bromine.

Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.

Abstract: A radiation source suitable for providing radiation to a lithographic apparatus generates radiation from a plasma (12) generated from a fuel (31) within an enclosure comprising a gas. The plasma generates primary fuel debris collected as a fuel layer on a debris-receiving surface ((33a), (33b)). The debris-receiving surface is heated to a temperature to maintain the fuel layer as a liquid, and to provide a reduced or zero rate of formation gas bubbles within the liquid fuel layer in order to reduce contamination of optical surfaces (14) by secondary debris arising from gas bubble eruption from the liquid fuel layer. Additionally or alternatively, the radiation source may have a debris receiving surface positioned and/or oriented such that substantially all lines normal to the debris receiving surface do not intersect an optically active surface of the radiation source.

Abstract: The present invention relates in general to nucleic acids and bacterial cells having a genetic alteration that result in increased expression of a protein of interest and methods of making and using the same.

Abstract: A radiation source suitable for providing radiation to a lithographic apparatus generates radiation from a plasma (12) generated from a fuel (31) within an enclosure comprising a gas. The plasma generates primary fuel debris collected as a fuel layer on a debris-receiving surface ((33a), (33b)). The debris-receiving surface is heated to a temperature to maintain the fuel layer as a liquid, and to provide a reduced or zero rate of formation gas bubbles within the liquid fuel layer in order to reduce contamination of optical surfaces (14) by secondary debris arising from gas bubble eruption from the liquid fuel layer. Additionally or alternatively, the radiation source may have a debris receiving surface positioned and/or oriented such that substantially all lines normal to the debris receiving surface do not intersect an optically active surface of the radiation source.

Abstract: A computer-based method and system for detecting violation of intellectual property rights of a digital file, comprising, in a distribution channel, digitally sending or streaming the file from a sending party to a receiving party, adding a watermark to the digital file at the sending party prior to sending or streaming the file, wherein the watermark comprises an identifier of the sending and receiving party(s), as well as a unique file ID. In one embodiment, the party is informed about user and/or customer behavior, and can take precautions.

Abstract: A computer-based method and system for detecting violation of intellectual property rights of a digital file, comprising, in a distribution channel, digitally sending or streaming the file from a sending party to a receiving party, adding a watermark to the digital file at the sending party prior to sending or streaming the file, wherein the watermark comprises an identifier of the sending and receiving party(s), as well as a unique file ID. In one embodiment, the party is informed about user and/or customer behavior, and can take precautions.

Abstract: A radiation source having a nozzle configured to direct a stream of fuel droplets along a trajectory towards a plasma formation location, a laser configured to direct laser radiation at the fuel droplets at the plasma formation location to generate, in use, a radiation generating plasma. The nozzle has an internal surface that is configured to prevent contamination present in fuel used to form the fuel droplets from being deposited on that internal surface.

Abstract: A radiation source having a nozzle configured to direct a stream of fuel droplets along a trajectory towards a plasma formation location, a laser configured to direct laser radiation at the fuel droplets at the plasma formation location to generate, in use, a radiation generating plasma. The nozzle has an internal surface that is configured to prevent contamination present in fuel used to form the fuel droplets from being deposited on that internal surface.

Abstract: A radiation system includes a target material supply configured to supply droplets of target material along a trajectory, and a laser system that includes an amplifier and optics. The optics are configured to establish a first beam path which passes through the amplifier and through a first location on the trajectory, and to establish a second beam path which passes through the amplifier and through a second location on the trajectory. The laser system is configured to generate a first pulse of laser radiation when photons emitted from the amplifier are reflected along the first beam path by a droplet of target material at the first location on the trajectory. The laser system is configured to generate a second pulse of laser radiation when photons emitted from the amplifier are reflected along the second beam path by the droplet of target material at the second location on the trajectory.

Abstract: A computer-based method and system for detecting violation of intellectual property rights of a digital file, comprising, in a distribution channel, digitally sending or streaming the file from a sending party to a receiving party, adding a watermark to the digital file at the sending party prior to sending or streaming the file, wherein the watermark comprises an identifier of the sending and receiving party(s), as well as a unique file ID. In one embodiment, the party is informed about user and/or customer behavior, and can take precautions.

Abstract: The present invention relates to a pair of knitted socks or stockings which can be removably connected to one another, in which a first attachment part is firmly attached to one of the two socks or stockings in order to receive a second complementary attachment part in a removable manner, said attachment part being firmly connected to the other of the two socks or stockings, wherein the knitted fabric of the socks or stockings has a stitch density of at least 2000 SD at least in the attachment region of the respective attachment part and is knitted using a reinforcing thread which is not visible from the outside of the socks or stockings and has a tear resistance which corresponds to at least the average tear resistance of the tear resistances of the ground thread, the plating thread and the reinforcing thread of the knitted fabric, none of the threads having a tear resistance of <10 cN/tex.

Abstract: A radiation system includes a target material supply configured to supply droplets of target material along a trajectory, and a laser system that includes an amplifier and optics. The optics are configured to establish a first beam path which passes through the amplifier and through a first location on the trajectory, and to establish a second beam path which passes through the amplifier and through a second location on the trajectory. The laser system is configured to generate a first pulse of laser radiation when photons emitted from the amplifier are reflected along the first beam path by a droplet of target material at the first location on the trajectory. The laser system is configured to generate a second pulse of laser radiation when photons emitted from the amplifier are reflected along the second beam path by the droplet of target material at the second location on the trajectory.

Abstract: A new cultivar of Rosa plant named, ‘GEUS4310’ that is characterized by its compact, upright, uniform plant habit, its double flowers that are deep reddish pink (cerise) in color, its smooth stems with few thorns, and its small leaves that remain healthy throughout the entire growing season.

Abstract: A new cultivar of Rosa plant named ‘Elizabeth Ashley’ that is characterized by its compact, upright, and uniform plant habit, its double flowers that are bi-colored with yellow-orange and dark red-pink petals, its glossy and disease-free foliage, and its continuous and prolific blooming habit.