Abstract: A liquid delivery system (10) for vaporization of a liquid pecursor to form precursor vapor for transport to a deposition zone (36).

Abstract: A fluid storage and dispensing system includes a storage and dispensing vessel containing a solid-phase physical sorbent material for holding a sorbable fluid, and a motive transport assembly associated with the storage and dispensing vessel. The storage and dispensing vessel is arranged for selectively flowing fluid into the vessel for storage, and out of the vessel for dispensing. The sorbable fluid physically adsorbed on the solid-phase physical sorbent medium may be selectively desorbed by pressure differential desorption and/or thermal desorption, to dispense gas when the vessel is in motive transport and/or when the vessel is at rest.

Abstract: An apparatus and method for processing a workpiece in an ambient-free, atmosphere of selected gas. A preparation vessel has an opening for entry of the workpiece and a diffuser oriented to emit across the vessel opening a laminar curtain flow of the selected gas which enters, purges the vessel and prevents the infiltration of air. The workpiece on its carrier is transported into the preparation vessel where air is purged out and replaced with selected gas. A processing vessel has a similar workpiece entry opening and diffuser. The preparation vessel and the processing openings are brought into coincidence, and the carrier is transported into the processing vessel for processing of the workpiece in the atmosphere of selected gas provided by the processing vessel diffuser.

Abstract: An apparatus and a method for controlling the temperature of a substrate onto which thin films of semiconductor materials are vapor deposited. The apparatus contains a platen contacting a surface of said substrate over the entire length of the deposition zone; said platen having at least one cavity therein and a rounded edge where said substrate first contacts said platen of the beginning of said deposition zone.